SCHEMBL17084333

SCHEMBL17084333

CCCC1(CCC)c2cc(Br)ccc2-c2ccc(/C(CC(C)N(OC(C)=O)C(C)=O)=N/OC(C)=O)cc21

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18994268 0.82 PKM (0.31) —
SCHEMBL17084327 0.82 — —
SCHEMBL18012701 0.75 OGG1 (0.34) —
SCHEMBL17084313 0.73 — —
SCHEMBL13299212 0.72 PKM (0.40) —
SCHEMBL17084316 0.72 — —
SCHEMBL5049195 0.72 PDK2 (0.42) —
SCHEMBL18012812 0.72 — —
SCHEMBL18012818 0.70 PKM (0.37) —
SCHEMBL17084323 0.70 PDK2 (0.36) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9684238-B2 Fluorene-type compound, photopolymerization initiator comprising said fluorene-type compound, and photosensitive composition containing said photopolymerization initiator TOKYO OHKA KOGYO CO., LTD. (JP) 2017-06-20 — — US disclosed
US-20150259321-A1 FLUORENE-TYPE COMPOUND, PHOTOPOLYMERIZATION INITIATOR COMPRISING SAID FLUORENE-TYPE COMPOUND, AND PHOTOSENSITIVE COMPOSITION CONTAINING SAID PHOTOPOLYMERIZATION INITIATOR DAITO CHEMIX CORPORATION (JP) 2015-09-17 — — US disclosed
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