SCHEMBL17439422

SCHEMBL17439422

CO[Si](OC)(OC)O[Si](C)(C)Cl

nearest known ligand 0.31

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1274948 0.80 ALDH1A1 (0.31) ALDH1A1
SCHEMBL3877795 0.76 ALDH1A1 (0.33) ALDH1A1
SCHEMBL20449092 0.74 ALDH1A1 (0.39) ALDH1A1
SCHEMBL297046 0.73
SCHEMBL412622 0.73
SCHEMBL467596 0.73
SCHEMBL17439444 0.73 ALDH1A1 (0.31) ALDH1A1
SCHEMBL26965049 0.73
SCHEMBL5458463 0.72
SCHEMBL1456690 0.72

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 57 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250026962-A1 COMPOSITION FOR ETCHING AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE USING THE SAME SOULBRAIN CO., LTD. (KR) 2025-01-23 US disclosed
US-12163058-B2 Semiconductor element SOULBRAIN CO., LTD. (KR) 2024-12-10 US disclosed
US-12146076-B2 Semiconductor element SOULBRAIN CO., LTD. (KR) 2024-11-19 US disclosed
US-12012525-B2 Composition for etching and manufacturing method of semiconductor device using the same SOULBRAIN CO., LTD. (KR) 2024-06-18 US disclosed
US-11912902-B2 Composition for etching and manufacturing method of semiconductor device using the same SOULBRAIN CO., LTD. (KR) 2024-02-27 US disclosed
CN-117568038-A Etching composition and method for manufacturing semiconductor device using the same 秀博瑞殷株式公社 2024-02-20 CN disclosed
EP-3385353-B1 COMPOSITION FOR ETCHING AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING SAME SOULBRAIN CO LTD (KR) 2023-12-13 EP disclosed
US-20230141924-A1 COMPOSITION FOR ETCHING AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING SAME SOULBRAIN CO., LTD. (KR) 2023-05-11 US disclosed
US-20230136538-A1 COMPOSITION FOR ETCHING AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING SAME SOULBRAIN CO., LTD. (KR) 2023-05-04 US disclosed
US-11634633-B2 Composition for etching SOULBRAIN CO., LTD. (KR) 2023-04-25 US disclosed
US-20210054286-A1 COMPOSITION FOR ETCHING AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING SAME SOULBRAIN CO., LTD. (KR) 2021-02-25 US disclosed
US-20210047564-A1 COMPOSITION FOR ETCHING SOULBRAIN CO., LTD. (KR) 2021-02-18 US disclosed
US-20200263087-A1 COMPOSITION FOR ETCHING AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING SAME SOULBRAIN CO., LTD. (KR) 2020-08-20 US disclosed
US-10465112-B2 Composition for etching SOULBRAIN CO., LTD. (KR) 2019-11-05 US disclosed
US-20190136090-A1 COMPOSITION FOR ETCHING AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE USING THE SAME SOULBRAIN CO., LTD. (KR) 2019-05-09 US disclosed
EP-3385353-A1 COMPOSITION FOR ETCHING AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING SAME Soulbrain Co., Ltd. (KR) 2018-10-10 EP disclosed
CN-108291132-A Etching composition and method for manufacturing semiconductor device using the same 秀博瑞殷株式公社 2018-07-17 CN disclosed
US-20180179442-A1 COMPOSITION FOR ETCHING SOULBRAIN CO., LTD. (KR) 2018-06-28 US disclosed
US-9868902-B2 Composition for etching SOULBRAIN CO., LTD. (KR) 2018-01-16 US disclosed
US-20160017224-A1 COMPOSITION FOR ETCHING SOULBRAIN CO., LTD. (KR) 2016-01-21 US disclosed