Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NR4A1 | P22736 | 1/20 | 0.67 |
| ▸ | NR4A2 | P43354 | 1/20 | 0.67 |
| ▸ | NR4A3 | Q92570 | 1/20 | 0.67 |
| ▸ | CDC25B | P30305 | 1/20 | 0.57 |
| ▸ | MMP3 | P08254 | 1/20 | 0.54 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.54 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.52 |
| ▸ | PLK1 | P53350 | 1/20 | 0.52 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.50 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.50 |
| ▸ | PTK2B | Q14289 | 1/20 | 0.50 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.48 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.48 |
| ▸ | TSHR | P16473 | 2/20 | 0.48 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.48 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.48 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.46 |
| ▸ | MEN1 | O00255 | 2/20 | 0.46 |
| ▸ | MAPT | P10636 | 2/20 | 0.46 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Naphthoic Acid SCHEMBL6055236 | 0.83 | NR4A1 (0.95) | NR4A1NR4A2NR4A3CDC25BMMP3 | |
| Naphthoic Acid SCHEMBL3171487 | 0.83 | NR4A1 (0.95) | NR4A1NR4A2NR4A3CDC25BMMP3 | |
| Naphthoic Acid SCHEMBL6055158 | 0.81 | NR4A1 (0.91) | NR4A1NR4A2NR4A3CDC25BMMP3 | |
| SCHEMBL2494543 | 0.81 | NR4A1 (0.62) | NR4A1NR4A2NR4A3CDC25BMMP3 | |
| SCHEMBL15534467 | 0.81 | NR4A1 (0.62) | NR4A1NR4A2NR4A3CDC25BMMP3 | |
| Naphthoic Acid SCHEMBL17258 | 0.80 | NR4A1 (1.00) | NR4A1NR4A2NR4A3CDC25BMMP3 | |
| SCHEMBL31448236 | 0.80 | NR4A1 (0.61) | NR4A1NR4A2NR4A3CDC25BMMP3 | |
| SCHEMBL146735 | 0.80 | NR4A1 (0.61) | NR4A1NR4A2NR4A3CDC25BMMP3 | |
| SCHEMBL1395197 | 0.80 | NR4A1 (0.61) | NR4A1NR4A2NR4A3CDC25BMMP3 | |
| Naphthoic Acid SCHEMBL29352220 | 0.80 | NR4A1 (1.00) | NR4A1NR4A2NR4A3CDC25BMMP3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118325004-A | Phenolic hydroxyl group-containing resin, photosensitive resin composition, curable composition, and resist film | DIC株式会社 | 2024-07-12 | — | — | CN | disclosed |
| CN-118011733-A | Positive photosensitive resin composition, resist film, resist underlayer film, and resist permanent film | DIC株式会社 | 2024-05-10 | — | — | CN | disclosed |
| CN-117487097-A | Surface-modified carbon black, carbon black dispersion, and black resist composition | DIC株式会社 | 2024-02-02 | — | — | CN | disclosed |
| CN-117321109-A | Phenolic hydroxyl group-containing resin | DIC株式会社 | 2023-12-29 | — | — | CN | disclosed |
| CN-116023607-A | Phenolic hydroxyl group-containing resin | DIC株式会社 | 2023-04-28 | — | — | CN | disclosed |
| CN-107108418-B | Phenolic hydroxyl group-containing compound, composition containing same, and cured film thereof | DIC株式会社 | 2021-04-27 | — | — | CN | disclosed |
| CN-107848926-B | Novolac type phenolic hydroxyl group-containing resin and resist film | DIC株式会社 | 2021-04-20 | — | — | CN | disclosed |
| CN-106795077-B | Naphthol calixarene compound, process for producing the same, photosensitive composition, resist material, and coating film | DIC株式会社 | 2021-03-30 | — | — | CN | disclosed |
| CN-108368214-B | Novolac resin and resist film | DIC株式会社 | 2021-03-23 | — | — | CN | disclosed |
| CN-107111229-B | Curable composition for resist permanent film and resist permanent film | DIC株式会社 | 2020-11-27 | — | — | CN | disclosed |
| US-20170349690-A1 | CURABLE COMPOSITION FOR PERMANENT RESIST FILMS, AND PERMANENT RESIST FILM | DIC CORPORATION (JP) | 2017-12-07 | — | — | US | disclosed |
| US-20170334817-A1 | PHENOLIC HYDROXYL-CONTAINING COMPOUND, COMPOSITION CONTAINING THE SAME, AND CURED FILM OF THE COMPOSITION | DIC CORPORATION (JP) | 2017-11-23 | — | — | US | disclosed |
| US-20170329221-A1 | PHOTOSENSITIVE COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, AND RESIST UNDERLAYER FILM | DIC CORPORATION (JP) | 2017-11-16 | — | — | US | disclosed |
| US-20170329226-A1 | NAPHTHOL-TYPE CALIXARENE COMPOUND AND METHOD FOR PRODUCING THE SAME, PHOTOSENSITIVE COMPOSITION, RESIST MATERIAL, AND COATING | DIC CORPORATION (JP) | 2017-11-16 | — | — | US | disclosed |
| US-9765175-B2 | Modified hydroxy naphthalene novolak resin, production method for modified hydroxy naphthalene novolak resin, photosensitive composition, resist material and coating | DIC CORPORATION (JP) | 2017-09-19 | — | — | US | disclosed |
| US-20170260315-A1 | NOVOLAC TYPE PHENOL RESIN, MANUFACTURING METHOD THEREFOR, PHOTOSENSITIVE COMPOSITION, RESIST MATERIAL AND COATING FILM | DIC CORPORATION (JP) | 2017-09-14 | — | — | US | disclosed |
| US-20170082923-A1 | PHOTOSENSITIVE COMPOSITION FOR PERMANENT FILMS, RESIST MATERIAL AND COATING FILM | DIC CORPORATION (JP) | 2017-03-23 | — | — | US | disclosed |
| US-20170066703-A1 | COMPOUND CONTAINING MODIFIED PHENOLIC HYDROXY GROUP, METHOD FOR PRODUCING COMPOUND CONTAINING MODIFIED PHENOLIC HYDROXY GROUP, PHOTOSENSITIVE COMPOSITION, RESIST MATERIAL, AND RESIST COATING FILM | DIC CORPORATION (JP) | 2017-03-09 | — | — | US | disclosed |
| US-20160177020-A1 | MODIFIED HYDROXY NAPHTHALENE NOVOLAK RESIN, PRODUCTION METHOD FOR MODIFIED HYDROXY NAPHTHALENE NOVOLAK RESIN, PHOTOSENSITIVE COMPOSITION, RESIST MATERIAL AND COATING | DIC CORPORATION (JP) | 2016-06-23 | — | — | US | disclosed |
| US-20160017083-A1 | MODIFIED NOVOLAC PHENOL RESIN, RESIST MATERIAL, COATING FILM, AND RESIST PERMANENT FILM | DAINIPPON INK & CHEMICALS (JP) | 2016-01-21 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20170066703-A1 | COMPOUND CONTAINING MODIFIED PHENOLIC HYDROXY GROUP, METHOD FOR PRODUCING COMPOUND CONTAINING MODIFIED PHENOLIC HYDROXY GROUP, PHOTOSENSITIVE COMPOSITION, RESIST MATERIAL, AND RESIST COATING FILM | PAH, TYR, HACL2 | NR4A1 302/4885NR4A2 346/4885NR4A3 386/4885 |
| US-20170329226-A1 | NAPHTHOL-TYPE CALIXARENE COMPOUND AND METHOD FOR PRODUCING THE SAME, PHOTOSENSITIVE COMPOSITION, RESIST MATERIAL, AND COATING | CSNK1A1L, NCKAP1L, CALR | NR4A1 67/4885NR4A2 198/4885NR4A3 333/4885 |
| US-20170334817-A1 | PHENOLIC HYDROXYL-CONTAINING COMPOUND, COMPOSITION CONTAINING THE SAME, AND CURED FILM OF THE COMPOSITION | CALU, ARL1, AHR | NR4A1 328/4885NR4A2 640/4885NR4A3 875/4885 |
| US-20170260315-A1 | NOVOLAC TYPE PHENOL RESIN, MANUFACTURING METHOD THEREFOR, PHOTOSENSITIVE COMPOSITION, RESIST MATERIAL AND COATING FILM | FARSA, FARSB, ASH2L | NR4A1 120/4885NR4A2 720/4885NR4A3 962/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.