SCHEMBL1720232

SCHEMBL1720232

OCCON(CO)OCCO

nearest known ligand 0.39

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.39
MAPK1 P28482 1/20 0.39
MEN1 O00255 1/20 0.37
KMT2A Q03164 1/20 0.37
ALDH1A1 P00352 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6232031 0.80 TSHR (0.39) TSHRMAPK1MEN1KMT2AALDH1A1
SCHEMBL4130583 0.78 TSHR (0.37) TSHRMAPK1MEN1KMT2AALDH1A1
SCHEMBL35604 0.75 ALDH1A1 (0.41) TSHRMAPK1MEN1KMT2AALDH1A1
SCHEMBL4970820 0.75 TSHR (0.35) TSHRMAPK1MEN1KMT2AALDH1A1
SCHEMBL28125944 0.75 ALDH1A1 (0.41) TSHRMAPK1MEN1KMT2AALDH1A1
SCHEMBL144877 0.75 BLM (0.38) TSHRMAPK1ALDH1A1
SCHEMBL11586972 0.75 TSHR (0.30) TSHRMAPK1
SCHEMBL1952750 0.73
SCHEMBL168997 0.73 BLM (0.37) TSHR
SCHEMBL11682764 0.73 TSHR (0.33) TSHRMAPK1MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 46 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119800702-A Wear-resistant specially-integrated bamboo-nylon knitted single-sided fabric 广东志合同辉科技有限公司 2025-04-11 CN claimed
CN-119661802-A Low modulus low water absorption polyurethane micro-pore mattress 山东奥卓新材料有限公司 2025-03-21 CN claimed
CN-119505159-A Preparation method and application of polyurethane micro-pore mattress with low modulus and low water absorption 山东奥卓新材料有限公司 2025-02-25 CN claimed
CN-118909174-A Carboxyl styrene-butadiene latex for exterior wall coating and preparation method thereof 杭州龙驹合成材料有限公司 2024-11-08 CN claimed
CN-115627630-B Anti-pilling fabric and preparation method and application thereof 北京铜牛曙光科技有限公司 2024-04-30 CN claimed
CN-117903392-A Melamine resin retanning agent and preparation method thereof 邯郸市肥乡区九驰新材料科技有限公司 2024-04-19 CN claimed
CN-115627630-A Anti-pilling fabric and preparation method and application thereof 北京铜牛曙光科技有限公司 2023-01-20 CN claimed
CN-104629700-A Sulfur removal agent for water production oil well and water production gas well UNIV CHENGDU TECHNOLOGY 2015-05-20 CN claimed
EP-1031884-B1 Resist stripping agent and process of producing semiconductor devices using the same MITSUBISHI GAS CHEMICAL CO (JP) 2012-01-11 EP claimed
US-7968507-B2 Composition for stripping and stripping method SAMSUNG ELECTRONICS CO., LTD. (KR) 2011-06-28 US claimed
US-20090084406-A1 Composition for stripping and stripping method SAMSUNG ELECTRONICS CO., LTD. 2009-04-02 US claimed
CN-101398639-A Composition for stripping and stripping method SAMSUNG ELECTRONICS CO LTD (KR) 2009-04-01 CN claimed
US-20030186175-A1 RESIST STRIPPING AGENT AND PROCESS OF PRODUCING SEMICONDUCTOR DEVICES USING THE SAME IKEMOTO KAZUTO (JP) 2003-10-02 US claimed
EP-1031884-A2 Resist stripping agent and process of producing semiconductor devices using the same MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2000-08-30 EP claimed
EP-0792146-A1 INACTIVATION OF PATHOGENS USING HYDROXYMETHYLAMINES HEMASURE, INC. (US) 1997-09-03 EP claimed
WO-1997002028-A1 INACTIVATION OF PATHOGENS USING HYDROXYMETHYLAMINES HEMASURE, INC. (US) 1997-01-23 WO claimed
EP-0122523-A2 Diazotype compositions and materials Andrews Paper and Chemical Co., Inc. (US) 1984-10-24 EP claimed
JP-62195304-A None JP disclosed
WO-1997002028-A1 INACTIVATION OF PATHOGENS USING HYDROXYMETHYLAMINES HEMASURE, INC. (US) 1997-01-23 WO disclosed
JP-S62195304-A INDUSTRIAL ANTISEPTIC DAINIPPON INK & CHEM INC 1987-08-28 JP disclosed