SCHEMBL17354075

SCHEMBL17354075

CCO[Si](CCCSCCc1ccc(OC(C)(C)C)cc1)(OCC)OCC

nearest known ligand 0.33

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
PPARA Q07869 2/20 0.33
KDM4E B2RXH2 1/20 0.30
ALDH1A1 P00352 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17354078 0.86 PPARA (0.34) PPARAKDM4EALDH1A1
SCHEMBL14226975 0.86 PPARA (0.40) PPARA
SCHEMBL769897 0.83 PPARA (0.35) PPARAKDM4EALDH1A1
SCHEMBL3043486 0.83 PPARA (0.41) PPARAALDH1A1
SCHEMBL17354069 0.82 CYP1A2 (0.44)
SCHEMBL769785 0.80 PPARA (0.39) PPARAALDH1A1
SCHEMBL9064619 0.79 LMNA (0.34) ALDH1A1
SCHEMBL770348 0.77 PPARA (0.37) PPARAALDH1A1
SCHEMBL14226966 0.74 PPARA (0.34) PPARA
SCHEMBL17354072 0.73 CALM1 (0.45) KDM4EALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9217921-B2 Resist underlayer film forming composition containing silicon having sulfide bond NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2015-12-22 US disclosed