Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NR4A1 | P22736 | 1/20 | 0.61 |
| ▸ | NR4A2 | P43354 | 1/20 | 0.61 |
| ▸ | NR4A3 | Q92570 | 1/20 | 0.61 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.57 |
| ▸ | PTK2B | Q14289 | 1/20 | 0.57 |
| ▸ | CDC25B | P30305 | 1/20 | 0.53 |
| ▸ | MMP3 | P08254 | 1/20 | 0.50 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.50 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.48 |
| ▸ | PLK1 | P53350 | 1/20 | 0.48 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.46 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.43 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.43 |
| ▸ | TSHR | P16473 | 2/20 | 0.43 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.43 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.43 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.43 |
| ▸ | MEN1 | O00255 | 2/20 | 0.43 |
| ▸ | MAPT | P10636 | 2/20 | 0.43 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1869296 | 0.83 | PTK2B (0.59) | NR4A1NR4A2NR4A3L3MBTL1PTK2B | |
| SCHEMBL13189693 | 0.83 | L3MBTL1 (0.50) | NR4A1NR4A2NR4A3L3MBTL1PTK2B | |
| SCHEMBL5999394 | 0.81 | PTK2B (0.57) | NR4A1NR4A2NR4A3L3MBTL1PTK2B | |
| SCHEMBL1933651 | 0.80 | NR4A1 (0.55) | NR4A1NR4A2NR4A3L3MBTL1PTK2B | |
| SCHEMBL197227 | 0.80 | ALDH1A1 (0.58) | NR4A1NR4A2NR4A3L3MBTL1PTK2B | |
| SCHEMBL31371895 | 0.80 | NR4A1 (0.55) | NR4A1NR4A2NR4A3L3MBTL1PTK2B | |
| SCHEMBL7941531 | 0.80 | PTK2B (0.52) | NR4A1NR4A2NR4A3L3MBTL1PTK2B | |
| SCHEMBL17435205 | 0.80 | NR4A1 (0.67) | NR4A1NR4A2NR4A3L3MBTL1PTK2B | |
| SCHEMBL4201604 | 0.79 | PTK2B (0.60) | NR4A1NR4A2NR4A3L3MBTL1PTK2B | |
| SCHEMBL9466607 | 0.79 | PTK2B (0.55) | NR4A1NR4A2NR4A3L3MBTL1PTK2B |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 939 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8945809-B2 | Fluorinated monomer, fluorinated polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-02-03 | — | — | US | claimed |
| US-8916331-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-12-23 | — | — | US | claimed |
| US-8647808-B2 | Fluorinated monomer, polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-02-11 | — | — | US | claimed |
| EP-2466379-B1 | Resist composition and patterning process | SHINETSU CHEMICAL CO (JP) | 2013-07-17 | — | — | EP | claimed |
| US-8420292-B2 | Polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-04-16 | — | — | US | claimed |
| US-8313886-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-11-20 | — | — | US | claimed |
| EP-2466379-A1 | Resist composition and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2012-06-20 | — | — | EP | claimed |
| US-20120148945-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-06-14 | — | — | US | claimed |
| US-20110250539-A1 | FLUORINATED MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-10-13 | — | — | US | claimed |
| US-20110177455-A1 | POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-07-21 | — | — | US | claimed |
| US-20110151381-A1 | FLUORINATED MONOMER, FLUORINATED POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-06-23 | — | — | US | claimed |
| US-20100266957-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-10-21 | — | — | US | claimed |
| US-6005151-A | Processs for preparing aromatic olefins using palladacycle catalysis | AVENTIS (DE) | 1999-12-21 | — | — | US | claimed |
| US-20260147274-A1 | SULFONIUM SALT TYPE MONOMER, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-05-28 | — | — | US | disclosed |
| CN-116560190-B | Resist material and pattern forming method | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-05-26 | — | — | CN | disclosed |
| US-20260139086-A1 | ONIUM SALT TYPE MONOMER, MONOMERIC PHOTO-ACID GENERATOR, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-05-21 | — | — | US | disclosed |
| JP-2005114968-A | RESIST MATERIAL AND METHOD FOR FORMING PATTERN | SHIN ETSU CHEM CO LTD | 2005-04-28 | — | — | JP | disclosed |
| US-6045968-A | COMPRISING AN ACID-DECOMPOSABLE NOVOLAK RESIN, AN ALKALI-SOLUBLE RESIN AND A PHOTO-ACID GENERATING AGENT; HIGH ALKALI SOLUBILITY, HIGH RESOLUTION, AND HIGH REPRODUCIBILITY | KABUSHIKI KAISHA TOSHIBA (JP) | 2000-04-04 | — | — | US | disclosed |
| US-6005151-A | Processs for preparing aromatic olefins using palladacycle catalysis | AVENTIS (DE) | 1999-12-21 | — | — | US | disclosed |
| US-5837419-A | ACID DECOMPOSABLE RESIN, PHOTO-ACID GENERATING AGENT AND NAPHTHOL NOVOLAK | KABUSHIKI KAISHA TOSHIBA (JP) | 1998-11-17 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20110250539-A1 | FLUORINATED MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | H1-0, FRG1, H1-3 | NR4A1 733/4885NR4A2 2520/4885NR4A3 1909/4885 |
| US-20110151381-A1 | FLUORINATED MONOMER, FLUORINATED POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | AFF1, H1-0, FRG1 | NR4A1 1173/4885NR4A2 3235/4885NR4A3 2979/4885 |
| US-20260147274-A1 | SULFONIUM SALT TYPE MONOMER, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FORMING PROCESS | RSU1, ETV6, NAF1 | NR4A1 351/4885NR4A2 1794/4885NR4A3 2179/4885 |
| US-20260139086-A1 | ONIUM SALT TYPE MONOMER, MONOMERIC PHOTO-ACID GENERATOR, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS | CLTA, ARCN1, CLTB | NR4A1 84/4885NR4A2 922/4885NR4A3 1327/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.