SCHEMBL1719146

SCHEMBL1719146

CCCCc1c(CC(C(=O)OC2CC(C)(C)N(C)C(C)(C)C2)C(=O)OC2CC(C)(C)N(C)C(C)(C)C2)cc(C(C)(C)C)c(O)c1C(C)(C)C

nearest known ligand 0.33

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
GAA P10253 2/20 0.33
PKM P14618 1/20 0.33
HTT P42858 1/20 0.33
F2R P25116 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1937304 0.96 GAA (0.32) GAAPKMHTT
SCHEMBL11494088 0.83 GAA (0.35) GAAPKMHTT
SCHEMBL7759198 0.80 GAA (0.37) GAAPKMHTTF2R
SCHEMBL2687904 0.80 GAA (0.40) GAAPKMHTT
SCHEMBL11863851 0.77 GAA (0.39) GAAPKMHTT
SCHEMBL27623644 0.77 NR5A2 (0.36) GAAHTTF2R
SCHEMBL9245857 0.77 GAA (0.35) GAAPKMHTT
SCHEMBL10000628 0.76 GAA (0.39) GAAPKMHTTF2R
SCHEMBL3450269 0.76 GAA (0.37) GAAPKMHTTF2R
SCHEMBL10064556 0.76 KMT2A (0.39) GAAPKMHTTF2R

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240206322-A1 OPTICAL SEMICONDUCTOR DEVICE, METHOD FOR MANUFACTURING SAME, SOLID-STATE IMAGING DEVICE, AND ELECTRONIC DEVICE KANEKA CORPORATION (JP) 2024-06-20 US disclosed
WO-2023192919-A1 EASY FLOW THERMOPLASTIC POLYURETHANE (TPU) BASF SE (DE) 2023-10-05 WO disclosed
US-11124594-B2 Polyurethane based on renewable raw materials BASF SE (DE) 2021-09-21 US disclosed
US-10294390-B2 Coating agent, and coating layer and film using same AGC Inc. (JP) 2019-05-21 US disclosed
US-20170335047-A1 POLYURETHANE DISPERSIONS BASED ON RENEWABLE RAW MATERIALS BASF SE (DE) 2017-11-23 US disclosed
EP-2865726-B1 COATING AGENT, AND COATING FILM AND FILM EACH USING SAME ASAHI GLASS CO LTD (JP) 2017-01-11 EP disclosed
US-20160152761-A1 POLYURETHANE BASED ON RENEWABLE RAW MATERIALS BASF SE (DE) 2016-06-02 US disclosed
EP-2933281-A1 CURABLE RESIN COMPOSITION, LAMINATE USING SAME, AND MANUFACTURING METHOD THEREFOR Asahi Glass Company, Limited (JP) 2015-10-21 EP disclosed
US-20150291725-A1 CURABLE RESIN COMPOSITION, AND LAMINATE USING SAME AND PROCESS FOR ITS PRODUCTION ASAHI GLASS COMPANY, LIMITED (JP) 2015-10-15 US disclosed
EP-2865726-A1 COATING AGENT, AND COATING FILM AND FILM EACH USING SAME Asahi Glass Company, Limited (JP) 2015-04-29 EP disclosed
US-20150057409-A1 COATING AGENT, AND COATING LAYER AND FILM USING SAME ASAHI GLASS COMPANY, LIMITED (JP) 2015-02-26 US disclosed
EP-2169018-B1 Ink composition and inkjet recording method FUJIFILM CORP (JP) 2012-01-18 EP disclosed
EP-2169022-B1 Ink composition and inkjet recording method FUJIFILM CORP (JP) 2011-11-16 EP disclosed
WO-2011132113-A2 MERCURY- AND SCANDIUM - FREE HIGH INTENSITY GAS - DISCHARGE LAMP KONINKLIJKE PHILIPS ELECTRONICS N.V. (NL) 2011-10-27 WO disclosed
US-20110166316-A1 POLYURETHANES BASED ON POLYESTER DIOLS WITH IMPROVED CRYSTALLIZATION BEHAVIOR BASF SE (DE) 2011-07-07 US disclosed
US-20100080925-A1 INK COMPOSITION AND INKJET RECORDING METHOD FUJIFILM CORPORATION (JP) 2010-04-01 US disclosed
EP-2169022-A1 Ink composition and inkjet recording method Fujifilm Corporation (JP) 2010-03-31 EP disclosed
EP-2169018-A2 Ink composition and inkjet recording method Fujifilm Corporation (JP) 2010-03-31 EP disclosed
EP-0457048-A1 Radiation-resistant propylene polymer composition and radiation sterilized articles therefrom MONTELL NORTH AMERICA INC. (US) 1991-11-21 EP disclosed
US-4278590-A AUTOMOBILE FINISHES CIBA-GEIGY CORPORATION (US) 1981-07-14 US disclosed