⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL889472 | 0.65 | TSHR (0.33) | — | |
| SCHEMBL5925246 | 0.60 | — | — | |
| SCHEMBL3873047 | 0.60 | — | — | |
| SCHEMBL32690762 | 0.60 | ALDH1A1 (0.33) | — | |
| SCHEMBL9775422 | 0.60 | TSHR (0.33) | — | |
| SCHEMBL7147605 | 0.58 | — | — | |
| SCHEMBL5834220 | 0.58 | TSHR (0.33) | — | |
| SCHEMBL7513141 | 0.56 | — | — | |
| SCHEMBL10769630 | 0.56 | — | — | |
| SCHEMBL105887 | 0.56 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9625817-B2 | Photoresist with positive-resist behaviour, method for photochemical structuring thereof, method for the production of silanes and of silicic acid (hetero)poly(co)condensates with positive-resist behaviour and also silicic acid (hetero)poly(co)condensates | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. (DE) | 2017-04-18 | — | — | US | claimed |
| US-20150370169-A1 | PHOTORESIST WITH POSITIVE-RESIST BEHAVIOUR, METHOD FOR PHOTOCHEMICAL STRUCTURING THEREOF, METHOD FOR THE PRODUCTION OF SILANES AND OF SILICIC ACID (HETERO)POLY(CO)CONDENSATES WITH POSITIVE-RESIST BEHAVIOUR AND ALSO SILICIC ACID (HETERO)POLY(CO)CONDENSATES | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. (DE) | 2015-12-24 | — | — | US | claimed |