SCHEMBL17345173

SCHEMBL17345173

O=Cc1ccc2c(C(F)(F)F)ccc(C(F)(F)F)c2c1

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ KIF11 P52732 3/20 0.53
▸ ALDH1A1 P00352 5/20 0.39
▸ KDM4E B2RXH2 3/20 0.39
▸ PTGS2 P35354 1/20 0.39
▸ RAB9A P51151 1/20 0.39
▸ AKR1C3 P42330 1/20 0.37
▸ AKR1C2 P52895 1/20 0.37
▸ PIM1 P11309 1/20 0.36
▸ PIM3 Q86V86 1/20 0.36
▸ TSHR P16473 1/20 0.35
▸ MEN1 O00255 1/20 0.35
▸ KMT2A Q03164 1/20 0.35
▸ GRIA1 P42261 1/20 0.35
▸ GRIA2 P42262 1/20 0.35
▸ GRIA3 P42263 1/20 0.35
▸ GRIA4 P48058 1/20 0.35
▸ HSD17B10 Q99714 1/20 0.34
▸ TDP1 Q9NUW8 1/20 0.34
▸ CYP2A6 P11509 1/20 0.33
▸ PTGER4 P35408 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17341755 0.87 KIF11 (0.46) KIF11ALDH1A1KDM4EPTGS2RAB9A
SCHEMBL472408 0.83 KIF11 (0.56) KIF11ALDH1A1KDM4EPTGS2RAB9A
SCHEMBL6849159 0.81 KIF11 (0.55) KIF11ALDH1A1KDM4EPTGS2RAB9A
SCHEMBL13387708 0.80 KIF11 (0.42) KIF11ALDH1A1KDM4ERAB9APIM1
SCHEMBL6853514 0.79 KIF11 (0.53) KIF11ALDH1A1KDM4EPTGS2RAB9A
SCHEMBL48409 0.79 KIF11 (0.73) KIF11ALDH1A1KDM4EPTGS2RAB9A
SCHEMBL29438427 0.79 KIF11 (0.73) KIF11ALDH1A1KDM4EPTGS2RAB9A
SCHEMBL6856881 0.78 KIF11 (0.46) KIF11ALDH1A1KDM4EAKR1C3AKR1C2
SCHEMBL24445838 0.78 KDM4E (0.57) KIF11ALDH1A1KDM4EPTGS2RAB9A
SCHEMBL7141744 0.78 KIF11 (0.51) KIF11ALDH1A1KDM4EPTGS2RAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10042258-B2 Composition for forming a resist upper-layer film and method for producing a semiconductor device using the composition NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2018-08-07 — — US disclosed
US-20170293227-A1 COATING LIQUID FOR RESIST PATTERN COATING NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2017-10-12 — — US disclosed
US-9746768-B2 Resist overlayer film forming composition for lithography and method for producing semiconductor device using the same NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2017-08-29 — — US disclosed
US-20170205711-A1 COMPOSITION FOR FORMING A RESIST UPPER-LAYER FILM AND METHOD FOR PRODUCING A SEMICONDUCTOR DEVICE USING THE COMPOSITION NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2017-07-20 — — US disclosed
US-20150362835-A1 RESIST OVERLAYER FILM FORMING COMPOSITION FOR LITHOGRAPHY AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE USING THE SAME NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2015-12-17 — — US disclosed
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