Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | APP | P05067 | 1/20 | 0.44 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.42 |
| ▸ | PDE4A | P27815 | 1/20 | 0.42 |
| ▸ | LMNA | P02545 | 1/20 | 0.36 |
| ▸ | SLC6A6 | P31641 | 1/20 | 0.36 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.36 |
| ▸ | BLM | P54132 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1236327 | 0.97 | — | — | |
| SCHEMBL1783443 | 0.81 | — | — | |
| SCHEMBL1646543 | 0.79 | APP (0.48) | APPPTGS1PDE4ALMNASLC6A6 | |
| SCHEMBL1258894 | 0.79 | APP (0.48) | APPPTGS1PDE4ALMNASLC6A6 | |
| SCHEMBL565134 | 0.79 | APP (0.48) | APPPTGS1PDE4ALMNASLC6A6 | |
| SCHEMBL211369 | 0.79 | APP (0.48) | APPPTGS1PDE4ALMNASLC6A6 | |
| SCHEMBL929912 | 0.79 | APP (0.48) | APPPTGS1PDE4ALMNASLC6A6 | |
| SCHEMBL564743 | 0.77 | APP (0.46) | APPPTGS1PDE4ALMNASLC6A6 | |
| SCHEMBL27175673 | 0.77 | APP (0.46) | APPPTGS1PDE4ALMNASLC6A6 | |
| SCHEMBL220968 | 0.76 | APP (0.50) | APPPTGS1PDE4ALMNASLC6A6 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20220389606-A1 | CELL FOR MEASURING CONCENTRATION OF ADDITIVE BREAKDOWN PRODUCTION IN PLATING SOLUTION | KOREA INSTITUTE OF MATERIALS SCIENCE (KR) | 2022-12-08 | — | — | US | claimed |
| WO-2021066413-A1 | APPARATUS FOR MEASURING CONCENTRATION OF ADDITIVE DEGRADATION PRODUCT CONTAINED IN PLATING LIQUID | 한국재료연구원 | 2021-04-08 | — | — | WO | claimed |
| WO-2021066415-A1 | CELL FOR MEASURING CONCENTRATION OF ADDITIVE BREAKDOWN PRODUCTION IN PLATING SOLUTION | KOREA INSTITUTE OF MATERIALS SCIENCE (KR) | 2021-04-08 | — | — | WO | claimed |
| WO-2021066412-A1 | METHOD FOR MEASURING CONCENTRATION OF ADDITIVE BREAKDOWN PRODUCTS INCLUDED IN PLATING SOLUTION | 한국재료연구원 | 2021-04-08 | — | — | WO | claimed |
| EP-2385881-A1 | PROCESS FOR IMPROVING THE ADHESION OF POLYMERIC MATERIALS TO METAL SURFACES | MacDermid-Acumen (US) | 2011-11-16 | — | — | EP | claimed |
| US-8039915-B2 | Solid-state image sensor | FUJIFILM CORPORATION (JP) | 2011-10-18 | — | — | US | claimed |
| WO-2010080227-A1 | PROCESS FOR IMPROVING THE ADHESION OF POLYMERIC MATERIALS TO METAL SURFACES | MACDERMID, INCORPORATED (US) | 2010-07-15 | — | — | WO | claimed |
| WO-2021066412-A1 | METHOD FOR MEASURING CONCENTRATION OF ADDITIVE BREAKDOWN PRODUCTS INCLUDED IN PLATING SOLUTION | 한국재료연구원 | 2021-04-08 | — | — | WO | disclosed |
| WO-2021066413-A1 | APPARATUS FOR MEASURING CONCENTRATION OF ADDITIVE DEGRADATION PRODUCT CONTAINED IN PLATING LIQUID | 한국재료연구원 | 2021-04-08 | — | — | WO | disclosed |
| CN-105027265-A | Electrochemical deposition process for semiconductor wafers | APPLIED MATERIALS INC | 2015-11-04 | — | — | CN | disclosed |
| WO-2014149245-A1 | ELECTROCHEMICAL DEPOSITION PROCESSES FOR SEMICONDUCTOR WAFERS | APPLIED MATERIALS, INC. (US) | 2014-09-25 | — | — | WO | disclosed |
| US-20140262794-A1 | ELECTROCHEMICAL DEPOSITION PROCESSES FOR SEMICONDUCTOR WAFERS | APPLIED MATERIALS, INC. | 2014-09-18 | — | — | US | disclosed |
| WO-2009020792-A2 | ELECTROPLATING AQUEOUS SOLUTION AND METHOD OF MAKING AND USING SAME | EMAT TECHNOLOGY, LLC (US) | 2009-02-12 | — | — | WO | disclosed |