Phenol

Phenol

SCHEMBL1738526

CC1CO1.Oc1ccccc1

nearest known ligand 0.55

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA12 O43570 1/20 0.55
CA1 P00915 1/20 0.55
CA2 P00918 1/20 0.55
GLA P06280 1/20 0.55
CA3 P07451 1/20 0.55
CA4 P22748 1/20 0.55
CA9 Q16790 1/20 0.55
TDP1 Q9NUW8 1/20 0.55
CA14 Q9ULX7 1/20 0.55
ESR1 P03372 8/20 0.43
ESR2 Q92731 7/20 0.43
TSHR P16473 1/20 0.42
MMP3 P08254 1/20 0.40
BCL2L1 Q07817 1/20 0.40
ALDH1A1 P00352 1/20 0.38
CYP3A4 P08684 1/20 0.38
POLB P06746 1/20 0.38
MEN1 O00255 2/20 0.37
KMT2A Q03164 2/20 0.37
CYP2C19 P33261 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Phenol SCHEMBL1224881 1.00 CA12 (0.55) CA12CA1CA2GLACA3
Phenol SCHEMBL22126382 0.93 CA12 (0.48) CA12CA1CA2GLACA3
Phenol SCHEMBL27566674 0.93 TDP1 (0.48) CA12CA1CA2GLACA3
Hydroquinone SCHEMBL11546119 0.87 CYP3A4 (0.47) CA12CA1CA2CA3CA4
Phenol SCHEMBL9196920 0.86 CA12 (0.50) CA12CA1CA2GLACA3
Phenol SCHEMBL6760455 0.84 ALDH1A1 (0.40) CA12CA1CA2GLACA3
Phenol SCHEMBL8044939 0.84 TDP1 (0.39) CA12CA1CA2GLACA3
Catechol SCHEMBL8055246 0.82 ALDH1A1 (0.53) CA12CA1CA2CA3CA4
Benzene SCHEMBL28146919 0.81 TSHR (0.36) TSHRMEN1KMT2ACYP2C19SLC6A2
Propylene Oxide SCHEMBL7628689 0.80 ESR1 (0.55) CA12CA1CA2CA3CA4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 36 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-1179244-C Photopolymerizable thermosetting resin composition ���ٿƹɷݹ�˾ 2004-12-08 CN claimed
US-6399277-B1 Photopolymerizable thermosetting resin composition VANTICO INC. 2002-06-04 US claimed
EP-0909407-B1 PHOTOPOLYMERIZABLE THERMOSETTING RESIN COMPOSITION CIBA SC HOLDING AG (CH) 2000-08-09 EP claimed
CN-1223727-A Photopolymerizable thermosetting resin composition CIBA SC HOLDING AG (CH) 1999-07-21 CN claimed
EP-0909407-A1 PHOTOPOLYMERIZABLE THERMOSETTING RESIN COMPOSITION Ciba SC Holding AG (CH) 1999-04-21 EP claimed
WO-1998000759-A1 PHOTOPOLYMERIZABLE THERMOSETTING RESIN COMPOSITION CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) 1998-01-08 WO claimed
CN-118339216-A Silsesquioxane derivative, curable composition, hard coating agent, cured product, hard coating, and substrate 东亚合成株式会社 2024-07-12 CN disclosed
WO-2024122417-A1 METHOD FOR PRODUCING LAMINATE WITH HARD COAT LAYER, AND LAMINATE WITH HARD COAT LAYER 東亞合成株式会社 2024-06-13 WO disclosed
WO-2024122416-A1 METHOD FOR PRODUCING LAMINATED BODY WITH HARD COAT LAYER 東亞合成株式会社 2024-06-13 WO disclosed
US-20240158904-A1 UNDERCOAT AGENT COMPOSITION FOR LAYERING INORGANIC MATERIAL LAYER, CURED PRODUCT THEREOF AND PRODUCTION METHOD THEREOF TOAGOSEI CO., LTD. (JP) 2024-05-16 US disclosed
WO-2023238835-A1 SILSESQUIOXANE DERIVATIVE AND METHOD FOR PRODUCING SAME, CURABLE COMPOSITION, HARD COAT AGENT, CURED PRODUCT, HARD COAT, AND BASE MATERIAL 東亞合成株式会社 2023-12-14 WO disclosed
WO-2023238836-A1 SILSESQUIOXANE DERIVATIVE AND METHOD FOR PRODUCING SAME, CURABLE COMPOSITION, HARD COAT AGENT, CURED PRODUCT, HARD COAT, AND BASE MATERIAL 東亞合成株式会社 2023-12-14 WO disclosed
EP-4289618-A1 UNDERCOAT AGENT COMPOSITION FOR INORGANIC SUBSTANCE LAYER LAMINATION, CURED PRODUCT THEREOF, AND METHOD FOR PRODUCING SAME Toagosei Co., Ltd. (JP) 2023-12-13 EP disclosed
US-20120189857-A1 PRIMER COMPOSITION, WATERPROOF FLOOR SLAB STRUCTURE USING THE SAME, AND METHOD FOR WATERPROOFING FLOOR SLAB DIC CORPORATION (JP) 2012-07-26 US disclosed
US-20120108700-A1 AIR-DRYING POLYESTER (METH)ACRYLATE RESIN COMPOSITION, STRUCTURE, AND METHOD FOR APPLYING THE RESIN COMPOSITION DIC CORPORATION (JP) 2012-05-03 US disclosed
EP-2395033-A1 AIR-DRYING POLYESTER (METH)ACRYLATE RESIN COMPOSITION, STRUCTURE AND METHOD FOR PROVIDING SAME DIC Corporation (JP) 2011-12-14 EP disclosed
US-6733935-B2 PHOTOINITIATORS WHICH PREVENT A REDUCTION IN THE LIGHT TRANSMITTANCE OF EACH COLORED RESIST. DAI NIPPON PRINTING CO., LTD. (JP) 2004-05-11 US disclosed
US-20020045112-A1 Colored resist material set and color filter DAI NIPPON PRINTING CO., LTD. (JP) 2002-04-18 US disclosed
US-4749381-A PARTIAL OXIDATION TO SYNTHESIS GAS, REDUCING GAS, FUEL GAS IN GENERATOR WITH ANIONIC NONIONIC POLYETHER SURFACTANT TEXACO INC. (US) 1988-06-07 US disclosed
US-3936575-A PRINTED CIRCUITS SUMITOMO BAKELITE COMPANY, LIMITED (JA) 1976-02-03 US disclosed