Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.46 |
| ▸ | TP53 | P04637 | 1/20 | 0.46 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.46 |
| ▸ | MGLL | Q99685 | 5/20 | 0.40 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.38 |
| ▸ | DHFR | P00374 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5704284 | 0.94 | ALDH1A1 (0.44) | ALDH1A1TP53CYP3A4MGLLL3MBTL1 | |
| SCHEMBL9861630 | 0.90 | ALDH1A1 (0.39) | ALDH1A1TP53CYP3A4MGLLL3MBTL1 | |
| SCHEMBL9860876 | 0.85 | ALDH1A1 (0.38) | ALDH1A1TP53CYP3A4MGLLL3MBTL1 | |
| SCHEMBL1715029 | 0.81 | ALDH1A1 (0.46) | ALDH1A1TP53CYP3A4MGLLL3MBTL1 | |
| SCHEMBL9615793 | 0.81 | ALDH1A1 (0.46) | ALDH1A1TP53CYP3A4MGLLL3MBTL1 | |
| SCHEMBL25285163 | 0.81 | ALDH1A1 (0.46) | ALDH1A1TP53CYP3A4MGLLL3MBTL1 | |
| SCHEMBL25314656 | 0.81 | ALDH1A1 (0.46) | ALDH1A1TP53CYP3A4MGLLL3MBTL1 | |
| SCHEMBL1715943 | 0.81 | ALDH1A1 (0.46) | ALDH1A1TP53CYP3A4MGLLL3MBTL1 | |
| SCHEMBL1714878 | 0.79 | ALDH1A1 (0.44) | ALDH1A1TP53CYP3A4MGLLL3MBTL1 | |
| SCHEMBL31087240 | 0.79 | ALDH1A1 (0.44) | ALDH1A1TP53CYP3A4MGLLL3MBTL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-122095316-A | Composition for forming resist underlayer film | — | 2026-05-26 | — | — | CN | disclosed |
| WO-2025095106-A1 | RESIST UNDERLAYER FILM FORMATION COMPOSITION | 日産化学株式会社 | 2025-05-08 | — | — | WO | disclosed |
| CN-114746468-B | Method for producing polymer | 日产化学株式会社 | 2024-09-13 | — | — | CN | disclosed |
| US-20230103242-A1 | METHOD FOR PRODUCING POLYMER | NISSAN CHEMICAL CORPORATION (JP) | 2023-03-30 | — | — | US | disclosed |
| US-20230029997-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM | NISSAN CHEMICAL CORPORATION (JP) | 2023-02-02 | — | — | US | disclosed |
| WO-2021111977-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM | 日産化学株式会社 | 2021-06-10 | — | — | WO | disclosed |
| WO-2021111976-A1 | METHOD FOR PRODUCING POLYMER | 日産化学株式会社 | 2021-06-10 | — | — | WO | disclosed |
| US-9240327-B2 | Resist underlayer film-forming composition for EUV lithography containing condensation polymer | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2016-01-19 | — | — | US | disclosed |
| US-20140170567-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION FOR EUV LITHOGRAPHY CONTAINING CONDENSATION POLYMER | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2014-06-19 | — | — | US | disclosed |
| EP-1757986-B1 | ANTIREFLECTION FILM FOR SEMICONDUCTOR CONTAINING CONDENSATION TYPE POLYMER AND METHOD FOR FORMING PHOTORESIST PATTERN | NISSAN CHEMICAL IND LTD (JP) | 2014-05-14 | — | — | EP | disclosed |
| EP-1876495-A1 | COMPOSITION COMPRISING POLYMER HAVING ETHYLENE-DICARBONYL STRUCTURE FOR USE IN FORMING ANTI-REFLECTIVE COATING FOR LITHOGRAPHY | Nissan Chemical Industries, Ltd. (JP) | 2008-01-09 | — | — | EP | disclosed |
| US-20080003524-A1 | Sulfonate-Containing Anti-Reflective Coating Forming Composition for Lithography | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2008-01-03 | — | — | US | disclosed |
| CN-101052919-A | Sulfonate-containing composition for forming anti-reflective coating for lithography | NISSAN CHEMICAL IND LTD (JP) | 2007-10-10 | — | — | CN | disclosed |
| EP-1813987-A1 | SULFONIC-ESTER-CONTAINING COMPOSITION FOR FORMATION OF ANTIREFLECTION FILM FOR LITHOGRAPHY | Nissan Chemical Industries, Ltd. (JP) | 2007-08-01 | — | — | EP | disclosed |
| CN-1965268-A | Antireflection film for semiconductor containing condensation type polymer | NISSAN CHEMICAL IND LTD (JP) | 2007-05-16 | — | — | CN | disclosed |
| EP-1757986-A1 | ANTIREFLECTION FILM FOR SEMICONDUCTOR CONTAINING CONDENSATION TYPE POLYMER | Nissan Chemical Industries, Ltd. (JP) | 2007-02-28 | — | — | EP | disclosed |
| US-5034440-A | Halogenated polyesters modified with glycidyl groups for fireproof electrical wire covers | POLYPLASTICS CO., LTD. (JP) | 1991-07-23 | — | — | US | disclosed |
| EP-0065777-B1 | FLAME-RETARDANT RESIN COMPOSITION | TEIJIN LIMITED (JP) | 1986-07-23 | — | — | EP | disclosed |
| US-4417018-A | ORGANIC HALOGEN COMPOUND, ANTIMONY OXIDE TREATED WITH ALKOXYSILANE, POLYESTERS, MOLDINGS WITH IMPROVED STRENGTH DUE TO THERMOSTABILITY | TEIJIN LIMITED (JP) | 1983-11-22 | — | — | US | disclosed |
| EP-0065777-A1 | Flame-retardant resin composition | TEIJIN LIMITED (JP) | 1982-12-01 | — | — | EP | disclosed |