⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9460678 | 0.91 | — | — | |
| SCHEMBL7626788 | 0.91 | — | — | |
| SCHEMBL230924 | 0.77 | — | — | |
| SCHEMBL6895569 | 0.77 | NAAA (0.31) | — | |
| SCHEMBL9345649 | 0.74 | — | — | |
| SCHEMBL4445932 | 0.73 | — | — | |
| SCHEMBL5478038 | 0.73 | FDPS (0.32) | — | |
| SCHEMBL15013671 | 0.73 | — | — | |
| SCHEMBL7029276 | 0.73 | — | — | |
| SCHEMBL20391 | 0.73 | MIF (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115820145-B | Adhesive tape with crosslinked polyurethane carrier | 德莎欧洲股份公司 | 2025-04-22 | — | — | CN | disclosed |
| CN-115820145-A | Adhesive tape with cross-linked polyurethane carrier | 德莎欧洲股份公司 | 2023-03-21 | — | — | CN | disclosed |
| EP-3229075-B1 | PHOTORESIST COMPOSITION, METHOD FOR MANUFACTURING SAME, AND METHOD FOR FORMING RESIST PATTERN | JSR CORP (JP) | 2021-01-06 | — | — | EP | disclosed |
| US-10725376-B2 | Pattern-forming method | JSR CORPORATION (JP) | 2020-07-28 | — | — | US | disclosed |
| US-20200041898-A1 | RADIATION-SENSITIVE COMPOSITION AND RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2020-02-06 | — | — | US | disclosed |
| US-20190094689-A1 | RADIATION-SENSITIVE COMPOSITION AND PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2019-03-28 | — | — | US | disclosed |
| US-10209619-B2 | Composition and method of forming pattern using composition | JSR CORPORATION (JP) | 2019-02-19 | — | — | US | disclosed |
| US-10090163-B2 | Inorganic film-forming composition for multilayer resist processes, and pattern-forming method | JSR CORPORATION (JP) | 2018-10-02 | — | — | US | disclosed |
| US-20170362412-A1 | COMPOSITION FOR FILM FORMATION, AND PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2017-12-21 | — | — | US | disclosed |
| EP-3229075-A1 | PHOTORESIST COMPOSITION, METHOD FOR MANUFACTURING SAME, AND METHOD FOR FORMING RESIST PATTERN | JSR Corporation (JP) | 2017-10-11 | — | — | EP | disclosed |
| US-20170269476-A1 | PHOTORESIST COMPOSITION, PRODUCTION METHOD OF PHOTORESIST COMPOSITION, AND RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2017-09-21 | — | — | US | disclosed |
| US-20170184961-A1 | PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2017-06-29 | — | — | US | disclosed |
| US-20160349616-A1 | SEMICONDUCTOR DEVICE PRODUCTION COMPOSITION AND PATTERN FORMATION METHOD | JSR CORPORATION (JP) | 2016-12-01 | — | — | US | disclosed |
| US-20150364332-A1 | INORGANIC FILM-FORMING COMPOSITION FOR MULTILAYER RESIST PROCESSES, AND PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2015-12-17 | — | — | US | disclosed |
| US-20150284539-A1 | COMPOSITION FOR FILM FORMATION, AND PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2015-10-08 | — | — | US | disclosed |