SCHEMBL17136266

SCHEMBL17136266

CCCCC(F)(F)C(F)(F)F

nearest known ligand 0.35

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.35
LMNA P02545 1/20 0.35
CES2 O00748 4/20 0.34
LPAR1 Q92633 1/20 0.34
LPAR3 Q9UBY5 1/20 0.34
FAAH O00519 9/20 0.33
THRB P10828 1/20 0.33
CES1 P23141 8/20 0.32
MEN1 O00255 1/20 0.32
CYP1A2 P05177 1/20 0.32
KMT2A Q03164 1/20 0.32
HSD17B10 Q99714 1/20 0.32
FDPS P14324 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1221382 1.00 TSHR (0.35) TSHRLMNACES2LPAR1LPAR3
SCHEMBL9974576 0.91 CES2 (0.43) TSHRCES2LPAR1LPAR3FAAH
SCHEMBL17510336 0.91 CES2 (0.43) TSHRCES2LPAR1LPAR3FAAH
SCHEMBL45377 0.88 CES2 (0.46) TSHRCES2LPAR1LPAR3FAAH
SCHEMBL6037238 0.88 CES2 (0.46) TSHRCES2LPAR1LPAR3FAAH
SCHEMBL30892683 0.88 CES2 (0.46) TSHRCES2LPAR1LPAR3FAAH
SCHEMBL17510328 0.88 CES2 (0.46) TSHRCES2LPAR1LPAR3FAAH
SCHEMBL22268683 0.88 CES2 (0.46) TSHRCES2LPAR1LPAR3FAAH
SCHEMBL45268 0.88 CES2 (0.46) TSHRCES2LPAR1LPAR3FAAH
SCHEMBL19213219 0.87 TSHR (0.40) TSHRLMNACES2LPAR1LPAR3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10168616-B2 Photoresist composition and process of producing photoresist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2019-01-01 US disclosed
US-9562122-B2 Compound, resin, resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2017-02-07 US disclosed
US-20160053032-A1 COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-02-25 US disclosed
US-20150286137-A1 PHOTORESIST COMPOSITION AND PROCESS OF PRODUCING PHOTORESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2015-10-08 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20160053032-A1 COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN RER1, RFC1, RFC2 TSHR 2134/4885LMNA 1017/4885CES2 1498/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.