Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ZDHHC20 | Q5W0Z9 | 4/20 | 0.51 |
| ▸ | ZDHHC2 | Q9UIJ5 | 2/20 | 0.51 |
| ▸ | CA12 | O43570 | 2/20 | 0.41 |
| ▸ | CA1 | P00915 | 2/20 | 0.41 |
| ▸ | CA9 | Q16790 | 2/20 | 0.41 |
| ▸ | TSHR | P16473 | 2/20 | 0.39 |
| ▸ | HPGD | P15428 | 1/20 | 0.39 |
| ▸ | MMP1 | P03956 | 1/20 | 0.39 |
| ▸ | MMP2 | P08253 | 1/20 | 0.39 |
| ▸ | MMP3 | P08254 | 1/20 | 0.39 |
| ▸ | MMP8 | P22894 | 1/20 | 0.39 |
| ▸ | THRB | P10828 | 6/20 | 0.34 |
| ▸ | THRA | P10827 | 5/20 | 0.33 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.33 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.33 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.33 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
| ▸ | ALDH2 | P05091 | 1/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17350334 | 0.89 | ZDHHC20 (0.42) | ZDHHC20ZDHHC2CA12CA1CA9 | |
| SCHEMBL345353 | 0.85 | ZDHHC20 (0.61) | ZDHHC20ZDHHC2CA12CA1CA9 | |
| SCHEMBL17350228 | 0.84 | ZDHHC20 (0.50) | ZDHHC20ZDHHC2CA12CA1CA9 | |
| SCHEMBL23421038 | 0.83 | ZDHHC20 (0.59) | ZDHHC20ZDHHC2CA12CA1CA9 | |
| SCHEMBL23421424 | 0.83 | ZDHHC20 (0.59) | ZDHHC20ZDHHC2CA12CA1CA9 | |
| SCHEMBL23421169 | 0.83 | ZDHHC20 (0.64) | ZDHHC20ZDHHC2CA12CA1CA9 | |
| SCHEMBL2118438 | 0.82 | ZDHHC20 (0.37) | ZDHHC20ZDHHC2TSHRHPGDALDH1A1 | |
| SCHEMBL17522110 | 0.81 | ZDHHC20 (0.48) | ZDHHC20ZDHHC2CA12CA1CA9 | |
| SCHEMBL23420808 | 0.81 | ZDHHC20 (0.67) | ZDHHC20ZDHHC2CA12CA1CA9 | |
| SCHEMBL15233342 | 0.81 | ZDHHC20 (0.67) | ZDHHC20ZDHHC2CA12CA1CA9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2960314-B1 | POLISHING COMPOSITION AND METHOD FOR MANUFACTURING POLISHED ARTICLE | FUJIMI INC (JP) | 2024-06-26 | — | — | EP | disclosed |
| EP-3159915-B1 | METHOD FOR POLISHING SILICON WAFER, POLISHING COMPOSITION, AND POLISHING COMPOSITION SET | FUJIMI INC (JP) | 2023-12-06 | — | — | EP | disclosed |
| EP-3133638-B1 | COMPOSITION FOR POLISHING SILICON WAFERS | FUJIMI INC (JP) | 2021-10-27 | — | — | EP | disclosed |
| EP-2957613-B1 | POLISHING COMPOSITION, METHOD FOR PRODUCING POLISHING COMPOSITION AND METHOD FOR PRODUCING POLISHED ARTICLE | FUJIMI INC (JP) | 2020-11-18 | — | — | EP | disclosed |
| US-10745588-B2 | Silicon wafer polishing composition | FUJIMI INCORPORATED (JP) | 2020-08-18 | — | — | US | disclosed |
| CN-111040731-A | Composition for polishing silicon wafer | 福吉米株式会社 | 2020-04-21 | — | — | CN | disclosed |
| EP-3007213-B1 | USE OF A COMPOSITION FOR SILICON WAFER POLISHING | FUJIMI INC (JP) | 2020-03-18 | — | — | EP | disclosed |
| EP-3605588-A1 | POLISHING COMPOSITION | Fujimi Incorporated (JP) | 2020-02-05 | — | — | EP | disclosed |
| EP-3133639-B1 | COMPOSITION FOR POLISHING SILICON WAFERS | FUJIMI INC (JP) | 2019-06-26 | — | — | EP | disclosed |
| US-20170253767-A1 | SILICON WAFER POLISHING COMPOSITION | FUJIMI INCORPORATED (JP) | 2017-09-07 | — | — | US | disclosed |
| EP-3133639-A1 | COMPOSITION FOR POLISHING SILICON WAFERS | Fujimi Incorporated (JP) | 2017-02-22 | — | — | EP | disclosed |
| US-9566685-B2 | Polishing composition and method for producing polished article | FUJIMI INCORPORATED (JP) | 2017-02-14 | — | — | US | disclosed |
| US-20160122591-A1 | SILICON WAFER POLISHING COMPOSITION | FUJIMI INCORPORATED (JP) | 2016-05-05 | — | — | US | disclosed |
| EP-3007213-A1 | COMPOSITION FOR SILICON WAFER POLISHING | Fujimi Incorporated (JP) | 2016-04-13 | — | — | EP | disclosed |
| US-20160001416-A1 | POLISHING COMPOSITION AND METHOD FOR PRODUCING POLISHED ARTICLE | FUJIMI INCORPORATED (JP) | 2016-01-07 | — | — | US | disclosed |
| US-20150376464-A1 | POLISHING COMPOSITION, METHOD FOR PRODUCING POLISHING COMPOSITION AND METHOD FOR PRODUCING POLISHED ARTICLE | FUJIMI INCORPORATED (JP) | 2015-12-31 | — | — | US | disclosed |
| EP-2960314-A1 | POLISHING COMPOSITION AND METHOD FOR MANUFACTURING POLISHED ARTICLE | Fujimi Incorporated (JP) | 2015-12-30 | — | — | EP | disclosed |
| EP-2957613-A1 | POLISHING COMPOSITION, PRODUCTION METHOD FOR POLISHING COMPOSITION, AND PRODUCTION METHOD FOR POLISHED ARTICLE | Fujimi Incorporated (JP) | 2015-12-23 | — | — | EP | disclosed |
| CN-105073941-A | Polishing composition and method for manufacturing polished article | FUJIMI INC | 2015-11-18 | — | — | CN | disclosed |
| CN-104995277-A | POLISHING COMPOSITION, PRODUCTION METHOD FOR POLISHING COMPOSITION, AND PRODUCTION METHOD FOR POLISHED ARTICLE | FUJIMI INC | 2015-10-21 | — | — | CN | disclosed |