SCHEMBL1710870

SCHEMBL1710870

CC1(CC2CO2)C=CC=CC1OC1C=CC=CC1(C)CC1CO1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27346724 0.77
SCHEMBL4778992 0.69 TDP1 (0.35)
SCHEMBL29826405 0.63
SCHEMBL27629741 0.63
SCHEMBL28056643 0.62
SCHEMBL30526267 0.61 ALDH1A1 (0.36)
SCHEMBL5029090 0.61
SCHEMBL27485449 0.59
SCHEMBL25363579 0.57 CHRM2 (0.34)
SCHEMBL6048412 0.55

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 43 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2344927-A2 BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS AZ Electronic Materials USA Corp. (US) 2011-07-20 EP claimed
WO-2010043946-A2 BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS AZ ELECTRONIC MATERIALS USA CORP. (US) 2010-04-22 WO claimed
US-20100092894-A1 Bottom Antireflective Coating Compositions AZ ELECTRONIC MATERIALS USA CORP. 2010-04-15 US claimed
US-7008476-B2 Modified alginic acid of alginic acid derivatives and thermosetting anti-reflective compositions thereof AZ ELECTRONIC MATERIALS USA CORP. (US) 2006-03-07 US claimed
WO-2004111092-A1 MODIFIED ALGINIC ACID OR ALGINIC ACID DERIVATIVES AND THERMOSETTING ANTI-REFLECTIVE COMPOSITIONS THEREOF AZ ELECTRONIC MATERIALS USA CORP. (US) 2004-12-23 WO claimed
US-20040253532-A1 Modified alginic acid of alginic acid derivatives and thermosetting anti-reflective compositions thereof MERCK PATENT GMBH (DE) 2004-12-16 US claimed
US-10778058-B2 Solid insulation material SIEMENS AKTIENGESELLSCHAFT (DE) 2020-09-15 US disclosed
US-20190089217-A1 Solid Insulation Material SIEMENS AKTIENGESELLSCHAFT (DE) 2019-03-21 US disclosed
EP-3408308-A1 METHOD FOR PRODUCING FURAN-BASED POLYESTER BASF SE (DE) 2018-12-05 EP disclosed
US-8722307-B2 Near-infrared absorptive layer-forming composition and multilayer film comprising near-infrared absorptive layer INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2014-05-13 US disclosed
EP-2537068-B1 ANTIREFLECTIVE COMPOSITIONS AND METHODS OF USING SAME AZ ELECTRONIC MATERIALS USA (US) 2014-02-12 EP disclosed
US-8551686-B2 Antireflective composition for photoresists AZ ELECTRONIC MATERIALS USA CORP. (US) 2013-10-08 US disclosed
US-8507192-B2 Antireflective compositions and methods of using same AZ ELECTRONIC MATERIALS USA CORP. (US) 2013-08-13 US disclosed
US-7081511-B2 Process for making polyesters AZ ELECTRONIC MATERIALS USA CORP. (US) 2006-07-25 US disclosed
US-7008476-B2 Modified alginic acid of alginic acid derivatives and thermosetting anti-reflective compositions thereof AZ ELECTRONIC MATERIALS USA CORP. (US) 2006-03-07 US disclosed
WO-2005097867-A1 PROCESS FOR MAKING POLYESTERS AZ ELECTRONIC MATERIALS USA CORP. (DE) 2005-10-20 WO disclosed
US-20050234201-A1 Process for making polyesters MERCK PATENT GMBH (DE) 2005-10-20 US disclosed
WO-2004111092-A1 MODIFIED ALGINIC ACID OR ALGINIC ACID DERIVATIVES AND THERMOSETTING ANTI-REFLECTIVE COMPOSITIONS THEREOF AZ ELECTRONIC MATERIALS USA CORP. (US) 2004-12-23 WO disclosed
US-20040253532-A1 Modified alginic acid of alginic acid derivatives and thermosetting anti-reflective compositions thereof MERCK PATENT GMBH (DE) 2004-12-16 US disclosed
US-6500486-B1 POLYMERIZING POLYEPOXIDE, AMINOSILANE, AND ALKYLTRIALKOXY-SILANE ON SURFACE OF POLYCARBONATE CONTACT LENSES FORMING CLEAR, TRANSPARENT, COLORLESS, HIGHLY ADHERANT AND VISIBLE SPECK FREE FILM HOYA OPTICAL LABS OF AMERICA, INC. 2002-12-31 US disclosed