⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL23701951 | 1.00 | — | — | |
| SCHEMBL895220 | 0.83 | — | — | |
| SCHEMBL8758 | 0.83 | — | — | |
| SCHEMBL11792566 | 0.79 | — | — | |
| SCHEMBL2409777 | 0.79 | — | — | |
| Ethylene SCHEMBL6511490 | 0.75 | — | — | |
| SCHEMBL797340 | 0.75 | — | — | |
| Dimethylamine SCHEMBL7582757 | 0.72 | — | — | |
| SCHEMBL895221 | 0.63 | — | — | |
| SCHEMBL466357 | 0.62 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1177575-A1 | METHOD FOR ETCHING DOPED POLYSILICON WITH HIGH SELECTIVITY TO UNDOPED POLYSILICON | MICRON TECHNOLOGY, INC. (US) | 2002-02-06 | — | — | EP | claimed |
| WO-2000060651-A1 | METHOD FOR ETCHING DOPED POLYSILICON WITH HIGH SELECTIVITY TO UNDOPED POLYSILICON | MICRON TECHNOLOGY, INC. (US) | 2000-10-12 | — | — | WO | claimed |
| CN-109195810-B | Tyre for vehicle wheels | 倍耐力轮胎股份公司 | 2021-02-02 | — | — | CN | disclosed |
| CN-102176894-A | Shine control cleanser | JOHNSON & JOHNSON CONSUMER | 2011-09-07 | — | — | CN | disclosed |
| EP-2344115-A2 | SHINE CONTROL CLEANSER | Johnson & Johnson Consumer Companies, Inc. (US) | 2011-07-20 | — | — | EP | disclosed |
| US-20100256031-A1 | SHINE CONTROL CLEANSER | JOHNSON & JOHNSON CONSUMER COMPANIES, INC. | 2010-10-07 | — | — | US | disclosed |
| US-20100093599-A1 | SHINE CONTROL CLEANSER | JOHNSON & JOHNSON | 2010-04-15 | — | — | US | disclosed |
| WO-2010042839-A2 | SHINE CONTROL CLEANSER | JOHNSON & JOHNSON CONSUMER COMPANIES, INC. (US) | 2010-04-15 | — | — | WO | disclosed |
| EP-1816005-B1 | Method for manufacture of lithographic printing plate precursor for dry lithographic printing | FUJIFILM CORP (JP) | 2009-07-01 | — | — | EP | disclosed |
| EP-1645431-B1 | Method for manufacture of lithographic printing plate precursor for dry lithographic printing | FUJIFILM CORP (JP) | 2008-06-11 | — | — | EP | disclosed |
| EP-1816005-A1 | Method for manufacture of lithographic printing plate precursor for dry lithographic printing | FUJIFILM Corporation (JP) | 2007-08-08 | — | — | EP | disclosed |
| EP-1645431-A2 | Method for manufacture of lithographic printing plate precursor for dry lithographic printing | FUJI PHOTO FILM CO., LTD. (JP) | 2006-04-12 | — | — | EP | disclosed |
| US-6958394-B2 | Having excellent water vapor transmission rate and retention property; for use in polarizing plate; data processing | KONICA CORPORATION (JP) | 2005-10-25 | — | — | US | disclosed |
| EP-0870806-B1 | Elastomeric compositions | HNA HOLDINGS INC (US) | 2003-05-28 | — | — | EP | disclosed |
| EP-0918505-A1 | SKIN TONING FORMULATION | Johnson & Johnson Consumer Companies, Inc. (US) | 1999-06-02 | — | — | EP | disclosed |
| US-5871764-A | CLEANING COMPOUNDS FOR SKINS | JOHNSON & JOHNSON CONSUMER PRODUCTS, INC. (US) | 1999-02-16 | — | — | US | disclosed |
| EP-0870806-A1 | Elastomeric compositions | HNA Holdings, Inc. (US) | 1998-10-14 | — | — | EP | disclosed |
| US-5731380-A | POLYESTER, INTERPOLYMER, AND THERMOPLASTIC POLYURETHANE BLEND; MOLDINGS | HOECHST CELANESE CORPORATION (US) | 1998-03-24 | — | — | US | disclosed |
| WO-1997031619-A1 | SKIN TONING FORMULATION | JOHNSON & JOHNSON CONSUMER PRODUCTS, INC. (US) | 1997-09-04 | — | — | WO | disclosed |
| US-4254011-A | CONTAINING A TWO-PHASE CROSSLINKED POLYACRYLATE | BAYER AKTIENGESELLSCHAFT (DE) | 1981-03-03 | — | — | US | disclosed |