⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5186378 | 0.90 | LMNA (0.32) | — | |
| SCHEMBL13024677 | 0.88 | LMNA (0.36) | — | |
| SCHEMBL6931465 | 0.88 | LMNA (0.36) | — | |
| SCHEMBL12096770 | 0.88 | LMNA (0.36) | — | |
| Sulfuric Acid SCHEMBL5489260 | 0.84 | CA1 (0.34) | — | |
| SCHEMBL29133690 | 0.83 | KDM4E (0.32) | — | |
| SCHEMBL32348 | 0.79 | — | — | |
| Methacrylic Acid SCHEMBL29197944 | 0.78 | THRB (0.31) | — | |
| SCHEMBL16706058 | 0.78 | KDM4E (0.41) | — | |
| SCHEMBL17407456 | 0.78 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 184 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4692032-A2 | SYSTEMS AND METHODS FOR REDUCING THE FORMATION OF IMPURITIES DURING 244BB DEHYDROCHLORINATION TO 1234YF | Honeywell International Inc. (US) | 2026-02-11 | — | — | EP | claimed |
| EP-3737660-B1 | SYSTEMS AND METHODS FOR REDUCING THE FORMATION OF IMPURITIES DURING 244BB DEHYDROCHLORINATION TO 1234YF | HONEYWELL INT INC (US) | 2025-11-05 | — | — | EP | claimed |
| CN-118105662-A | Lithium ion battery fire extinguishing agent and preparation method and application thereof | 武汉三氟新材料科技有限公司 | 2024-05-31 | — | — | CN | claimed |
| CN-117986081-A | System and method for reducing impurity formation during dehydrochlorination of 244bb to 1234yf | 霍尼韦尔国际公司 | 2024-05-07 | — | — | CN | claimed |
| CN-117986083-A | Compositions comprising 2-chloro-1, 2-tetrafluoropropane (HCFC-244 bb) | 霍尼韦尔国际公司 | 2024-05-07 | — | — | CN | claimed |
| CN-117986080-A | System and method for reducing impurity formation during dehydrochlorination of 244bb to 1234yf | 霍尼韦尔国际公司 | 2024-05-07 | — | — | CN | claimed |
| CN-117986082-A | Compositions comprising 2-chloro-1, 2-tetrafluoropropane (HCFC-244 bb) | 霍尼韦尔国际公司 | 2024-05-07 | — | — | CN | claimed |
| EP-3737660-A1 | SYSTEMS AND METHODS FOR REDUCING THE FORMATION OF IMPURITIES DURING 244BB DEHYDROCHLORINATION TO 1234YF | Honeywell International Inc. (US) | 2020-11-18 | — | — | EP | claimed |
| EP-3737659-A1 | COMPOSITIONS CONTAINING 2-CHLORO-1,1,1,2-TETRAFLUOROPROPANE (HCFC-244BB) | Honeywell International Inc. (US) | 2020-11-18 | — | — | EP | claimed |
| CN-111699168-A | Systems and methods for reducing impurity formation during dehydrochlorination of 244bb to 1234yf | 霍尼韦尔国际公司 | 2020-09-22 | — | — | CN | claimed |
| EP-1511833-A2 | CLEANING COMPOSITIONS CONTAINING DICHLOROETHYLENE AND SIX CARBON ALKOXY SUBSTITUTED PERFLUORO COMPOUNDS | Kyzen Corporation (US) | 2005-03-09 | — | — | EP | claimed |
| US-20040261815-A1 | Three-step chamber cleaning process for deposition tools | TEXAS INSTRUMENTS, INCORPORATED | 2004-12-30 | — | — | US | claimed |
| US-6699829-B2 | ALSO CONTAINING ADDITIVE SELECTED FROM HIGHLY FLUORINATED COMPOUND AND ENHANCEMENT AGENT OR MIXTURES | KYZEN CORPORATION | 2004-03-02 | — | — | US | claimed |
| WO-2003104365-A2 | CLEANING COMPOSITIONS CONTAINING DICHLOROETHYLENE AND SIX CARBON ALKOXY SUBSTITUTED PERFLUORO COMPOUNDS | KYZEN CORPORATION (US) | 2003-12-18 | — | — | WO | claimed |
| US-20030228997-A1 | CLEANING COMPOSITIONS CONTAINING DICHLOROETHYLENE AND SIX CARBON ALKOXY SUBSTITUTED PERFLUORO COMPOUNDS | KYZEN CORPORATION | 2003-12-11 | — | — | US | claimed |
| US-20030083220-A1 | Low ozone depleting brominated compound mixtures for use in solvent and cleaning applications | KYZEN CORPORATION | 2003-05-01 | — | — | US | claimed |
| EP-1019577-A2 | SURFACTANTS FOR USE IN DRYING AND DRY CLEANING COMPOSITIONS | AlliedSignal Inc. (US) | 2000-07-19 | — | — | EP | claimed |
| US-5856286-A | HYDROPERFLUOROALKYLPYRIDINIUM PHOSPHATES | ALLIEDSIGNAL INC. (US) | 1999-01-05 | — | — | US | claimed |
| WO-1998059105-A2 | SURFACTANTS FOR USE IN DRYING AND DRY CLEANING COMPOSITIONS | ALLIEDSIGNAL INC. (US) | 1998-12-30 | — | — | WO | claimed |
| US-4490209-A | SILICON INTEGRATED CIRCUIT | TEXAS INSTRUMENTS INCORPORATED (US) | 1984-12-25 | — | — | US | claimed |