Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HMGCR | P04035 | 3/20 | 0.40 |
| ▸ | FKBP1A | P62942 | 4/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.35 |
| ▸ | MEN1 | O00255 | 2/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.35 |
| ▸ | APOBEC3A | P31941 | 1/20 | 0.33 |
| ▸ | APOBEC3G | Q9HC16 | 1/20 | 0.33 |
| ▸ | CCR2 | P41597 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14997741 | 0.98 | HMGCR (0.39) | HMGCRFKBP1AALDH1A1MEN1KMT2A | |
| SCHEMBL9945786 | 0.97 | HMGCR (0.37) | HMGCRFKBP1AALDH1A1MEN1KMT2A | |
| SCHEMBL15681469 | 0.86 | HMGCR (0.41) | HMGCRFKBP1AALDH1A1MEN1KMT2A | |
| SCHEMBL10187705 | 0.84 | HMGCR (0.40) | HMGCRFKBP1AALDH1A1MEN1KMT2A | |
| SCHEMBL15889341 | 0.83 | HMGCR (0.39) | HMGCRFKBP1AALDH1A1MEN1KMT2A | |
| SCHEMBL10170705 | 0.83 | HMGCR (0.39) | HMGCRFKBP1AALDH1A1MEN1KMT2A | |
| SCHEMBL29296292 | 0.82 | HMGCR (0.43) | HMGCRFKBP1AALDH1A1MEN1KMT2A | |
| SCHEMBL11941708 | 0.82 | HMGCR (0.36) | HMGCRFKBP1A | |
| SCHEMBL3434651 | 0.81 | CYP19A1 (0.42) | HMGCRFKBP1AALDH1A1MEN1KMT2A | |
| SCHEMBL12993041 | 0.81 | NPY1R (0.37) | HMGCRFKBP1AALDH1A1MEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9140981-B2 | Actinic-ray-sensitive or radiation-sensitive resin composition, and resist film using the same, pattern forming method, electronic device manufacturing method, and electronic device, each using the same | FUJIFILM CORPORATION (JP) | 2015-09-22 | — | — | US | disclosed |