⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10282542 | 1.00 | — | — | |
| SCHEMBL10282575 | 1.00 | — | — | |
| SCHEMBL1742998 | 0.90 | LMNA (0.58) | — | |
| SCHEMBL2348889 | 0.88 | — | — | |
| Ethambutol SCHEMBL4029 | 0.82 | LMNA (1.00) | — | |
| Ethambutol SCHEMBL2636850 | 0.82 | LMNA (1.00) | — | |
| Ethambutol SCHEMBL15479016 | 0.82 | LMNA (1.00) | — | |
| Ethambutol SCHEMBL3399 | 0.82 | LMNA (1.00) | — | |
| Ethambutol SCHEMBL2961583 | 0.82 | LMNA (1.00) | — | |
| Ethambutol SCHEMBL9906602 | 0.82 | LMNA (1.00) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 205 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12325844-B2 | Photoresist remover | VERSUM MATERIALS US, LLC (US) | 2025-06-10 | — | — | US | claimed |
| WO-2025108836-A1 | COMPOSITIONS FOR REMOVING PHOTORESIST AND ETCH RESIDUES, METHODS OF USING AND USE THEREOF | MERCK PATENT GMBH (DE) | 2025-05-30 | — | — | WO | claimed |
| CN-118223024-A | Etching solution for copper thick film | 松下知识产权经营株式会社 | 2024-06-21 | — | — | CN | claimed |
| CN-112859552-B | Application of vanadium oxide corrosion inhibition fluorine-containing stripping liquid | 上海新阳半导体材料股份有限公司 | 2024-01-05 | — | — | CN | claimed |
| CN-112859553-B | Vanadium oxide corrosion inhibition fluorine-containing stripping solution | 上海新阳半导体材料股份有限公司 | 2023-11-10 | — | — | CN | claimed |
| CN-112859554-B | Preparation method of vanadium oxide corrosion inhibition fluorine-containing stripping liquid | 上海新阳半导体材料股份有限公司 | 2023-11-10 | — | — | CN | claimed |
| CN-110361941-B | Positive photoresist stripping liquid, preparation method and application thereof | 上海新阳半导体材料股份有限公司 | 2023-02-03 | — | — | CN | claimed |
| US-20220333044-A1 | Photoresist Remover | VERSUM MATERIALS US, LLC (US) | 2022-10-20 | — | — | US | claimed |
| EP-4038173-A1 | PHOTORESIST REMOVER | Versum Materials US, LLC (US) | 2022-08-10 | — | — | EP | claimed |
| EP-3037511-B1 | SEMI-AQUEOUS PHOTORESIST OR SEMICONDUCTOR MANUFACTURING RESIDUE STRIPPING AND CLEANING COMPOSITION WITH IMPROVED SILICON PASSIVATION | VERSUM MAT US LLC (US) | 2022-07-06 | — | — | EP | claimed |
| EP-2649109-A1 | POLYURETHANE ELASTOMERS MADE USING MIXTURES OF ALIPHATIC DIOL CHAIN EXTENDER AND SECONDARY AMINE | Dow Global Technologies LLC (US) | 2013-10-16 | — | — | EP | claimed |
| CN-102666745-A | Conductive ink composition without forming particles and method for producing same | DONGJIN SEMICHEM CO LTD | 2012-09-12 | — | — | CN | claimed |
| WO-2012078322-A1 | POLYURETHANE ELASTOMERS MADE USING MIXTURES OF ALIPHATIC DIOL CHAIN EXTENDER AND SECONDARY AMINE | DOW GLOBAL TECHNOLOGIES LLC (US) | 2012-06-14 | — | — | WO | claimed |
| EP-1031884-B1 | Resist stripping agent and process of producing semiconductor devices using the same | MITSUBISHI GAS CHEMICAL CO (JP) | 2012-01-11 | — | — | EP | claimed |
| EP-2340811-A1 | Ph-sensitive block copolymer forming polyionic complex micelles and drug or protein carrier using the same | Sungkyunkwan University Foundation for Corporate Collaboration (KR) | 2011-07-06 | — | — | EP | claimed |
| US-7968507-B2 | Composition for stripping and stripping method | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2011-06-28 | — | — | US | claimed |
| US-20110150978-A1 | PH-SENSITIVE BLOCK COPOLYMER FORMING POLYIONIC COMPLEX MICELLES AND DRUG OR PROTEIN CARRIER USING THE SAME | SUNGKYUNKWAN UNIVERSITY FOUNDATION FOR CORPORATE COLLABORATION (KR) | 2011-06-23 | — | — | US | claimed |
| US-20090084406-A1 | Composition for stripping and stripping method | SAMSUNG ELECTRONICS CO., LTD. | 2009-04-02 | — | — | US | claimed |
| CN-100406453-C | 4-anilino-quinazoline derivatives as antiproliferative agents | ASTRAZENECA AB (SE) | 2008-07-30 | — | — | CN | claimed |
| CN-1809360-A | 4-anilino-quinazoline derivatives as antiproliferative agents | ASTRAZENECA AB (SE) | 2006-07-26 | — | — | CN | claimed |