Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16843975 | 0.84 | — | — | |
| SCHEMBL6027786 | 0.81 | TSHR (0.33) | TSHRTDP1 | |
| SCHEMBL19038497 | 0.77 | TSHR (0.30) | TSHRTDP1 | |
| SCHEMBL6027925 | 0.77 | TSHR (0.30) | TSHRTDP1 | |
| SCHEMBL6028313 | 0.73 | TSHR (0.32) | TSHRTDP1 | |
| SCHEMBL6027606 | 0.73 | EPHX1 (0.31) | — | |
| SCHEMBL6027587 | 0.73 | — | — | |
| SCHEMBL17600614 | 0.71 | — | — | |
| SCHEMBL17107824 | 0.71 | TSHR (0.30) | TSHRTDP1 | |
| SCHEMBL6027948 | 0.69 | EPHX1 (0.36) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 50 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12518966-B2 | Selective plasma enhanced atomic layer deposition | VERSUM MATERIALS US, LLC (US) | 2026-01-06 | — | — | US | claimed |
| EP-3347504-B1 | METHODS FOR DEPOSITING A CONFORMAL METAL OR METALLOID SILICON NITRIDE FILM AND RESULTANT FILMS | VERSUM MAT US LLC (US) | 2024-09-25 | — | — | EP | claimed |
| CN-117904602-A | Method for depositing conformal metal or metalloid silicon nitride films | 弗萨姆材料美国有限责任公司 | 2024-04-19 | — | — | CN | claimed |
| US-20240047196-A1 | SELECTIVE THERMAL ATOMIC LAYER DEPOSITION | VERSUM MAT US LLC (US) | 2024-02-08 | — | — | US | claimed |
| US-20240014036-A1 | SELECTIVE PLASMA ENHANCED ATOMIC LAYER DEPOSITION | VERSUM MATERIALS US, LLC | 2024-01-11 | — | — | US | claimed |
| CN-117265512-A | Method for depositing conformal metal or metalloid silicon nitride films and resulting films | 弗萨姆材料美国有限责任公司 | 2023-12-22 | — | — | CN | claimed |
| CN-116918029-A | selective thermal atomic layer deposition | 弗萨姆材料美国有限责任公司 | 2023-10-20 | — | — | CN | claimed |
| CN-116761906-A | Selective plasma enhanced atomic layer deposition | 弗萨姆材料美国有限责任公司 | 2023-09-15 | — | — | CN | claimed |
| EP-4240886-A1 | SELECTIVE PLASMA ENHANCED ATOMIC LAYER DEPOSITION | Versum Materials US, LLC (US) | 2023-09-13 | — | — | EP | claimed |
| EP-4241299-A1 | SELECTIVE THERMAL ATOMIC LAYER DEPOSITION | Versum Materials US, LLC (US) | 2023-09-13 | — | — | EP | claimed |
| US-11732351-B2 | Methods for depositing a conformal metal or metalloid silicon nitride film and resultant films | VERSUM MATERIALS US, LLC (US) | 2023-08-22 | — | — | US | claimed |
| WO-2022119865-A1 | SELECTIVE PLASMA ENHANCED ATOMIC LAYER DEPOSITION | VERSUM MATERIALS US, LLC (US) | 2022-06-09 | — | — | WO | claimed |
| WO-2022119860-A1 | SELECTIVE THERMAL ATOMIC LAYER DEPOSITION | VERSUM MATERIAL US, LLC (US) | 2022-06-09 | — | — | WO | claimed |
| US-20210388489-A1 | Methods for Depositing a Conformal Metal or Metalloid Silicon Nitride Film and Resultant Films | VERSUM MATERIALS US, LLC (US) | 2021-12-16 | — | — | US | claimed |
| CN-113088927-A | Compositions and methods for depositing silicon oxide films | 弗萨姆材料美国有限责任公司 | 2021-07-09 | — | — | CN | claimed |
| US-20180274097-A1 | METHODS FOR DEPOSITING A CONFORMAL METAL OR METALLOID SILICON NITRIDE FILM | VERSUM MATERIALS US, LLC | 2018-09-27 | — | — | US | claimed |
| US-20180245215-A1 | METHODS FOR DEPOSITING A CONFORMAL METAL OR METALLOID SILICON NITRIDE FILM AND RESULTANT FILMS | VERSUM MATERIALS US, LLC | 2018-08-30 | — | — | US | claimed |
| EP-3347504-A1 | METHODS FOR DEPOSITING A CONFORMAL METAL OR METALLOID SILICON NITRIDE FILM AND RESULTANT FILMS | Air Products and Chemicals, Inc. (US) | 2018-07-18 | — | — | EP | claimed |
| US-20150275355-A1 | COMPOSITIONS AND METHODS FOR THE DEPOSITION OF SILICON OXIDE FILMS | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2015-10-01 | — | — | US | claimed |
| EP-2924143-A1 | COMPOSITIONS AND METHODS FOR THE DEPOSITION OF SILICON OXIDE FILMS | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2015-09-30 | — | — | EP | claimed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20150275355-A1 | COMPOSITIONS AND METHODS FOR THE DEPOSITION OF SILICON OXIDE FILMS | NR4A3, NR4A1, RTN4 | TSHR 769/4885TDP1 4733/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.