⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6155898 | 0.78 | — | — | |
| SCHEMBL1117588 | 0.76 | — | — | |
| SCHEMBL4148818 | 0.74 | — | — | |
| SCHEMBL13213123 | 0.74 | — | — | |
| SCHEMBL14599298 | 0.74 | — | — | |
| SCHEMBL13893582 | 0.72 | LMNA (0.31) | — | |
| SCHEMBL14115771 | 0.72 | — | — | |
| SCHEMBL990396 | 0.72 | ADH1B (0.54) | — | |
| SCHEMBL12118829 | 0.72 | — | — | |
| SCHEMBL1117801 | 0.72 | ADH1B (0.54) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1031884-B1 | Resist stripping agent and process of producing semiconductor devices using the same | MITSUBISHI GAS CHEMICAL CO (JP) | 2012-01-11 | — | — | EP | claimed |
| US-11059723-B2 | Renewable flame-retardant compounds derived from muconic acid | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2021-07-13 | — | — | US | disclosed |
| US-4293672-A | Process for stabilizing polyester compositions | SHELL OIL COMPANY (US) | 1981-10-06 | — | — | US | disclosed |