SCHEMBL17399577

SCHEMBL17399577

CO[C@H]1CC(C=O)=C(C)C=C1O

nearest known ligand 0.32

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.32
CYP19A1 P11511 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13050765 0.68 TRPA1 (0.31)
SCHEMBL14567723 0.61
SCHEMBL18717125 0.61
SCHEMBL20322734 0.59
SCHEMBL12646230 0.59
SCHEMBL14215710 0.59
SCHEMBL16863001 0.57
SCHEMBL15923156 0.57 MAOA (0.42)
SCHEMBL29893327 0.56
SCHEMBL14923066 0.55

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2816409-B1 Method for forming a resist under layer film and patterning process SHINETSU CHEMICAL CO (JP) 2016-01-06 EP disclosed