⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Alcohol SCHEMBL15105323 | 0.82 | ALDH1A1 (0.35) | — | |
| Bromoethane SCHEMBL1977825 | 0.82 | ALDH1A1 (0.35) | — | |
| Ethane SCHEMBL5851586 | 0.81 | — | — | |
| SCHEMBL11183068 | 0.80 | — | — | |
| SCHEMBL36991 | 0.80 | — | — | |
| SCHEMBL6065835 | 0.80 | — | — | |
| SCHEMBL9001327 | 0.79 | — | — | |
| Chloromethane SCHEMBL2964074 | 0.78 | — | — | |
| Methyl Alcohol SCHEMBL680896 | 0.78 | — | — | |
| Methane SCHEMBL4558431 | 0.77 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8956790-B2 | Positive photosensitive resin composition, and organic insulator film for display device and display device fabricated using the same | CHEIL INDUSTRIES INC. (KR) | 2015-02-17 | — | — | US | disclosed |
| US-20140178816-A1 | Positive Photosensitive Resin Composition, and Organic Insulator Film for Display Device and Display Device Fabricated Using the Same | CHEIL INDUSTRIES INC. (KR) | 2014-06-26 | — | — | US | disclosed |
| US-8329838-B2 | Norbornene-type polymers, compositions thereof and lithographic processes using such compositions | PROMERUS LLC (US) | 2012-12-11 | — | — | US | disclosed |
| EP-1853972-B1 | NORBORNENE-TYPE POLYMERS AND THEIR MANUFACTURE PROCESS | PROMERUS LLC (US) | 2011-07-20 | — | — | EP | disclosed |
| EP-2031007-B1 | Top-coat compositions with norbornene-type polymers and immersion lithographic processes using such compositions | TOKYO OHKA KOGYO CO LTD (JP) | 2011-07-20 | — | — | EP | disclosed |
| US-20110065878-A1 | Norbornene-Type Polymers, Compositions Thereof And Lithographic Processes Using Such Compositions | PROMERUS LLC (US) | 2011-03-17 | — | — | US | disclosed |
| US-7799883-B2 | copolymerizing norbornene monomers containing ester groups, sulonamide groups, ethers, alcohols in presence of (Acetonitrile) bis(triisopropylphosphine)palladium(acetate) tetrakis (pentafluorophenyl)borate catalyst and an optional cocatalyst lithium tetrakis(pentafluorophenyl)borate diethyl etherate | PROMERUS LLC (US) | 2010-09-21 | — | — | US | disclosed |
| EP-2031007-A2 | Norbornene-type polymers, compositions thereof and lithographic processes using such compositions | Promerus LLC (US) | 2009-03-04 | — | — | EP | disclosed |
| EP-1853972-A2 | NORBORNENE-TYPE POLYMERS, COMPOSITIONS THEREOF AND LITHOGRAPHIC PROCESSES USING SUCH COMPOSITIONS | Promerus LLC (US) | 2007-11-14 | — | — | EP | disclosed |
| US-20060234164-A1 | copolymerizing norbornene monomers containing ester groups, sulonamide groups, ethers, alcohols in presence of (Acetonitrile) bis(triisopropylphosphine)palladium(acetate) tetrakis (pentafluorophenyl)borate catalyst and an optional cocatalyst lithium tetrakis(pentafluorophenyl)borate diethyl etherate | PROMERUS LLC (US) | 2006-10-19 | — | — | US | disclosed |
| US-20060235174-A1 | Norbornene-type polymers, compositions thereof and lithographic processes using such compositions | PROMERUS LLC (US) | 2006-10-19 | — | — | US | disclosed |
| WO-2006091802-A2 | NORBORNENE-TYPE POLYMERS, COMPOSITIONS THEREOF AND LITHOGRAPHIC PROCESSES USING SUCH COMPOSITIONS | PROMERUS LLC (US) | 2006-08-31 | — | — | WO | disclosed |
| WO-2006091523-A2 | NORBORNENE-TYPE POLYMERS, COMPOSITIONS THEREOF AND LITHOGRAPHIC PROCESSES USING SUCH COMPOSITIONS | PROMERUS LLC (US) | 2006-08-31 | — | — | WO | disclosed |
| EP-0567539-A1 | IMPROVED THERMOPLASTIC COMPOSITION CONTAINING A STYRENE COPOLYMER RESIN. | EXXON CHEMICAL PATENTS INC (US) | 1993-11-03 | — | — | EP | disclosed |
| WO-1992012203-A1 | IMPROVED THERMOPLASTIC COMPOSITION CONTAINING A STYRENE COPOLYMER RESIN | EXXON CHEMICAL PATENTS INC. (US) | 1992-07-23 | — | — | WO | disclosed |
| US-5118761-A | Impact strength | EXXON CHEMICAL PATENTS INC. (US) | 1992-06-02 | — | — | US | disclosed |