Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CHRM2 | P08172 | 1/20 | 0.39 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.39 |
| ▸ | CHRM3 | P20309 | 1/20 | 0.39 |
| ▸ | TP53 | P04637 | 1/20 | 0.39 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.39 |
| ▸ | PPM1B | O75688 | 1/20 | 0.35 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.35 |
| ▸ | PPP1CC | P36873 | 1/20 | 0.35 |
| ▸ | PEPD | P12955 | 1/20 | 0.34 |
| ▸ | HTT | P42858 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17189685 | 0.84 | CHRM5 (0.44) | CHRM2CHRM1CHRM3TP53CYP3A4 | |
| SCHEMBL1296712 | 0.82 | PPM1B (0.50) | TP53CYP3A4PPM1BPTPN1PPP1CC | |
| SCHEMBL12974493 | 0.81 | TP53 (0.50) | TP53CYP3A4PEPD | |
| SCHEMBL16352924 | 0.80 | ALDH1A1 (0.44) | CHRM2CHRM1CHRM3PPM1BPTPN1 | |
| Propylene Glycol SCHEMBL9893772 | 0.79 | PPM1B (0.42) | TP53CYP3A4PPM1BPTPN1PPP1CC | |
| SCHEMBL16121021 | 0.79 | ALDH1A1 (0.42) | CHRM2CHRM1CHRM3TP53CYP3A4 | |
| SCHEMBL16352894 | 0.79 | ALDH1A1 (0.46) | CHRM2CHRM1CHRM3HTT | |
| SCHEMBL5489415 | 0.79 | ALDH1A1 (0.42) | CHRM2CHRM1CHRM3TP53CYP3A4 | |
| SCHEMBL16121103 | 0.79 | ALDH1A1 (0.42) | CHRM2CHRM1CHRM3TP53CYP3A4 | |
| SCHEMBL1296512 | 0.79 | ALDH1A1 (0.42) | CHRM2CHRM1CHRM3TP53CYP3A4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20170153545-A1 | PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2017-06-01 | — | — | US | disclosed |
| US-20170153545-A1 | PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2017-06-01 | — | — | US | disclosed |
| US-20150301451-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2015-10-22 | — | — | US | disclosed |
| US-20150301451-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2015-10-22 | — | — | US | disclosed |