Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ABCB11 | O95342 | 1/20 | 0.43 |
| ▸ | AKR1C3 | P42330 | 5/20 | 0.36 |
| ▸ | AKR1C2 | P52895 | 5/20 | 0.36 |
| ▸ | AKR1C1 | Q04828 | 1/20 | 0.36 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.36 |
| ▸ | TSHR | P16473 | 1/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.36 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.35 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL825446 | 0.88 | ALDH1A1 (0.43) | ALDH1A1TSHRKMT2ANPSR1 | |
| SCHEMBL17147968 | 0.88 | ABCB11 (0.41) | ABCB11AKR1C3AKR1C2AKR1C1PTGS1 | |
| SCHEMBL17175407 | 0.86 | ABCB11 (0.40) | ABCB11AKR1C3AKR1C2AKR1C1PTGS1 | |
| SCHEMBL2607766 | 0.86 | ALDH1A1 (0.43) | ALDH1A1TSHRKMT2ANPSR1 | |
| SCHEMBL6721652 | 0.86 | BCHE (0.40) | KMT2A | |
| SCHEMBL11922905 | 0.81 | ABCB11 (0.39) | ABCB11AKR1C3AKR1C2AKR1C1PTGS1 | |
| SCHEMBL15503569 | 0.80 | ABCB11 (0.35) | ABCB11AKR1C3AKR1C2AKR1C1PTGS1 | |
| SCHEMBL11999042 | 0.80 | ABCB11 (0.43) | ABCB11AKR1C3AKR1C2AKR1C1PTGS1 | |
| SCHEMBL17147967 | 0.80 | PPARA (0.36) | ALDH1A1TSHRKMT2AHIF1A | |
| SCHEMBL12054784 | 0.80 | PDE4B (0.43) | ALDH1A1HIF1A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20150293446-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, RESIST FILM USING THE SAME, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2015-10-15 | — | — | US | disclosed |