Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ZDHHC20 | Q5W0Z9 | 3/20 | 0.54 |
| ▸ | TSHR | P16473 | 4/20 | 0.46 |
| ▸ | HPGD | P15428 | 1/20 | 0.46 |
| ▸ | ZDHHC2 | Q9UIJ5 | 2/20 | 0.43 |
| ▸ | THRB | P10828 | 3/20 | 0.36 |
| ▸ | ATM | Q13315 | 1/20 | 0.36 |
| ▸ | MEN1 | O00255 | 1/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.35 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.34 |
| ▸ | CES2 | O00748 | 2/20 | 0.34 |
| ▸ | CA12 | O43570 | 1/20 | 0.34 |
| ▸ | CA1 | P00915 | 1/20 | 0.34 |
| ▸ | CA9 | Q16790 | 1/20 | 0.34 |
| ▸ | THRA | P10827 | 2/20 | 0.33 |
| ▸ | HCAR2 | Q8TDS4 | 1/20 | 0.33 |
| ▸ | PLA2G2C | Q5R387 | 1/20 | 0.32 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.32 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2121555 | 0.93 | ZDHHC20 (0.56) | ZDHHC20TSHRHPGDZDHHC2THRB | |
| SCHEMBL29236330 | 0.90 | ZDHHC20 (0.54) | ZDHHC20TSHRHPGDZDHHC2THRB | |
| SCHEMBL2120418 | 0.88 | ZDHHC20 (0.62) | ZDHHC20TSHRHPGDZDHHC2THRB | |
| SCHEMBL10601788 | 0.82 | ZDHHC20 (0.41) | ZDHHC20TSHRHPGDZDHHC2MEN1 | |
| SCHEMBL2120387 | 0.82 | ZDHHC20 (0.48) | ZDHHC20TSHRHPGDZDHHC2THRB | |
| SCHEMBL17522112 | 0.81 | ZDHHC20 (0.40) | ZDHHC20TSHRHPGDZDHHC2THRB | |
| SCHEMBL10400259 | 0.81 | TSHR (0.47) | ZDHHC20TSHRHPGDZDHHC2THRB | |
| SCHEMBL27770858 | 0.81 | ZDHHC20 (0.46) | ZDHHC20TSHRHPGDZDHHC2THRB | |
| SCHEMBL9972945 | 0.78 | TSHR (0.40) | ZDHHC20TSHRHPGDATMMEN1 | |
| SCHEMBL27563505 | 0.78 | ALDH1A1 (0.43) | TSHRATMMEN1KMT2ATDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2960314-B1 | POLISHING COMPOSITION AND METHOD FOR MANUFACTURING POLISHED ARTICLE | FUJIMI INC (JP) | 2024-06-26 | — | — | EP | disclosed |
| EP-3159915-B1 | METHOD FOR POLISHING SILICON WAFER, POLISHING COMPOSITION, AND POLISHING COMPOSITION SET | FUJIMI INC (JP) | 2023-12-06 | — | — | EP | disclosed |
| EP-3133638-B1 | COMPOSITION FOR POLISHING SILICON WAFERS | FUJIMI INC (JP) | 2021-10-27 | — | — | EP | disclosed |
| CN-106463386-B | Method for polishing silicon wafer, polishing composition, and polishing composition set | 福吉米株式会社 | 2020-12-01 | — | — | CN | disclosed |
| EP-2957613-B1 | POLISHING COMPOSITION, METHOD FOR PRODUCING POLISHING COMPOSITION AND METHOD FOR PRODUCING POLISHED ARTICLE | FUJIMI INC (JP) | 2020-11-18 | — | — | EP | disclosed |
| US-10745588-B2 | Silicon wafer polishing composition | FUJIMI INCORPORATED (JP) | 2020-08-18 | — | — | US | disclosed |
| CN-111040731-A | Composition for polishing silicon wafer | 福吉米株式会社 | 2020-04-21 | — | — | CN | disclosed |
| EP-3007213-B1 | USE OF A COMPOSITION FOR SILICON WAFER POLISHING | FUJIMI INC (JP) | 2020-03-18 | — | — | EP | disclosed |
| EP-3605588-A1 | POLISHING COMPOSITION | Fujimi Incorporated (JP) | 2020-02-05 | — | — | EP | disclosed |
| EP-3133639-B1 | COMPOSITION FOR POLISHING SILICON WAFERS | FUJIMI INC (JP) | 2019-06-26 | — | — | EP | disclosed |
| EP-3159915-A1 | METHOD FOR POLISHING SILICON WAFER, POLISHING COMPOSITION, AND POLISHING COMPOSITION SET | Fujimi Incorporated (JP) | 2017-04-26 | — | — | EP | disclosed |
| EP-3133639-A1 | COMPOSITION FOR POLISHING SILICON WAFERS | Fujimi Incorporated (JP) | 2017-02-22 | — | — | EP | disclosed |
| EP-3133638-A1 | COMPOSITION FOR POLISHING SILICON WAFERS | Fujimi Incorporated (JP) | 2017-02-22 | — | — | EP | disclosed |
| US-9566685-B2 | Polishing composition and method for producing polished article | FUJIMI INCORPORATED (JP) | 2017-02-14 | — | — | US | disclosed |
| US-20160122591-A1 | SILICON WAFER POLISHING COMPOSITION | FUJIMI INCORPORATED (JP) | 2016-05-05 | — | — | US | disclosed |
| EP-3007213-A1 | COMPOSITION FOR SILICON WAFER POLISHING | Fujimi Incorporated (JP) | 2016-04-13 | — | — | EP | disclosed |
| US-20160001416-A1 | POLISHING COMPOSITION AND METHOD FOR PRODUCING POLISHED ARTICLE | FUJIMI INCORPORATED (JP) | 2016-01-07 | — | — | US | disclosed |
| US-20150376464-A1 | POLISHING COMPOSITION, METHOD FOR PRODUCING POLISHING COMPOSITION AND METHOD FOR PRODUCING POLISHED ARTICLE | FUJIMI INCORPORATED (JP) | 2015-12-31 | — | — | US | disclosed |
| EP-2960314-A1 | POLISHING COMPOSITION AND METHOD FOR MANUFACTURING POLISHED ARTICLE | Fujimi Incorporated (JP) | 2015-12-30 | — | — | EP | disclosed |
| EP-2957613-A1 | POLISHING COMPOSITION, PRODUCTION METHOD FOR POLISHING COMPOSITION, AND PRODUCTION METHOD FOR POLISHED ARTICLE | Fujimi Incorporated (JP) | 2015-12-23 | — | — | EP | disclosed |