Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GAA | P10253 | 2/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.37 |
| ▸ | LMNA | P02545 | 1/20 | 0.37 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.37 |
| ▸ | CHRM5 | P08912 | 2/20 | 0.31 |
| ▸ | CHRM1 | P11229 | 2/20 | 0.31 |
| ▸ | CHRM3 | P20309 | 2/20 | 0.31 |
| ▸ | PGR | P06401 | 1/20 | 0.31 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.31 |
| ▸ | CHRM4 | P08173 | 1/20 | 0.31 |
| ▸ | HTR1A | P08908 | 1/20 | 0.31 |
| ▸ | CHRNB2 | P17787 | 1/20 | 0.31 |
| ▸ | TBXA2R | P21731 | 1/20 | 0.31 |
| ▸ | CHRNB4 | P30926 | 1/20 | 0.31 |
| ▸ | CHRNA3 | P32297 | 1/20 | 0.31 |
| ▸ | CHRNA7 | P36544 | 1/20 | 0.31 |
| ▸ | CHRNA4 | P43681 | 1/20 | 0.31 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.31 |
| ▸ | CHRNA10 | Q9GZZ6 | 1/20 | 0.31 |
| ▸ | CHRNA9 | Q9UGM1 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28653095 | 0.89 | ALDH1A1 (0.42) | GAAALDH1A1LMNAHSD17B10CHRM5 | |
| SCHEMBL7674315 | 0.84 | GAA (0.41) | GAAALDH1A1 | |
| SCHEMBL9627407 | 0.77 | GAA (0.43) | GAAALDH1A1LMNAHSD17B10TSHR | |
| SCHEMBL13548866 | 0.77 | GAA (0.46) | GAAALDH1A1LMNAHSD17B10CHRM5 | |
| SCHEMBL12459690 | 0.75 | GAA (0.44) | GAAALDH1A1LMNAHSD17B10CHRM5 | |
| SCHEMBL4435639 | 0.74 | GAA (0.45) | GAAALDH1A1LMNAHSD17B10 | |
| SCHEMBL1948636 | 0.72 | ALDH1A1 (0.43) | GAAALDH1A1LMNAHSD17B10CHRM5 | |
| SCHEMBL1492509 | 0.72 | ALDH1A1 (0.39) | ALDH1A1LMNAHSD17B10 | |
| SCHEMBL11581125 | 0.71 | ALDH1A1 (0.39) | GAAALDH1A1LMNAHSD17B10CHRM5 | |
| SCHEMBL22721337 | 0.71 | ALDH1A1 (0.43) | GAAALDH1A1LMNAHSD17B10CHRM5 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1301829-A4 | RADIATION SENSITIVE COMPOSITIONS CONTAINING IMAGE QUALITY AND PROFILE ENHANCEMENT ADDITIVES | FUJIFILM ELECTRONIC MATERIALS (US) | 2006-06-28 | — | — | EP | claimed |
| EP-1301829-A1 | RADIATION SENSITIVE COMPOSITIONS CONTAINING IMAGE QUALITY AND PROFILE ENHANCEMENT ADDITIVES | ARCH SPECIALTY CHEMICALS, INC. (US) | 2003-04-16 | — | — | EP | claimed |
| WO-2002008834-A1 | RADIATION SENSITIVE COMPOSITIONS CONTAINING IMAGE QUALITY AND PROFILE ENHANCEMENT ADDITIVES | ARCH SPECIALTY CHEMICALS, INC. (US) | 2002-01-31 | — | — | WO | claimed |
| EP-2387735-A1 | NONPOLYMERIC BINDERS FOR SEMICONDUCTOR SUBSTRATE COATINGS | FujiFilm Electronic Materials USA, Inc. (US) | 2011-11-23 | — | — | EP | disclosed |
| US-8037621-B2 | Article of footwear including a woven strap system | NIKE, INC. (US) | 2011-10-18 | — | — | US | disclosed |
| WO-2010083350-A1 | NONPOLYMERIC BINDERS FOR SEMICONDUCTOR SUBSTRATE COATINGS | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2010-07-22 | — | — | WO | disclosed |
| EP-1301829-A4 | RADIATION SENSITIVE COMPOSITIONS CONTAINING IMAGE QUALITY AND PROFILE ENHANCEMENT ADDITIVES | FUJIFILM ELECTRONIC MATERIALS (US) | 2006-06-28 | — | — | EP | disclosed |
| EP-1299774-A4 | PERFLUOROALKYLSULFONIC ACID COMPOUNDS FOR PHOTORESISTS | ARCH SPEC CHEM INC (US) | 2005-06-08 | — | — | EP | disclosed |
| EP-1163550-A4 | HYDROXY-AMINO THERMALLY CURED UNDERCOAT FOR 193 NM LITHOGRAPHY | ARCH SPEC CHEM INC (US) | 2004-05-26 | — | — | EP | disclosed |
| EP-1169357-A4 | HYDROXY-EPOXIDE THERMALLY CURED UNDERCOAT FOR 193 NM LITHOGRAPHY | ARCH SPEC CHEM INC (US) | 2004-03-17 | — | — | EP | disclosed |
| EP-1301829-A1 | RADIATION SENSITIVE COMPOSITIONS CONTAINING IMAGE QUALITY AND PROFILE ENHANCEMENT ADDITIVES | ARCH SPECIALTY CHEMICALS, INC. (US) | 2003-04-16 | — | — | EP | disclosed |
| EP-1137675-A4 | PREPARATION OF PARTIALLY CROSS-LINKED POLYMERS AND THEIR USE IN PATTERN FORMATION | ARCH SPEC CHEM INC (US) | 2002-10-28 | — | — | EP | disclosed |
| WO-2002082185-A1 | PERFLUOROALKYLSULFONIC ACID COMPOUNDS FOR PHOTORESISTS | ARCH SPECIALTY CHEMICALS, INC. (US) | 2002-10-17 | — | — | WO | disclosed |
| WO-2002008834-A1 | RADIATION SENSITIVE COMPOSITIONS CONTAINING IMAGE QUALITY AND PROFILE ENHANCEMENT ADDITIVES | ARCH SPECIALTY CHEMICALS, INC. (US) | 2002-01-31 | — | — | WO | disclosed |
| EP-1169357-A1 | HYDROXY-EPOXIDE THERMALLY CURED UNDERCOAT FOR 193 NM LITHOGRAPHY | Arch Specialty Chemicals, Inc. (US) | 2002-01-09 | — | — | EP | disclosed |
| EP-1163550-A1 | HYDROXY-AMINO THERMALLY CURED UNDERCOAT FOR 193 NM LITHOGRAPHY | Arch Specialty Chemicals, Inc. (US) | 2001-12-19 | — | — | EP | disclosed |
| EP-1137675-A1 | PREPARATION OF PARTIALLY CROSS-LINKED POLYMERS AND THEIR USE IN PATTERN FORMATION | Arch Specialty Chemicals, Inc. (US) | 2001-10-04 | — | — | EP | disclosed |
| WO-2000053645-A1 | HYDROXY-EPOXIDE THERMALLY CURED UNDERCOAT FOR 193 NM LITHOGRAPHY | ARCH SPECIALTY CHEMICALS, INC. (US) | 2000-09-14 | — | — | WO | disclosed |
| WO-2000054105-A1 | HYDROXY-AMINO THERMALLY CURED UNDERCOAT FOR 193 NM LITHOGRAPHY | ARCH SPECIALTY CHEMICALS, INC. (US) | 2000-09-14 | — | — | WO | disclosed |
| WO-2000027891-A1 | PREPARATION OF PARTIALLY CROSS-LINKED POLYMERS AND THEIR USE IN PATTERN FORMATION | ARCH SPECIALTY CHEMICALS, INC. (US) | 2000-05-18 | — | — | WO | disclosed |