SCHEMBL1739727

SCHEMBL1739727

C[C@H]1C=CC[C@H]2C(=O)OC(=O)[C@@H]12

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 6/20 0.41
MEN1 O00255 3/20 0.41
LMNA P02545 2/20 0.37
SMN1; SMN2 Q16637 2/20 0.37
HTT P42858 1/20 0.37
L3MBTL1 Q9Y468 1/20 0.37
ALDH1A1 P00352 2/20 0.34
KDM4E B2RXH2 1/20 0.33
GMNN O75496 1/20 0.33
PPM1B O75688 1/20 0.33
PPP1CC P36873 1/20 0.33
TFPI2 P48307 1/20 0.33
RAB9A P51151 1/20 0.33
PPP5C P53041 1/20 0.33
PPP1CA P62136 1/20 0.33
PMP22 Q01453 1/20 0.33
TDP1 Q9NUW8 1/20 0.33
TP53 P04637 1/20 0.33
CYP2D6 P10635 1/20 0.33
NFKB1 P19838 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7175398 1.00 KMT2A (0.41) KMT2AMEN1LMNASMN1; SMN2HTT
SCHEMBL11766943 1.00 KMT2A (0.41) KMT2AMEN1LMNASMN1; SMN2HTT
SCHEMBL4352284 1.00 KMT2A (0.41) KMT2AMEN1LMNASMN1; SMN2HTT
SCHEMBL1473414 1.00 KMT2A (0.41) KMT2AMEN1LMNASMN1; SMN2HTT
SCHEMBL13719383 0.78 KDM4E (0.31) KMT2AMEN1LMNASMN1; SMN2KDM4E
SCHEMBL6705482 0.78 KDM4E (0.31) LMNASMN1; SMN2L3MBTL1KDM4EGMNN
SCHEMBL10592596 0.77 KDM4E (0.33) LMNASMN1; SMN2KDM4EGMNNPPM1B
SCHEMBL19604088 0.77 KDM4E (0.33) LMNASMN1; SMN2KDM4EGMNNPPM1B
SCHEMBL1071613 0.77 KDM4E (0.33) LMNASMN1; SMN2KDM4EGMNNPPM1B
SCHEMBL9619474 0.77 FNTA (0.31) LMNASMN1; SMN2KDM4EGMNNPPM1B

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-63205348-A None JP disclosed
US-20120108700-A1 AIR-DRYING POLYESTER (METH)ACRYLATE RESIN COMPOSITION, STRUCTURE, AND METHOD FOR APPLYING THE RESIN COMPOSITION DIC CORPORATION (JP) 2012-05-03 US disclosed
EP-2395033-A1 AIR-DRYING POLYESTER (METH)ACRYLATE RESIN COMPOSITION, STRUCTURE AND METHOD FOR PROVIDING SAME DIC Corporation (JP) 2011-12-14 EP disclosed
EP-1270637-A1 POLYESTER AND POLYMER MODIFIER COMPRISING THE POLYESTER AS ACTIVE INGREDIENT Zeon Corporation (JP) 2003-01-02 EP disclosed
US-20020193556-A1 Polyester and polymer modifier comprising the polyester as active ingredient ZEON CORPORATION (JP) 2002-12-19 US disclosed
EP-0383609-B1 Resin composition and method of manufacturing the same DAINIPPON INK & CHEMICALS (JP) 1996-05-01 EP disclosed
EP-0340019-B1 Resin composition DAINIPPON INK & CHEMICALS (JP) 1995-11-15 EP disclosed
US-5102605-A Injecting oligomer of unsaturated polyester and methyl (meth)acrylate monomer into molds containing reinforcing fibers DAINIPPON INK AND CHEMICALS, INC. (JP) 1992-04-07 US disclosed
US-5098950-A A blend of an unsaturated polyester, a methacrylate terminated polymer, an isocyanurate-acrylate oligomer, styrene and methyl methacrylate monomers DAINIPPON INK AND CHEMICALS, INC. (JP) 1992-03-24 US disclosed
US-5084508-A Acrylated resins and unsaturated polyesters copolymerized with methyl methacrylate for tensile strength DAINIPPON INK & CHEMICALS, INC. (JP) 1992-01-28 US disclosed
EP-0383609-A2 Resin composition and method of manufacturing the same DAINIPPON INK AND CHEMICALS, INC. (JP) 1990-08-22 EP disclosed
JP-S63205348-A NONWAXY UNSATURATED POLYESTER RESIN COMPOSITION FOR PAINT DAINIPPON INK & CHEM INC 1988-08-24 JP disclosed
US-4226779-A HEAT TREATMENT, NITROGEN COMPOUND, LIQUID PRODUCT NIPPON ZEON CO. LTD. (JP) 1980-10-07 US disclosed
US-4198340-A ALKALI METAL COMPOUND AS CATALYST DAINIPPON INK & CHEMICALS, INC. (JP) 1980-04-15 US disclosed