Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 1/20 | 0.41 |
| ▸ | CA1 | P00915 | 1/20 | 0.33 |
| ▸ | CA2 | P00918 | 1/20 | 0.33 |
| ▸ | MMP1 | P03956 | 1/20 | 0.33 |
| ▸ | MMP2 | P08253 | 1/20 | 0.33 |
| ▸ | MMP9 | P14780 | 1/20 | 0.33 |
| ▸ | MMP8 | P22894 | 1/20 | 0.33 |
| ▸ | MMP13 | P45452 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8665340 | 0.83 | TSHR (0.35) | TSHR | |
| SCHEMBL23963405 | 0.82 | TSHR (0.42) | TSHR | |
| SCHEMBL19878959 | 0.80 | LMNA (0.34) | TSHRCA1CA2MMP1MMP2 | |
| SCHEMBL1263586 | 0.80 | TSHR (0.37) | TSHR | |
| SCHEMBL17297569 | 0.79 | TSHR (0.40) | TSHRCA1CA2MMP1MMP2 | |
| SCHEMBL28557962 | 0.77 | TSHR (0.33) | TSHR | |
| SCHEMBL28438448 | 0.77 | TSHR (0.33) | TSHR | |
| SCHEMBL2945785 | 0.77 | TSHR (0.35) | TSHR | |
| SCHEMBL4396356 | 0.76 | TSHR (0.36) | TSHR | |
| SCHEMBL9872974 | 0.76 | TSHR (0.36) | TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2950143-B1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHINETSU CHEMICAL CO (JP) | 2016-07-20 | — | — | EP | disclosed |
| US-20150346600-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-12-03 | — | — | US | disclosed |
| US-20150346600-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-12-03 | — | — | US | disclosed |