SCHEMBL1714569

SCHEMBL1714569

O=C(CCCCCC(=O)OCC1CO1)OCC1CO1

nearest known ligand 0.69

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
MGLL Q99685 3/20 0.60
LMNA P02545 1/20 0.58
POLB P06746 1/20 0.58
ALDH1A1 P00352 1/20 0.48
TP53 P04637 1/20 0.48
CYP3A4 P08684 1/20 0.48

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9547101 1.00 MGLL (0.60) MGLLLMNAPOLBALDH1A1TP53
SCHEMBL9547082 1.00 MGLL (0.60) MGLLLMNAPOLBALDH1A1TP53
SCHEMBL471820 1.00 MGLL (0.60) MGLLLMNAPOLBALDH1A1TP53
SCHEMBL936727 1.00 MGLL (0.60) MGLLLMNAPOLBALDH1A1TP53
SCHEMBL471890 1.00 MGLL (0.60) MGLLLMNAPOLBALDH1A1TP53
SCHEMBL2575401 1.00 MGLL (0.60) MGLLLMNAPOLBALDH1A1TP53
SCHEMBL9546992 1.00 MGLL (0.60) MGLLLMNAPOLBALDH1A1TP53
SCHEMBL471871 1.00 MGLL (0.60) MGLLLMNAPOLBALDH1A1TP53
SCHEMBL1715123 1.00 MGLL (0.60) MGLLLMNAPOLBALDH1A1TP53
SCHEMBL9547014 1.00 MGLL (0.60) MGLLLMNAPOLBALDH1A1TP53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 41 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4418156-A DICARBOXYLIC ACID-EPOXY ALCOHOL ESTERS CHEMISCHE WERKE HULS AG (DE) 1983-11-29 US claimed
US-4393146-A DIMENSIONALLY STABLE FOAMS CHEMISCHE WERKE HULS AG (DE) 1983-07-12 US claimed
EP-3778821-B1 EPOXY ADHESIVE COMPOSITION SEKISUI CHEMICAL CO LTD (JP) 2025-11-05 EP disclosed
US-12318748-B2 Microcapsules for use with polyurethane and epoxy adhesives THE JOHNS HOPKINS UNIVERSITY (US) 2025-06-03 US disclosed
US-12291632-B2 Epoxy resin composition SEKISUI CHEMICAL CO., LTD. (JP) 2025-05-06 US disclosed
EP-3959281-B1 ADHESION PROMOTERS FOR STRUCTURAL ADHESIVE APPLICATIONS 3M INNOVATIVE PROPERTIES COMPANY (US) 2024-07-17 EP disclosed
US-11932785-B2 Epoxy adhesive composition SEKISUI CHEMICAL CO., LTD. (JP) 2024-03-19 US disclosed
EP-3778694-B1 EPOXY RESIN COMPOSITION SEKISUI CHEMICAL CO LTD (JP) 2024-02-07 EP disclosed
CN-117015582-A Composition for forming release layer and release layer 日产化学株式会社 2023-11-07 CN disclosed
US-20230320940-A1 PHOTOCATIONICALLY CURABLE COMPOSITION AND DENTAL CURABLE COMPOSITION TOKUYAMA DENTAL CORPORATION (JP) 2023-10-12 US disclosed
CN-111868137-B Epoxy resin composition 积水化学工业株式会社 2023-08-15 CN disclosed
EP-2085823-B1 METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING QUADRUPLE-LAYER LAMINATE NISSAN CHEMICAL IND LTD (JP) 2013-01-16 EP disclosed
EP-1876495-B1 COMPOSITION COMPRISING POLYMER HAVING ETHYLENE-DICARBONYL STRUCTURE FOR USE IN FORMING ANTI-REFLECTIVE COATING FOR LITHOGRAPHY NISSAN CHEMICAL IND LTD (JP) 2011-07-20 EP disclosed
US-7842620-B2 Method for manufacturing semiconductor device using quadruple-layer laminate NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2010-11-30 US disclosed
US-20100022089-A1 Method for manufacturing semiconductor device using quadruple-layer laminate NISSIAN CHEMICAL INDUSTRIES, LTD. (JP) 2010-01-28 US disclosed
US-7632626-B2 a polyester copolymer of fumaric acid and a diglycidyl ether with backbone of groups selected from substituted or unsubstituted alkylene, phenylene, napthylene, anthrylene, phthalic acid, triazinetrione etc. 1,3,4,6-tetrakis(methtoxymethyl)glycoluril crosslinker, a sulfonium or iodonium acid generator NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2009-12-15 US disclosed
CN-101553549-A Photobase generator and photocurable resin composition ASAHI CHEMICAL CORP (JP) 2009-10-07 CN disclosed
EP-2085823-A1 METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING QUADRUPLE-LAYER LAMINATE Nissan Chemical Industries, Ltd. (JP) 2009-08-05 EP disclosed
US-20080268379-A1 a polyester copolymer of fumaric acid and a diglycidyl ether with backbone of groups selected from substituted or unsubstituted alkylene, phenylene, napthylene, anthrylene, phthalic acid, triazinetrione etc. 1,3,4,6-tetrakis(methtoxymethyl)glycoluril crosslinker, a sulfonium or iodonium acid generator NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2008-10-30 US disclosed
EP-1876495-A1 COMPOSITION COMPRISING POLYMER HAVING ETHYLENE-DICARBONYL STRUCTURE FOR USE IN FORMING ANTI-REFLECTIVE COATING FOR LITHOGRAPHY Nissan Chemical Industries, Ltd. (JP) 2008-01-09 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20230320940-A1 PHOTOCATIONICALLY CURABLE COMPOSITION AND DENTAL CURABLE COMPOSITION CTH, GCLC, AAAS MGLL 3615/4885LMNA 2602/4885POLB 782/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.