SCHEMBL6853514

SCHEMBL6853514

O=Cc1ccc(C(F)(F)F)c(C=O)c1

nearest known ligand 0.53

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
KIF11 P52732 1/20 0.53
ALDH1A1 P00352 4/20 0.39
KDM4E B2RXH2 3/20 0.39
PTGS2 P35354 1/20 0.39
RAB9A P51151 1/20 0.39
ERN1 O75460 4/20 0.37
AKR1C3 P42330 1/20 0.37
AKR1C2 P52895 1/20 0.37
APP P05067 1/20 0.37
TSHR P16473 1/20 0.35
NFKB1 P19838 1/20 0.35
VCAM1 P19320 1/20 0.35
GRIA1 P42261 1/20 0.35
GRIA2 P42262 1/20 0.35
GRIA3 P42263 1/20 0.35
GRIA4 P48058 1/20 0.35
HSD17B10 Q99714 1/20 0.34
TDP1 Q9NUW8 1/20 0.34
ALDH1A3 P47895 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9712472 0.86 KIF11 (0.49) KIF11ALDH1A1KDM4EPTGS2RAB9A
SCHEMBL23783662 0.83 KIF11 (0.46) KIF11ALDH1A1KDM4EPTGS2RAB9A
SCHEMBL6852469 0.83 APP (0.49) KIF11ALDH1A1KDM4EPTGS2RAB9A
SCHEMBL472408 0.83 KIF11 (0.56) KIF11ALDH1A1KDM4EPTGS2RAB9A
SCHEMBL6849159 0.81 KIF11 (0.55) KIF11ALDH1A1KDM4EPTGS2RAB9A
SCHEMBL48409 0.79 KIF11 (0.73) KIF11ALDH1A1KDM4EPTGS2RAB9A
SCHEMBL1073123 0.79 KIF11 (0.44) KIF11ALDH1A1KDM4EERN1NFKB1
SCHEMBL17345173 0.79 KIF11 (0.53) KIF11ALDH1A1KDM4EPTGS2RAB9A
SCHEMBL30972491 0.79 ALDH1A1 (0.39) KIF11ALDH1A1KDM4EPTGS2RAB9A
SCHEMBL663646 0.79 CES2 (0.50) KIF11ALDH1A1KDM4EERN1NFKB1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11542397-B2 Liquid composition, quantum dot-containing film, optical film, light-emitting display element panel, and light-emitting display device TOKYO OHKA KOGYO CO., LTD. (JP) 2023-01-03 US disclosed
US-20210309866-A1 LIQUID COMPOSITION, QUANTUM DOT-CONTAINING FILM, OPTICAL FILM, LIGHT-EMITTING DISPLAY ELEMENT PANEL, AND LIGHT-EMITTING DISPLAY DEVICE TOKYO OHKA KOGYO CO., LTD. (JP) 2021-10-07 US disclosed
EP-3812805-A1 LIQUID COMPOSITION, QUANTUM DOT-CONTAINING FILM, OPTICAL FILM, LUMINESCENT DISPLAY ELEMENT PANEL, AND LUMINESCENT DISPLAY DEVICE TOKYO OHKA KOGYO CO., LTD. (JP) 2021-04-28 EP disclosed
CN-112334795-A Liquid composition, quantum dot-containing film, optical film, light-emitting display element panel, and light-emitting display device 东京应化工业株式会社 2021-02-05 CN disclosed
CN-107429059-B Energy-sensitive resin composition 东京应化工业株式会社 2020-10-23 CN disclosed
CN-106575080-B Energy-sensitive resin composition 东京应化工业株式会社 2020-08-11 CN disclosed
US-10696845-B2 Energy-sensitive resin composition TOKYO OHKA KOGYO CO., LTD. (JP) 2020-06-30 US disclosed
US-10570269-B2 Composition containing microparticles TOKYO OHKA KOGYO CO., LTD. (JP) 2020-02-25 US disclosed
EP-3275940-B1 ENERGY-SENSITIVE RESIN COMPOSITION TOKYO OHKA KOGYO CO LTD (JP) 2019-12-18 EP disclosed
CN-105579907-B Radiation-sensitive composition and pattern production method 东京应化工业株式会社 2019-12-17 CN disclosed
US-20180086717-A1 HYDROGEN BARRIER AGENT, HYDROGEN BARRIER FILM FORMING COMPOSITION, HYDROGEN BARRIER FILM, METHOD FOR PRODUCING HYDROGEN BARRIER FILM, AND ELECTRONIC ELEMENT TOKYO OHKA KOGYO CO., LTD. (JP) 2018-03-29 US disclosed
US-9890250-B2 Method for producing polybenzoxazole resin TOKYO OHKA KOGYO CO., LTD. (JP) 2018-02-13 US disclosed
EP-3275940-A1 ENERGY-SENSITIVE RESIN COMPOSITION Tokyo Ohka Kogyo Co., Ltd. (JP) 2018-01-31 EP disclosed
EP-2947112-B1 METHOD FOR PRODUCING POLYBENZOXAZOLE RESIN TOKYO OHKA KOGYO CO LTD (JP) 2017-09-13 EP disclosed
US-20170115563-A1 ENERGY-SENSITIVE RESIN COMPOSITION TOKYO OHKA KOGYO CO., LTD. (JP) 2017-04-27 US disclosed
CN-105579907-A Radiation-sensitive composition and pattern production method TOKYO OHKA KOGYO CO LTD 2016-05-11 CN disclosed
US-20150337084-A1 METHOD FOR PRODUCING POLYBENZOXAZOLE RESIN TOKYO OHKA KOGYO CO., LTD. (JP) 2015-11-26 US disclosed
EP-2947112-A1 METHOD FOR PRODUCING POLYBENZOXAZOLE RESIN TOKYO OHKA KOGYO CO., LTD. (JP) 2015-11-25 EP disclosed
US-6780561-B2 FOR FORMING PROTECTIVE FILM OR AN INSULATING FILM FOR A SEMICONDUCTOR ELEMENT OR A CIRCUIT BOARD SUCH AS A PRINTED BOARD KANSAI PAINT CO., LTD. (JP) 2004-08-24 US disclosed
US-20030143480-A1 For forming protective film or an insulating film for a semiconductor element or a circuit board such as a printed board KANSAI PAINT CO., LTD. (JP) 2003-07-31 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20180086717-A1 HYDROGEN BARRIER AGENT, HYDROGEN BARRIER FILM FORMING COMPOSITION, HYDROGEN BARRIER FILM, METHOD FOR PRODUCING HYDROGEN BARRIER FILM, AND ELECTRONIC ELEMENT SLC9A2, SLC9A1, NHERF1 KIF11 2203/4885ALDH1A1 3686/4885KDM4E 4167/4885
US-10570269-B2 Composition containing microparticles CHMP4B, EXOSC10, EXOSC9 KIF11 735/4885ALDH1A1 1737/4885KDM4E 3300/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.