SCHEMBL17350177

SCHEMBL17350177

C=C(C)C(=O)N(C)OCCC

nearest known ligand 0.37

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.37
THRB P10828 1/20 0.34
ALDH1A1 P00352 2/20 0.31
HSD17B10 Q99714 1/20 0.31
TDP1 Q9NUW8 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL238944 0.88 TSHR (0.43) TSHRTHRBALDH1A1
SCHEMBL8085073 0.83 THRB (0.36) TSHRTHRBALDH1A1HSD17B10TDP1
SCHEMBL28214326 0.78 TDP1 (0.33) TSHRALDH1A1HSD17B10TDP1
SCHEMBL17350347 0.75 TSHR (0.39) TSHRTHRBALDH1A1HSD17B10
SCHEMBL472262 0.73 TSHR (0.48) TSHRALDH1A1HSD17B10TDP1
SCHEMBL18513832 0.72 HTT (0.32)
SCHEMBL25748771 0.72 THRB (0.36) TSHRTHRB
SCHEMBL12534552 0.72 TSHR (0.33) TSHRTHRBALDH1A1
SCHEMBL4805525 0.72 THRB (0.41) TSHRTHRBALDH1A1
SCHEMBL28795023 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-102858902-B Thermally expandable microcapsule and process for production of thermally expandable microcapsule SEKISUI CHEMICAL CO LTD 2015-06-03 CN claimed
EP-2960314-B1 POLISHING COMPOSITION AND METHOD FOR MANUFACTURING POLISHED ARTICLE FUJIMI INC (JP) 2024-06-26 EP disclosed
EP-3159915-B1 METHOD FOR POLISHING SILICON WAFER, POLISHING COMPOSITION, AND POLISHING COMPOSITION SET FUJIMI INC (JP) 2023-12-06 EP disclosed
CN-110462797-B Polishing composition 福吉米株式会社 2023-09-22 CN disclosed
EP-3133638-B1 COMPOSITION FOR POLISHING SILICON WAFERS FUJIMI INC (JP) 2021-10-27 EP disclosed
EP-2957613-B1 POLISHING COMPOSITION, METHOD FOR PRODUCING POLISHING COMPOSITION AND METHOD FOR PRODUCING POLISHED ARTICLE FUJIMI INC (JP) 2020-11-18 EP disclosed
US-10745588-B2 Silicon wafer polishing composition FUJIMI INCORPORATED (JP) 2020-08-18 US disclosed
EP-3007213-B1 USE OF A COMPOSITION FOR SILICON WAFER POLISHING FUJIMI INC (JP) 2020-03-18 EP disclosed
EP-3605588-A1 POLISHING COMPOSITION Fujimi Incorporated (JP) 2020-02-05 EP disclosed
EP-3133639-B1 COMPOSITION FOR POLISHING SILICON WAFERS FUJIMI INC (JP) 2019-06-26 EP disclosed
EP-3133639-A1 COMPOSITION FOR POLISHING SILICON WAFERS Fujimi Incorporated (JP) 2017-02-22 EP disclosed
EP-3133638-A1 COMPOSITION FOR POLISHING SILICON WAFERS Fujimi Incorporated (JP) 2017-02-22 EP disclosed
US-9566685-B2 Polishing composition and method for producing polished article FUJIMI INCORPORATED (JP) 2017-02-14 US disclosed
US-20160122591-A1 SILICON WAFER POLISHING COMPOSITION FUJIMI INCORPORATED (JP) 2016-05-05 US disclosed
EP-3007213-A1 COMPOSITION FOR SILICON WAFER POLISHING Fujimi Incorporated (JP) 2016-04-13 EP disclosed
US-20160001416-A1 POLISHING COMPOSITION AND METHOD FOR PRODUCING POLISHED ARTICLE FUJIMI INCORPORATED (JP) 2016-01-07 US disclosed
US-20150376464-A1 POLISHING COMPOSITION, METHOD FOR PRODUCING POLISHING COMPOSITION AND METHOD FOR PRODUCING POLISHED ARTICLE FUJIMI INCORPORATED (JP) 2015-12-31 US disclosed
EP-2960314-A1 POLISHING COMPOSITION AND METHOD FOR MANUFACTURING POLISHED ARTICLE Fujimi Incorporated (JP) 2015-12-30 EP disclosed
EP-2957613-A1 POLISHING COMPOSITION, PRODUCTION METHOD FOR POLISHING COMPOSITION, AND PRODUCTION METHOD FOR POLISHED ARTICLE Fujimi Incorporated (JP) 2015-12-23 EP disclosed
CN-102858902-B Thermally expandable microcapsule and process for production of thermally expandable microcapsule SEKISUI CHEMICAL CO LTD 2015-06-03 CN disclosed