Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.65 |
| ▸ | LMNA | P02545 | 3/20 | 0.65 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.65 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.65 |
| ▸ | MAPT | P10636 | 2/20 | 0.65 |
| ▸ | FUT7 | Q11130 | 2/20 | 0.65 |
| ▸ | CA12 | O43570 | 1/20 | 0.65 |
| ▸ | CA1 | P00915 | 1/20 | 0.65 |
| ▸ | CA2 | P00918 | 1/20 | 0.65 |
| ▸ | TP53 | P04637 | 1/20 | 0.65 |
| ▸ | CA3 | P07451 | 1/20 | 0.65 |
| ▸ | SELL | P14151 | 1/20 | 0.65 |
| ▸ | HPGD | P15428 | 1/20 | 0.65 |
| ▸ | SELP | P16109 | 1/20 | 0.65 |
| ▸ | FUT4 | P22083 | 1/20 | 0.65 |
| ▸ | CA4 | P22748 | 1/20 | 0.65 |
| ▸ | CA6 | P23280 | 1/20 | 0.65 |
| ▸ | DPP4 | P27487 | 1/20 | 0.65 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.65 |
| ▸ | CA5A | P35218 | 1/20 | 0.65 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Formamide SCHEMBL28235985 | 0.87 | FASN (0.53) | KDM4ELMNATDP1ALDH1A1MAPT | |
| SCHEMBL21935531 | 0.86 | KDM4E (0.56) | KDM4ELMNATDP1ALDH1A1MAPT | |
| SCHEMBL1738859 | 0.85 | FASN (0.68) | KDM4ELMNATDP1ALDH1A1MAPT | |
| SCHEMBL10589365 | 0.85 | FASN (0.62) | KDM4ELMNATDP1ALDH1A1MAPT | |
| SCHEMBL22156269 | 0.85 | LMNA (0.68) | KDM4ELMNATDP1ALDH1A1MAPT | |
| SCHEMBL24040822 | 0.85 | TTR (0.52) | KDM4ELMNATDP1ALDH1A1MAPT | |
| SCHEMBL15511901 | 0.82 | TTR (0.54) | KDM4ELMNATDP1ALDH1A1MAPT | |
| SCHEMBL352504 | 0.82 | FASN (0.74) | KDM4ELMNATDP1ALDH1A1MAPT | |
| SCHEMBL20533600 | 0.80 | FASN (1.00) | KDM4ETDP1ALDH1A1CA12CA1 | |
| SCHEMBL21935537 | 0.80 | HDAC1 (0.64) | KDM4ELMNATDP1ALDH1A1MAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 60 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-112731765-B | Fluorine-containing resin composition, preparation method thereof and preparation method of cured film containing fluorine-containing resin composition | 西安瑞联新材料股份有限公司 | 2024-03-26 | — | — | CN | claimed |
| US-20230194984-A1 | FLUORINE-CONTAINING RESIN COMPOSITION AND PREPARATION METHOD THEREOF, AND PREPARATION METHOD OF CURED FILM CONTAINING SAME | XI'AN MANARECO NEW MATERIALS CO., LTD. (CN) | 2023-06-22 | — | — | US | claimed |
| WO-2022142537-A1 | FLUORINE-CONTAINING RESIN COMPOSITION, PREPARATION METHOD THEREFOR, AND PREPARATION METHOD FOR CURED FILM CONTAINING SAME | 西安瑞联新材料股份有限公司 | 2022-07-07 | — | — | WO | claimed |
| US-6686120-B2 | THERMAL ACID GENERATOR AND A METHOD OF FORMING A PATTERN USING THE SAME. THE PHOTORESIST COMPOSITION INCLUDES ABOUT 100 PARTS BY WEIGHT OF AN ALKALI-SOLUBLE ACRYL COPOLYMER, ABOUT 5-100 PARTS BY WEIGHT OF 1,2-QUINONEDIAZIDE COMPOUND, ABOUT | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2004-02-03 | — | — | US | claimed |
| US-20030134222-A1 | Photoresist composition and method of forming pattern using the same | SAMSUNG ELECTRONICS CO., LTD. | 2003-07-17 | — | — | US | claimed |
| JP-10324657-A | — | — | None | — | — | JP | disclosed |
| US-12346025-B2 | Fluorine-containing resin composition and preparation method thereof, and preparation method of cured film containing same | XI'AN MANARECO NEW MATERIALS CO., LTD. (CN) | 2025-07-01 | — | — | US | disclosed |
| CN-110286561-B | Radiation-sensitive composition, cured film, and display element | JSR株式会社 | 2025-06-03 | — | — | CN | disclosed |
| CN-110850680-B | Curable composition, display element, and method for forming cured film | JSR株式会社 | 2024-10-25 | — | — | CN | disclosed |
| US-12044969-B2 | Resist underlayer film-forming composition | NISSAN CHEMICAL CORPORATION (JP) | 2024-07-23 | — | — | US | disclosed |
| US-12044969-B2 | Resist underlayer film-forming composition | NISSAN CHEMICAL CORPORATION (JP) | 2024-07-23 | — | — | US | disclosed |
| CN-112731765-B | Fluorine-containing resin composition, preparation method thereof and preparation method of cured film containing fluorine-containing resin composition | 西安瑞联新材料股份有限公司 | 2024-03-26 | — | — | CN | disclosed |
| CN-102883607-A | Compounds for the treatment of cancer | GTX INC (US) | 2013-01-16 | — | — | CN | disclosed |
| US-20120015300-A1 | PHOTOSENSITIVE RESIN COMPOSITION | RESONAC CORPORATION (JP) | 2012-01-19 | — | — | US | disclosed |
| US-20110281040-A1 | LIQUID CRYSTAL DISPLAY ELEMENT, POSITIVE TYPE RADIATION SENSITIVE COMPOSITION, INTERLAYER INSULATING FILM FOR LIQUID CRYSTAL DISPLAY ELEMENT, AND FORMATION METHOD THEREOF | JSR CORPORATION (JP) | 2011-11-17 | — | — | US | disclosed |
| US-7691915-B2 | Photosensitive resin composition for forming organic insulating film and device using the same | CHEIL INDUSTRIES INC. (KR) | 2010-04-06 | — | — | US | disclosed |
| US-20080145786-A1 | Photosensitive Resin Composition for Forming Organic Insulating Film and Device Using the Same | CHEIL INDUSTRIES INC. (KR) | 2008-06-19 | — | — | US | disclosed |
| US-6686120-B2 | THERMAL ACID GENERATOR AND A METHOD OF FORMING A PATTERN USING THE SAME. THE PHOTORESIST COMPOSITION INCLUDES ABOUT 100 PARTS BY WEIGHT OF AN ALKALI-SOLUBLE ACRYL COPOLYMER, ABOUT 5-100 PARTS BY WEIGHT OF 1,2-QUINONEDIAZIDE COMPOUND, ABOUT | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2004-02-03 | — | — | US | disclosed |
| US-20030134222-A1 | Photoresist composition and method of forming pattern using the same | SAMSUNG ELECTRONICS CO., LTD. | 2003-07-17 | — | — | US | disclosed |
| JP-H10324657-A | POLYHYDROXYBENZENE DERIVATIVE AND PREVENTIVE AND THERAPEUTIC AGENT FOR BONE/CARTILAGE DISEASE COMPRISING THE SAME | HOECHST MARION ROUSSEL KK | 1998-12-08 | — | — | JP | disclosed |