SCHEMBL17301237

SCHEMBL17301237

CCCCc1ccc(C(=O)Oc2ccc(OC(=O)c3ccc(CCCC)cc3)c(Cl)c2)cc1

nearest known ligand 0.47

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
MAPT P10636 4/20 0.47
SMN1; SMN2 Q16637 3/20 0.47
NPC1 O15118 1/20 0.47
CASP3 P42574 1/20 0.47
RAB9A P51151 1/20 0.47
SENP8 Q96LD8 1/20 0.47
SENP7 Q9BQF6 1/20 0.47
SENP6 Q9GZR1 1/20 0.47
CNR2 P34972 1/20 0.46
RARB P10826 1/20 0.44
PLK1 P53350 1/20 0.44
THRB P10828 4/20 0.44
THRA P10827 3/20 0.43
KMT2A Q03164 2/20 0.43
ATM Q13315 1/20 0.43
PRSS1 P07477 1/20 0.42
ACR P10323 1/20 0.42
GLA P06280 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17301235 0.92 MAPT (0.55) MAPTSMN1; SMN2NPC1CASP3RAB9A
SCHEMBL10490544 0.90 SMN1; SMN2 (0.52) MAPTSMN1; SMN2NPC1CASP3RAB9A
SCHEMBL17301240 0.88 KMT2A (0.47) MAPTSMN1; SMN2NPC1CASP3RAB9A
SCHEMBL11036899 0.87 CNR2 (0.47) MAPTSMN1; SMN2NPC1CASP3RAB9A
SCHEMBL11145058 0.87 RARB (0.55) MAPTSMN1; SMN2CNR2RARBPLK1
Fluoride SCHEMBL9841343 0.86 MAPT (0.44) MAPTSMN1; SMN2NPC1CASP3RAB9A
SCHEMBL11562805 0.85 MAPT (0.47) MAPTSMN1; SMN2RARBPLK1THRB
SCHEMBL11152917 0.85 RARB (0.55) MAPTSMN1; SMN2RARBTHRBTHRA
SCHEMBL7210214 0.84 THRB (0.58) MAPTSMN1; SMN2NPC1RARBPLK1
SCHEMBL778221 0.84 THRB (0.58) MAPTSMN1; SMN2NPC1RARBPLK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20150344782-A1 POLYMERIZABLE LIQUID CRYSTAL COMPOUND, LIQUID CRYSTAL COMPOSITION, POLYMER MATERIAL AND METHOD FOR MANUFACTURING THE SAME, AND FILM FUJIFILM CORPORATION (JP) 2015-12-03 US disclosed