SCHEMBL1733071

SCHEMBL1733071

c1ccc(CCC2CCCCCC2)c(CCC2CCCCCC2)c1

nearest known ligand 0.51

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
CEL P19835 3/20 0.51
RAB9A P51151 1/20 0.47
L3MBTL1 Q9Y468 1/20 0.47
BCHE P06276 3/20 0.43
POLB P06746 1/20 0.43
GAA P10253 1/20 0.43
MAOA P21397 3/20 0.42
MAOB P27338 3/20 0.42
KDM1A O60341 2/20 0.42
LMNA P02545 1/20 0.42
TSHR P16473 1/20 0.42
HTT P42858 1/20 0.42
NPSR1 Q6W5P4 1/20 0.42
SIGMAR1 Q99720 1/20 0.42
SLC6A4 P31645 1/20 0.41
SLC18A2 Q05940 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1732699 0.92 CEL (0.46) CELRAB9AL3MBTL1BCHEPOLB
SCHEMBL16191584 0.90 CEL (0.49) CELRAB9AL3MBTL1BCHESLC18A2
SCHEMBL18882510 0.88 RAB9A (0.43) CELRAB9AL3MBTL1BCHEMAOA
SCHEMBL18882560 0.88 BCHE (0.45) CELRAB9AL3MBTL1BCHEMAOA
SCHEMBL386637 0.86 RAB9A (0.49) CELRAB9AL3MBTL1BCHE
SCHEMBL4531752 0.86 TAAR1 (0.47) CELRAB9AL3MBTL1BCHEPOLB
SCHEMBL16191057 0.86 TAAR1 (0.47) CELRAB9AL3MBTL1BCHE
SCHEMBL31329240 0.86 TAAR1 (0.47) CELRAB9AL3MBTL1BCHETSHR
SCHEMBL13059860 0.86 CEL (0.53) CELRAB9AL3MBTL1
SCHEMBL16191602 0.86 CEL (0.42) CELRAB9AL3MBTL1BCHESLC18A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9242407-B2 Resin for thermal imprinting SCIVAX CORPORATION (JP) 2016-01-26 US disclosed
US-20140339735-A1 RESIN FOR THERMAL IMPRINTING SCIVAX CORPORATION (JP) 2014-11-20 US disclosed
US-8721950-B2 Resin for thermal imprint SCIVAX CORPORATION (JP) 2014-05-13 US disclosed
US-8597769-B2 Etching mask, base material having etching mask, finely processed article, and method for production of finely processed article MARUZEN PETROCHEMICAL CO. LTD. (JP) 2013-12-03 US disclosed
US-20130056906-A1 RESIN FOR THERMAL IMPRINT MARUZEN PETROCHEMICAL CO., LTD. (JP) 2013-03-07 US disclosed
US-8324332-B2 Resin for thermal imprint SCIVAX CORPORATION (JP) 2012-12-04 US disclosed
EP-1958970-B1 USE OF RESINS FOR THERMAL IMPRINTING SCIVAX CORP (JP) 2011-11-23 EP disclosed
US-20100310830-A1 Etching Mask, Base Material Having Etching Mask, Finely Processed Article, And Method For Production Of Finely Processed Article MARUZEN PETROCHEMICAL CO., LTD. (JP) 2010-12-09 US disclosed
EP-2221162-A1 ETCHING MASK, BASE MATERIAL HAVING ETCHING MASK, FINELY PROCESSED ARTICLE, AND METHOD FOR PRODUCTION OF FINELY PROCESSED ARTICLE Maruzen Petrochemical CO., LTD. (JP) 2010-08-25 EP disclosed
US-20100189984-A1 THERMAL-IMPRINTING RESIN SOLUTION, THERMAL-IMPRINTING RESIN THIN FILM, AND METHOD OF MANUFACTURING THOSE MARUZEN PETROCHEMICAL CO., LTD. (JP) 2010-07-29 US disclosed
US-20100019410-A1 Resin for Thermal Imprinting SCIVAX CORPORATION (JP) 2010-01-28 US disclosed
US-20100013122-A1 Resin for Thermal Imprint SCIVAX CORPORATON (JP) 2010-01-21 US disclosed
EP-1958970-A1 RESIN FOR THERMAL IMPRINTING Scivax Corporation (JP) 2008-08-20 EP disclosed
EP-1930349-A1 RESIN FOR THERMAL IMPRINT Scivax Corporation (JP) 2008-06-11 EP disclosed