Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HMGCR | P04035 | 1/20 | 0.36 |
| ▸ | FKBP1A | P62942 | 3/20 | 0.34 |
| ▸ | GRM2 | Q14416 | 1/20 | 0.33 |
| ▸ | GRM3 | Q14832 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17088137 | 0.82 | HMGCR (0.40) | HMGCRFKBP1A | |
| SCHEMBL14015408 | 0.81 | HMGCR (0.38) | HMGCRFKBP1AGRM2GRM3 | |
| SCHEMBL14997741 | 0.81 | HMGCR (0.39) | HMGCRFKBP1A | |
| SCHEMBL3434651 | 0.80 | CYP19A1 (0.42) | HMGCRFKBP1A | |
| SCHEMBL12993041 | 0.80 | NPY1R (0.37) | HMGCRFKBP1A | |
| SCHEMBL11920450 | 0.79 | CYP19A1 (0.41) | HMGCRFKBP1A | |
| SCHEMBL9945786 | 0.79 | HMGCR (0.37) | HMGCRFKBP1A | |
| SCHEMBL132686 | 0.79 | FKBP1A (0.35) | HMGCRFKBP1A | |
| SCHEMBL11941681 | 0.77 | FKBP1A (0.34) | HMGCRFKBP1A | |
| SCHEMBL6367523 | 0.77 | FKBP1A (0.34) | HMGCRFKBP1A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9926462-B2 | Composition for forming liquid immersion upper layer film, and polymer | JSR CORPORATION (JP) | 2018-03-27 | — | — | US | disclosed |
| US-20170073541-A1 | COMPOSITION FOR FORMING LIQUID IMMERSION UPPER LAYER FILM, AND POLYMER | JSR CORPORATION (JP) | 2017-03-16 | — | — | US | disclosed |
| US-9540535-B2 | Composition for forming liquid immersion upper layer film, and polymer | JSR CORPORATION (JP) | 2017-01-10 | — | — | US | disclosed |
| US-9268225-B2 | Composition, resist pattern-forming method, compound, method for production of compound, and polymer | JSR CORPORATION (JP) | 2016-02-23 | — | — | US | disclosed |
| US-9046775-B2 | Composition for forming liquid immersion upper layer film, resist pattern-forming method, polymer, and compound | JSR CORPORATION (JP) | 2015-06-02 | — | — | US | disclosed |
| US-8956807-B2 | Method for forming resist pattern, and composition for forming resist underlayer film | JSR CORPORATION (JP) | 2015-02-17 | — | — | US | disclosed |
| US-20140377707-A9 | COMPOSITION FOR FORMING LIQUID IMMERSION UPPER LAYER FILM, RESIST PATTERN-FORMING METHOD, POLYMER, AND COMPOUND | JSR CORPORATION (JP) | 2014-12-25 | — | — | US | disclosed |
| US-20140248563-A1 | COMPOSITION, RESIST PATTERN-FORMING METHOD, COMPOUND, METHOD FOR PRODUCTION OF COMPOUND, AND POLYMER | JSR CORPORATION (JP) | 2014-09-04 | — | — | US | disclosed |
| US-20130217850-A1 | COMPOSITION FOR FORMING LIQUID IMMERSION UPPER LAYER FILM, AND POLYMER | JSR CORPORATION (JP) | 2013-08-22 | — | — | US | disclosed |
| US-8470510-B2 | Polymer for lithographic purposes and method for producing same | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2013-06-25 | — | — | US | disclosed |
| US-RE43560-E1 | Positive photosensitive compositions | FUJIFILM CORPORATION (JP) | 2012-07-31 | — | — | US | disclosed |
| US-20110065044-A1 | POLYMER FOR LITHOGRAPHIC PURPOSES AND METHOD FOR PRODUCING SAME | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2011-03-17 | — | — | US | disclosed |
| US-7812194-B2 | Positive photosensitive composition | FUJIFILM CORPORATION (JP) | 2010-10-12 | — | — | US | disclosed |
| US-20100255419-A1 | POSITIVE PHOTOSENSITIVE COMPOSITION | FUJIFILM CORPORATION (JP) | 2010-10-07 | — | — | US | disclosed |
| US-7776512-B2 | Positive photosensitive composition | FUJIFILM CORPORATION (JP) | 2010-08-17 | — | — | US | disclosed |
| US-20100203445-A1 | NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2010-08-12 | — | — | US | disclosed |
| US-7598015-B2 | Polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-10-06 | — | — | US | disclosed |
| US-20090148791-A1 | POSITIVE PHOTOSENSITIVE COMPOSITION | FUJIFILM CORPORATION (JP) | 2009-06-11 | — | — | US | disclosed |
| US-7435526-B2 | Positive photosensitive composition | FUJIFILM CORPORATION (JP) | 2008-10-14 | — | — | US | disclosed |
| US-20070003871-A1 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. | 2007-01-04 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20100255419-A1 | POSITIVE PHOTOSENSITIVE COMPOSITION | RARA, SUN2, RARG | HMGCR 4459/4885FKBP1A 1327/4885GRM2 4233/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.