SCHEMBL9639640

SCHEMBL9639640

O=C(c1ccccc1)c1cc(C(=O)c2cc(O)c(O)c(O)c2)c(O)cc1O

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 2/20 0.58
MEN1 O00255 1/20 0.58
USP2 O75604 1/20 0.58
GAA P10253 1/20 0.58
KEAP1 Q14145 1/20 0.58
NFE2L2 Q16236 1/20 0.58
HDAC1 Q13547 1/20 0.55
LMNA P02545 4/20 0.54
HPGD P15428 3/20 0.54
MAPT P10636 3/20 0.54
KDM4E B2RXH2 2/20 0.54
HSD17B10 Q99714 2/20 0.54
CYP3A4 P08684 1/20 0.54
RECQL P46063 1/20 0.54
FASN P49327 1/20 0.53
ALDH1A1 P00352 4/20 0.50
MAPK1 P28482 2/20 0.50
CYP1A2 P05177 1/20 0.50
PGR P06401 1/20 0.50
CYP2D6 P10635 1/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL295850 0.90 KMT2A (0.68) KMT2AMEN1USP2GAAKEAP1
SCHEMBL7551865 0.89 HDAC1 (0.59) KMT2AMEN1USP2GAAKEAP1
SCHEMBL1738859 0.86 FASN (0.68) KMT2AMEN1HDAC1LMNAHPGD
SCHEMBL30063117 0.84 LMNA (0.66) KMT2AMEN1USP2GAAKEAP1
SCHEMBL170272 0.84 LMNA (0.66) KMT2AMEN1USP2GAAKEAP1
SCHEMBL7046942 0.84 KMT2A (0.70) KMT2AMEN1USP2GAAKEAP1
SCHEMBL28858093 0.83 MEN1 (0.59) KMT2AMEN1USP2GAAKEAP1
SCHEMBL11757510 0.82 HDAC1 (0.59) KMT2AMEN1GAAHDAC1LMNA
Exifone SCHEMBL18993025 0.81 HDAC1 (0.80) KMT2AMEN1USP2GAAKEAP1
Exifone SCHEMBL11756630 0.80 HDAC1 (0.73) KMT2AMEN1USP2GAAKEAP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0227487-B1 POSITIVE TYPE RADIATION-SENSITIVE RESIN COMPOSITION JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1992-07-15 EP disclosed
US-5087548-A POSITIVE TYPE RADIATION-SENSITIVE RESIN COMPOSITION JAPAN SYNTHETIC RUBBER CO., INC. (JP) 1992-02-11 US disclosed
EP-0227487-A2 Positive type radiation-sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1987-07-01 EP disclosed