SCHEMBL17239659

SCHEMBL17239659

CCO[Si](CCCOC1CCCCO1)(OCC)OCC

nearest known ligand 0.41

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 1/20 0.41
KMT2A Q03164 1/20 0.41
KDM4C Q9H3R0 1/20 0.38
NPC1 O15118 1/20 0.37
RAB9A P51151 1/20 0.37
L3MBTL1 Q9Y468 1/20 0.35
P2RX3 P56373 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7110260 0.91 MEN1 (0.31) MEN1KMT2A
SCHEMBL1225384 0.90 MEN1 (0.40) MEN1KMT2AKDM4CNPC1RAB9A
SCHEMBL19409176 0.89 MEN1 (0.33) MEN1KMT2A
SCHEMBL19409217 0.88 MEN1 (0.35) MEN1KMT2A
SCHEMBL19409211 0.88 MEN1 (0.35) MEN1KMT2A
SCHEMBL17354084 0.86 MEN1 (0.34) MEN1KMT2AKDM4CNPC1RAB9A
SCHEMBL1224347 0.85 MEN1 (0.40) MEN1KMT2AKDM4CNPC1RAB9A
SCHEMBL1056435 0.84 NPC1 (0.43) MEN1KMT2AKDM4CNPC1RAB9A
SCHEMBL1224517 0.84 MEN1 (0.38) MEN1KMT2AKDM4CNPC1RAB9A
SCHEMBL1224823 0.81 MEN1 (0.35) MEN1KMT2AKDM4CNPC1RAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107615168-B Radiation-sensitive composition 日产化学工业株式会社 2023-12-19 CN disclosed
CN-117008420-A Radiation-sensitive composition 日产化学工业株式会社 2023-11-07 CN disclosed
US-20230125270-A1 RADIATION SENSITIVE COMPOSITION NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2023-04-27 US disclosed
US-20230125270-A1 RADIATION SENSITIVE COMPOSITION NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2023-04-27 US disclosed
US-11561472-B2 Radiation sensitive composition NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2023-01-24 US disclosed
EP-3309614-B1 RADIATION SENSITIVE COMPOSITION NISSAN CHEMICAL CORP (JP) 2021-11-10 EP disclosed
US-10845703-B2 Film-forming composition containing silicone having crosslinking reactivity NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2020-11-24 US disclosed
US-20180335698-A1 FILM-FORMING COMPOSITION CONTAINING SILICONE HAVING CROSSLINKING REACTIVITY NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2018-11-22 US disclosed
US-20180181000-A1 RADIATION SENSITIVE COMPOSITION NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2018-06-28 US disclosed
US-20180181000-A1 RADIATION SENSITIVE COMPOSITION NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2018-06-28 US disclosed
EP-3309614-A1 RADIATION SENSITIVE COMPOSITION Nissan Chemical Industries, Ltd. (JP) 2018-04-18 EP disclosed
EP-3222688-A1 FILM-FORMING COMPOSITION CONTAINING CROSSLINKABLE REACTIVE SILICONE Nissan Chemical Industries, Ltd. (JP) 2017-09-27 EP disclosed
WO-2016199762-A1 RADIATION SENSITIVE COMPOSITION 日産化学工業株式会社 2016-12-15 WO disclosed
US-9290623-B2 Composition for forming silicon-containing resist underlayer film having cyclic diester group NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2016-03-22 US disclosed
US-20150322212-A1 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM HAVING CYCLIC DIESTER GROUP NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2015-11-12 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (6 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20150322212-A1 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM HAVING CYCLIC DIESTER GROUP ASH2L, SRRM2, CCNT1 MEN1 942/4885KMT2A 423/4885KDM4C 577/4885
US-11561472-B2 Radiation sensitive composition RER1, RAD1, RAD51 MEN1 2273/4885KMT2A 853/4885KDM4C 294/4885
US-20180181000-A1 RADIATION SENSITIVE COMPOSITION RER1, RAD1, RAD51 MEN1 2314/4885KMT2A 776/4885KDM4C 349/4885
US-20230125270-A1 RADIATION SENSITIVE COMPOSITION XRCC6, RAD50, XRCC5 MEN1 194/4885KMT2A 3292/4885KDM4C 2035/4885
US-10845703-B2 Film-forming composition containing silicone having crosslinking reactivity SETDB1, KDM2B, SRSF9 MEN1 1587/4885KMT2A 363/4885KDM4C 37/4885
US-20180335698-A1 FILM-FORMING COMPOSITION CONTAINING SILICONE HAVING CROSSLINKING REACTIVITY SETDB1, KDM2B, CD79B MEN1 1788/4885KMT2A 361/4885KDM4C 56/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.