Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TP53 | P04637 | 1/20 | 0.35 |
| ▸ | HBB | P68871 | 1/20 | 0.35 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.35 |
| ▸ | MMP9 | P14780 | 1/20 | 0.32 |
| ▸ | OPRM1 | P35372 | 1/20 | 0.30 |
| ▸ | OPRK1 | P41145 | 1/20 | 0.30 |
| ▸ | OPRL1 | P41146 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1715055 | 0.81 | TP53 (0.33) | TP53HBBSMN1; SMN2 | |
| SCHEMBL12268625 | 0.81 | TP53 (0.40) | TP53HBBSMN1; SMN2OPRM1OPRK1 | |
| SCHEMBL2344619 | 0.80 | TP53 (0.34) | TP53HBBSMN1; SMN2 | |
| SCHEMBL1715245 | 0.78 | TP53 (0.33) | TP53HBBSMN1; SMN2 | |
| SCHEMBL12268505 | 0.76 | MMP9 (0.33) | MMP9 | |
| SCHEMBL170841 | 0.74 | TP53 (0.37) | TP53HBBSMN1; SMN2OPRM1OPRK1 | |
| SCHEMBL2344818 | 0.74 | TP53 (0.32) | TP53HBBSMN1; SMN2 | |
| SCHEMBL2778588 | 0.72 | CYP3A4 (0.42) | TP53HBBSMN1; SMN2MMP9OPRM1 | |
| SCHEMBL11089324 | 0.72 | TP53 (0.47) | TP53HBBSMN1; SMN2OPRM1OPRK1 | |
| SCHEMBL22483108 | 0.71 | SMN1; SMN2 (0.42) | TP53HBBSMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-122095316-A | Composition for forming resist underlayer film | — | 2026-05-26 | — | — | CN | disclosed |
| WO-2025095106-A1 | RESIST UNDERLAYER FILM FORMATION COMPOSITION | 日産化学株式会社 | 2025-05-08 | — | — | WO | disclosed |
| CN-114746468-B | Method for producing polymer | 日产化学株式会社 | 2024-09-13 | — | — | CN | disclosed |
| US-20230103242-A1 | METHOD FOR PRODUCING POLYMER | NISSAN CHEMICAL CORPORATION (JP) | 2023-03-30 | — | — | US | disclosed |
| US-20230029997-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM | NISSAN CHEMICAL CORPORATION (JP) | 2023-02-02 | — | — | US | disclosed |
| CN-114761876-A | Composition for forming resist underlayer film | 日产化学株式会社 | 2022-07-15 | — | — | CN | disclosed |
| CN-114746468-A | Method for producing polymer | 日产化学株式会社 | 2022-07-12 | — | — | CN | disclosed |
| WO-2021111976-A1 | METHOD FOR PRODUCING POLYMER | 日産化学株式会社 | 2021-06-10 | — | — | WO | disclosed |
| WO-2021111977-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM | 日産化学株式会社 | 2021-06-10 | — | — | WO | disclosed |
| US-9240327-B2 | Resist underlayer film-forming composition for EUV lithography containing condensation polymer | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2016-01-19 | — | — | US | disclosed |
| US-7632626-B2 | a polyester copolymer of fumaric acid and a diglycidyl ether with backbone of groups selected from substituted or unsubstituted alkylene, phenylene, napthylene, anthrylene, phthalic acid, triazinetrione etc. 1,3,4,6-tetrakis(methtoxymethyl)glycoluril crosslinker, a sulfonium or iodonium acid generator | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2009-12-15 | — | — | US | disclosed |
| US-7595144-B2 | Sulfonate-containing anti-reflective coating forming composition for lithography | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2009-09-29 | — | — | US | disclosed |
| EP-2085823-A1 | METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING QUADRUPLE-LAYER LAMINATE | Nissan Chemical Industries, Ltd. (JP) | 2009-08-05 | — | — | EP | disclosed |
| US-20080268379-A1 | a polyester copolymer of fumaric acid and a diglycidyl ether with backbone of groups selected from substituted or unsubstituted alkylene, phenylene, napthylene, anthrylene, phthalic acid, triazinetrione etc. 1,3,4,6-tetrakis(methtoxymethyl)glycoluril crosslinker, a sulfonium or iodonium acid generator | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2008-10-30 | — | — | US | disclosed |
| CN-101160549-A | Composition comprising polymer having ethylene-dicarbonyl structure for use in forming anti-reflective coating for lithography | NISSAN CHEMICAL IND LTD (JP) | 2008-04-09 | — | — | CN | disclosed |
| US-20080038678-A1 | Condensation Type Polymer-Containing Anti-Reflective Coating For Semiconductor | NISSAN CHEMICAL INDUSTRIES LTD. (JP) | 2008-02-14 | — | — | US | disclosed |
| EP-1876495-A1 | COMPOSITION COMPRISING POLYMER HAVING ETHYLENE-DICARBONYL STRUCTURE FOR USE IN FORMING ANTI-REFLECTIVE COATING FOR LITHOGRAPHY | Nissan Chemical Industries, Ltd. (JP) | 2008-01-09 | — | — | EP | disclosed |
| US-20080003524-A1 | Sulfonate-Containing Anti-Reflective Coating Forming Composition for Lithography | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2008-01-03 | — | — | US | disclosed |
| EP-1813987-A1 | SULFONIC-ESTER-CONTAINING COMPOSITION FOR FORMATION OF ANTIREFLECTION FILM FOR LITHOGRAPHY | Nissan Chemical Industries, Ltd. (JP) | 2007-08-01 | — | — | EP | disclosed |
| EP-1757986-A1 | ANTIREFLECTION FILM FOR SEMICONDUCTOR CONTAINING CONDENSATION TYPE POLYMER | Nissan Chemical Industries, Ltd. (JP) | 2007-02-28 | — | — | EP | disclosed |