SCHEMBL17189685

SCHEMBL17189685

C[N+](C)(C)CCOC(=O)C1CCCCC1C(=O)O

nearest known ligand 0.67

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CHRM5 P08912 6/20 0.44
CHRM1 P11229 6/20 0.44
CHRM3 P20309 6/20 0.44
CHRM2 P08172 5/20 0.44
CHRM4 P08173 5/20 0.44
CHRNB2 P17787 4/20 0.44
CHRNA4 P43681 4/20 0.44
CHRNA7 P36544 3/20 0.44
HTR1A P08908 2/20 0.44
SMN1; SMN2 Q16637 2/20 0.44
ADRA2A P08913 1/20 0.44
ADRA1A P35348 1/20 0.44
PGR P06401 1/20 0.44
TBXA2R P21731 1/20 0.44
CHRNB4 P30926 1/20 0.44
CHRNA3 P32297 1/20 0.44
CHRNA10 Q9GZZ6 1/20 0.44
CHRNA9 Q9UGM1 1/20 0.44
CYP2C19 P33261 2/20 0.43
LMNA P02545 2/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17189686 0.84 CHRM2 (0.39) CHRM1CHRM3CHRM2TP53CYP3A4
SCHEMBL12974493 0.84 TP53 (0.50) LMNATP53CYP3A4
SCHEMBL1296712 0.81 PPM1B (0.50) TP53CYP3A4
SCHEMBL10715842 0.80 TP53 (0.47) LMNATP53CYP3A4
SCHEMBL21561034 0.80 TP53 (0.41) TP53CYP3A4
SCHEMBL1296367 0.79 TP53 (0.46) LMNATP53CYP3A4
SCHEMBL10645221 0.79 TP53 (0.46) LMNATP53CYP3A4
SCHEMBL16352905 0.79 CHRM5 (0.50) CHRM5CHRM1CHRM3CHRM2CHRM4
SCHEMBL16121021 0.78 ALDH1A1 (0.42) CHRM5CHRM1CHRM3CHRM2CHRM4
SCHEMBL16121103 0.78 ALDH1A1 (0.42) CHRM5CHRM1CHRM3CHRM2CHRM4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023153296-A1 RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD JSR株式会社 2023-08-17 WO disclosed
US-20170153545-A1 PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2017-06-01 US disclosed
US-20170153545-A1 PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2017-06-01 US disclosed
US-20150301451-A1 PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2015-10-22 US disclosed
US-20150301451-A1 PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2015-10-22 US disclosed