SCHEMBL1738859

SCHEMBL1738859

O=C(c1ccccc1)c1cc(O)c(O)c(O)c1

nearest known ligand 0.68

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
FASN P49327 1/20 0.68
ALDH1A1 P00352 2/20 0.64
TDP1 Q9NUW8 2/20 0.60
ATM Q13315 1/20 0.60
L3MBTL1 Q9Y468 1/20 0.60
CNR2 P34972 6/20 0.59
CNR1 P21554 4/20 0.59
GABRA1 P14867 1/20 0.58
GABRB1 P18505 1/20 0.58
LMNA P02545 2/20 0.56
MAPT P10636 2/20 0.56
KDM4E B2RXH2 1/20 0.56
CA12 O43570 1/20 0.56
CA1 P00915 1/20 0.56
CA2 P00918 1/20 0.56
TP53 P04637 1/20 0.56
CA3 P07451 1/20 0.56
SELL P14151 1/20 0.56
HPGD P15428 1/20 0.56
SELP P16109 1/20 0.56

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28858093 0.88 MEN1 (0.59) FASNALDH1A1TDP1ATML3MBTL1
SCHEMBL9639640 0.86 KMT2A (0.58) FASNALDH1A1TDP1ATML3MBTL1
SCHEMBL7551865 0.86 HDAC1 (0.59) FASNALDH1A1TDP1CNR2CNR1
Exifone SCHEMBL18993025 0.86 HDAC1 (0.80) FASNALDH1A1TDP1ATML3MBTL1
SCHEMBL352369 0.85 KDM4E (0.65) FASNALDH1A1TDP1L3MBTL1LMNA
SCHEMBL31410403 0.84 SERPINE1 (0.70) FASNALDH1A1TDP1ATML3MBTL1
SCHEMBL3349765 0.83 ATM (0.84) ALDH1A1TDP1ATML3MBTL1CNR2
SCHEMBL13045507 0.83 ATM (0.84) ALDH1A1TDP1ATML3MBTL1CNR2
SCHEMBL133982 0.83 ATM (0.84) ALDH1A1TDP1ATML3MBTL1CNR2
SCHEMBL7197434 0.83 AKR1B1 (0.61) FASNALDH1A1TDP1ATML3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 57 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-106659708-B Colloidal ball nanocomposite 新加坡科技研究局 2022-05-10 CN claimed
CN-103992419-B Water-soluble fluorine-containing macromolecular photoinitiator and preparation method thereof and application Changzhou University (CN) 2015-10-14 CN claimed
CN-103992419-A Water-soluble fluorine-containing macromolecule photoinitiator, and preparation method and application thereof UNIV CHANGZHOU 2014-08-20 CN claimed
EP-3798635-B1 METHOD FOR MEASURING ACTIVATED PARTIAL THROMBOPLASTIN TIME AND REAGENT KIT FOR ACTIVATED PARTIAL THROMBOPLASTIN TIME MEASUREMENT SYSMEX CORP (JP) 2025-09-10 EP disclosed
CN-112630452-B Reagent and kit for measuring time of activated partial thromboplastin, measuring method, and method for inhibiting precipitation of ellagic acid compound 希森美康株式会社 2025-04-22 CN disclosed
US-12140600-B2 Method for measuring activated partial thromboplastin time SYSMEX CORPORATION (JP) 2024-11-12 US disclosed
CN-112630452-A Reagent and kit for measuring activated partial thromboplastin time, measuring method, and method for inhibiting precipitation of ellagic acid compound 希森美康株式会社 2021-04-09 CN disclosed
EP-3798635-A1 METHOD FOR MEASURING ACTIVATED PARTIAL THROMBOPLASTIN TIME AND REAGENT KIT FOR ACTIVATED PARTIAL THROMBOPLASTIN TIME MEASUREMENT SYSMEX CORPORATION (JP) 2021-03-31 EP disclosed
US-20210088537-A1 METHOD FOR MEASURING ACTIVATED PARTIAL THROMBOPLASTIN TIME SYSMEX CORPORATION (JP) 2021-03-25 US disclosed
EP-2338939-B1 CONDUCTIVE POLYMER SOLUTION, CONDUCTIVE COATING FILM AND INPUT DEVICE SHINETSU POLYMER CO (JP) 2019-01-16 EP disclosed
CN-103992419-B Water-soluble fluorine-containing macromolecular photoinitiator and preparation method thereof and application Changzhou University (CN) 2015-10-14 CN disclosed
US-4892801-A PHOTORESISTS HOECHST CELANESE CORPORATION (US) 1990-01-09 US disclosed
US-4863827-A O-QUINONE DIAZIDE AMERICAN HOECHST CORPORATION (US) 1989-09-05 US disclosed
US-4732836-A SOLUTION STABILITY PHENOLIC COMPOUNDS CONDENSED WITH QUINONES HOECHST CELANESE CORPORATION (US) 1988-03-22 US disclosed
US-4732837-A Novel mixed ester O-quinone photosensitizers HOECHST CELANESE CORPORATION (US) 1988-03-22 US disclosed
EP-0244763-A2 Positive-working photosensitive composition and photosensitive recording material prepared therefrom HOECHST CELANESE CORPORATION (US) 1987-11-11 EP disclosed
EP-0244762-A2 Photosensitive positive composition and photosensitive registration material prepared therefrom HOECHST CELANESE CORPORATION (US) 1987-11-11 EP disclosed
EP-0243964-A2 Photosensitive positive composition and photosensitive registration material prepared therefrom HOECHST CELANESE CORPORATION (US) 1987-11-04 EP disclosed
US-4499171-A IN ALKALI SOLUBLE NOVOLAK RESIN JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1985-02-12 US disclosed
EP-0092444-A2 Positive type photosensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1983-10-26 EP disclosed