SCHEMBL6027786

SCHEMBL6027786

CCC(C)(C)N[Si](C)(C)C

nearest known ligand 0.33

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.33
TDP1 Q9NUW8 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17102759 0.81 TSHR (0.33) TSHRTDP1
SCHEMBL6027925 0.77 TSHR (0.30) TSHRTDP1
SCHEMBL19038497 0.77 TSHR (0.30) TSHRTDP1
SCHEMBL6028313 0.73 TSHR (0.32) TSHRTDP1
SCHEMBL11421316 0.73
SCHEMBL6027587 0.73
SCHEMBL16843975 0.73
SCHEMBL6027606 0.73 EPHX1 (0.31)
SCHEMBL23825373 0.71 TSHR (0.35) TSHR
SCHEMBL17600614 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2924143-A1 COMPOSITIONS AND METHODS FOR THE DEPOSITION OF SILICON OXIDE FILMS AIR PRODUCTS AND CHEMICALS, INC. (US) 2015-09-30 EP claimed
WO-2000067300-A1 LIQUID PRECURSORS FOR FORMATION OF MATERIALS CONTAINING ALKALI METALS PRESIDENT AND FELLOWS OF HARVARD COLLEGE (US) 2000-11-09 WO claimed
US-20250316474-A1 HIGH MODULUS CARBON DOPED SILICON OXIDE FILM FOR MOLD STACK SCALING SOLUTIONS IN ADVANCED MEMORY APPLICATIONS LAM RES CORP (US) 2025-10-09 US disclosed
WO-2023225132-A1 HIGH MODULUS CARBON DOPED SILICON OXIDE FILM FOR MOLD STACK SCALING SOLUTIONS IN ADVANCED MEMORY APPLICATIONS LAM RESEARCH CORPORATION (US) 2023-11-23 WO disclosed
US-11807652-B2 Tungsten compound, raw material for thin film formation and method for producing thin film ADEKA CORPORATION (JP) 2023-11-07 US disclosed
US-20150275355-A1 COMPOSITIONS AND METHODS FOR THE DEPOSITION OF SILICON OXIDE FILMS AIR PRODUCTS AND CHEMICALS, INC. (US) 2015-10-01 US disclosed
US-20150275355-A1 COMPOSITIONS AND METHODS FOR THE DEPOSITION OF SILICON OXIDE FILMS AIR PRODUCTS AND CHEMICALS, INC. (US) 2015-10-01 US disclosed
EP-2924143-A1 COMPOSITIONS AND METHODS FOR THE DEPOSITION OF SILICON OXIDE FILMS AIR PRODUCTS AND CHEMICALS, INC. (US) 2015-09-30 EP disclosed
US-6994800-B1 Liquid precursors for formation of materials containing alkali metals PRESIDENT AND FELLOWS OF HARVARD COLLEGE (US) 2006-02-07 US disclosed
US-6696380-B2 Procatalysts, catalyst systems, and use in olefin polymerization WESTLAKE LONGVIEW CORPORATION 2004-02-24 US disclosed
US-6677410-B2 COORDINATION CATALYSTS EASTMAN CHEMICAL COMPANY 2004-01-13 US disclosed
US-6465383-B2 COORDINATION CATALYST EASTMAN CHEMICAL COMPANY 2002-10-15 US disclosed
US-20010051587-A1 Procatalysts, catalyst systems, and use in olefin polymerization WESTLAKE LONGVIEW CORPORATION 2001-12-13 US disclosed
US-20010031841-A1 Procatalysts, catalyst systems, and use in olefin polymerization WESTLAKE LONGVIEW CORPORATION 2001-10-18 US disclosed
US-20010029286-A1 Procatalysts, catalyst systems, and use in OLEFIN polymerization EASTMAN CHEMICAL COMPANY, A CORP. OF DELAWARE 2001-10-11 US disclosed
US-20010025005-A1 Procatalysts, catalyst systems, and use in olefin polymerization EASTMAN CHEMICAL COMPANY, A CORPORATION OF DELAWARE 2001-09-27 US disclosed
WO-2001051527-A1 PROCATALYSTS, CATALYST SYSTEMS, AND USE IN OLEFIN POLYMERIZATION EASTMAN CHEMICAL COMPANY (US) 2001-07-19 WO disclosed
WO-2001051526-A1 PROCATALYSTS COMPRISING BIDENTATE LIGANDS, CATALYST SYSTEMS, AND USE IN OLEFIN POLYMERIZATION EASTMAN CHEMICAL COMPANY (US) 2001-07-19 WO disclosed
WO-2001051528-A1 PROCATALYSTS COMPRISING BIDENTATE LIGANDS, CATALYST SYSTEMS, AND USE IN OLEFIN POLYMERIZATION EASTMAN CHEMICAL COMPANY (US) 2001-07-19 WO disclosed
WO-2001051529-A1 PROCATALYSTS COMPRISING BIDENTATE LIGANDS, CATALYST SYSTEMS, AND USE IN OLEFIN POLYMERIZATION EASTMAN CHEMICAL COMPANY (US) 2001-07-19 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20150275355-A1 COMPOSITIONS AND METHODS FOR THE DEPOSITION OF SILICON OXIDE FILMS NR4A3, NR4A1, RTN4 TSHR 769/4885TDP1 4733/4885
US-11807652-B2 Tungsten compound, raw material for thin film formation and method for producing thin film YTHDF1, RNF5, RNF168 TSHR 1573/4885TDP1 2121/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.