SCHEMBL895220

SCHEMBL895220

CC1=CC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8758 1.00
SCHEMBL11792566 0.95
SCHEMBL2409777 0.95
SCHEMBL797340 0.91
Ethylene SCHEMBL6511490 0.91
Dimethylamine SCHEMBL7582757 0.87
SCHEMBL1712412 0.83
SCHEMBL767081 0.78
SCHEMBL466357 0.75
SCHEMBL11793129 0.75 ALDH1A1 (0.41)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 129 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117004698-A Double-ended sequencing method and kit 深圳赛陆医疗科技有限公司 2023-11-07 CN claimed
WO-2024149275-A1 KRAS INHIBITOR COMPOUND 上海湃隆生物科技有限公司 2024-07-18 WO disclosed
US-20240199654-A1 CTLA-4 SMALL MOLECULE DEGRADATION AGENT AND APPLICATION THEREOF SUZHOU GUOKUANG PHARMTECH. CO., LTD. (CN) 2024-06-20 US disclosed
US-20240189320-A1 HIGHLY ACTIVE STING PROTEIN AGONIST COMPOUND ADLAI NORTYE BIOPHARMA CO., LTD. (CN) 2024-06-13 US disclosed
EP-4382519-A1 CYCLIN K DEGRADATION AGENT Adlai Nortye Biopharma Co., Ltd. (CN) 2024-06-12 EP disclosed
CN-111655682-B High-activity STING protein agonist compound 杭州阿诺生物医药科技有限公司 2024-05-31 CN disclosed
WO-2024104364-A1 PAN-KRAS INHIBITOR COMPOUND 杭州阿诺生物医药科技有限公司 2024-05-23 WO disclosed
US-20240165244-A1 BRM Targeting Compounds And Associated Methods Of Use PRELUDE THERAPEUTICS INCORPORATED 2024-05-23 US disclosed
CN-118047799-A Pan-KRAS inhibitor compound 杭州阿诺生物医药科技有限公司 2024-05-17 CN disclosed
CN-118047798-A Pan-KRAS inhibitor compound 杭州阿诺生物医药科技有限公司 2024-05-17 CN disclosed
US-20050049421-A1 Method for preparing nitrogen-containing compounds CHUGAI SEIYAKU KABUSHIKI KAISHA (JP) 2005-03-03 US disclosed
US-20050043569-A1 Method for preparing nitrogen-containing compounds CHUGAI SEIYAKU KABUSHIKI KAISHA (JP) 2005-02-24 US disclosed
US-6803472-B2 REACTING NH GROUP-CONTAINING COMPOUNDS WITH THIOCYANATES, CYANAMIDES, NITRITES OR ESTERS IN PRESENCE OF SILYLATING AGENT TO SYNTHESIZE CORRESPONDING NITROGEN-CONTAINING ADDITION OR SUBSTITUTION PRODUCTS; DIRECT, EFFICIENCY CHUGAI SEIYAKU KABUSHIKI KAISHA (JP) 2004-10-12 US disclosed
US-20030158442-A1 Process for the production of nitrogen compounds CHUGAI SEIYAKU KABUSHIKI KAISHA (JP) 2003-08-21 US disclosed
US-20030129712-A1 Process for preparing heterocyclic (R)- and (S)-cyanohydrins DSM FINE CHEMICALS AUSTRIA NFG GMBH & COKG (AT) 2003-07-10 US disclosed
EP-1323830-A2 Process for the preparation of heterocyclic (R)- and (S)-cyanohydrines DSM Fine Chemicals Austria Nfg GmbH & Co KG (AT) 2003-07-02 EP disclosed
EP-1285909-A1 PROCESS FOR THE PRODUCTION OF NITROGEN COMPOUNDS CHUGAI SEIYAKU KABUSHIKI KAISHA (JP) 2003-02-26 EP disclosed
US-6232055-B1 ENABLES SIMPLE AND RAPID IMAGE FORMATION WITHOUT SERIOUS FOG GENERATION WHILE MINIMIZING ADVERSE EFFECTS ON THE ENVIRONMENT. FUJI PHOTO FILM CO., LTD. (JP) 2001-05-15 US disclosed
US-6228565-B1 USING AN ORGANONITROGEN COMPOUND; EXPOSURE; HEATING FUJI PHOTO FILM CO., LTD. (JP) 2001-05-08 US disclosed
US-6218095-B1 FORMING DYE THROUGH COUPLING FUJI PHOTO FILM CO., LTD. (JP) 2001-04-17 US disclosed