SCHEMBL17175372

SCHEMBL17175372

CCC(C)c1ccc(OC(OCC(C)C)C(C)C)cc1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.43
TSHR P16473 2/20 0.43
SLC7A5 Q01650 1/20 0.42
GAA P10253 3/20 0.39
MAPT P10636 1/20 0.39
MEN1 O00255 1/20 0.37
KMT2A Q03164 1/20 0.37
TDP1 Q9NUW8 1/20 0.37
NPC1 O15118 2/20 0.35
RAB9A P51151 2/20 0.35
HSP90AA1 P07900 1/20 0.34
L3MBTL1 Q9Y468 1/20 0.34
CYP2C9 P11712 1/20 0.33
HPGD P15428 2/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
LTB4R Q15722 1/20 0.33
LTB4R2 Q9NPC1 1/20 0.33
USP2 O75604 1/20 0.33
PKM P14618 1/20 0.33
ALOX15 P16050 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2607792 0.87 ALDH1A1 (0.45) ALDH1A1TSHRSLC7A5GAAMAPT
SCHEMBL14408418 0.84 ALDH1A1 (0.43) ALDH1A1TSHRSLC7A5GAAMAPT
SCHEMBL12019113 0.83 ALDH1A1 (0.45) ALDH1A1TSHRSLC7A5GAAMAPT
SCHEMBL111985 0.83 ALDH1A1 (0.45) ALDH1A1TSHRSLC7A5GAAMAPT
SCHEMBL11926013 0.82 ALDH1A1 (0.44) ALDH1A1TSHRSLC7A5GAAMAPT
SCHEMBL4545201 0.81 ALDH1A1 (0.46) ALDH1A1TSHRSLC7A5GAAMAPT
SCHEMBL17175359 0.81 ALDH1A1 (0.41) ALDH1A1TSHRSLC7A5GAAMAPT
SCHEMBL14492742 0.81 ALDH1A1 (0.46) ALDH1A1TSHRSLC7A5GAAMAPT
SCHEMBL16683081 0.80 SLC7A5 (0.54) ALDH1A1TSHRSLC7A5GAAMAPT
SCHEMBL17070151 0.80 ALDH1A1 (0.45) ALDH1A1TSHRSLC7A5GAAMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20150293446-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, RESIST FILM USING THE SAME, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2015-10-15 US disclosed