SCHEMBL17445867

SCHEMBL17445867

Cc1ccc2cc(O)ccc2c1O

nearest known ligand 0.57

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 4/20 0.46
ESR2 Q92731 4/20 0.46
TLR8 Q9NR97 1/20 0.45
CYP1A2 P05177 1/20 0.43
ACHE P22303 1/20 0.42
DYRK1A Q13627 1/20 0.41
KDM4E B2RXH2 3/20 0.41
LMNA P02545 2/20 0.41
MEN1 O00255 1/20 0.41
POLB P06746 1/20 0.41
KMT2A Q03164 1/20 0.41
MAPT P10636 1/20 0.41
HSD17B10 Q99714 2/20 0.40
ALDH1A1 P00352 2/20 0.40
GAA P10253 2/20 0.40
HPGD P15428 2/20 0.40
CYP3A4 P08684 1/20 0.40
ALOX15 P16050 1/20 0.40
TSHR P16473 1/20 0.40
HIF1A Q16665 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29771818 1.00 ESR1 (0.46) ESR1ESR2TLR8CYP1A2ACHE
SCHEMBL23199043 0.86 DYRK1A (0.49) ESR1ESR2TLR8CYP1A2ACHE
SCHEMBL17445866 0.84 MCL1 (0.46) ESR1ESR2CYP1A2ACHEDYRK1A
SCHEMBL30364922 0.83 LMNA (0.59) CYP1A2KDM4ELMNAMEN1POLB
SCHEMBL3951399 0.83 LMNA (0.59) CYP1A2KDM4ELMNAMEN1POLB
SCHEMBL2046089 0.83 ESR1 (0.52) ESR1ESR2TLR8CYP1A2ACHE
SCHEMBL13296157 0.79 ESR1 (0.49) ESR1ESR2TLR8CYP1A2ACHE
SCHEMBL19680603 0.79 LMNA (0.66) ESR1ESR2TLR8CYP1A2ACHE
SCHEMBL24717188 0.79 ESR1 (0.43) ESR1ESR2TLR8CYP1A2ACHE
SCHEMBL12965238 0.79 POLB (0.43) ESR1ESR2TLR8CYP1A2KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109960111-B Composition for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, and method for forming pattern 信越化学工业株式会社 2022-07-12 CN disclosed
CN-107428708-B Benzoxazine low temperature curable compositions 亨斯迈先进材料美国有限责任公司 2021-11-09 CN disclosed
US-11018015-B2 Composition for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-05-25 US disclosed
EP-3508918-B1 COMPOSITION FOR FORMING ORGANIC FILM, SUBSTRATE FOR MANUFACTURING SEMICONDUCTOR DEVICE, METHOD FOR FORMING ORGANIC FILM, AND PATTERNING PROCESS SHINETSU CHEMICAL CO (JP) 2020-07-15 EP disclosed
EP-3508918-A1 COMPOSITION FOR FORMING ORGANIC FILM, SUBSTRATE FOR MANUFACTURING SEMICONDUCTOR DEVICE, METHOD FOR FORMING ORGANIC FILM, AND PATTERNING PROCESS Shin-Etsu Chemical Co., Ltd. (JP) 2019-07-10 EP disclosed
CN-109960111-A Organic film forms the forming method and pattern forming method with composition, semiconductor device producing substrate, organic film 信越化学工业株式会社 2019-07-02 CN disclosed
US-20190198341-A1 COMPOSITION FOR FORMING ORGANIC FILM, SUBSTRATE FOR MANUFACTURING SEMICONDUCTOR DEVICE, METHOD FOR FORMING ORGANIC FILM, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2019-06-27 US disclosed
US-10007183-B2 Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-06-26 US disclosed
US-10007183-B2 Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-06-26 US disclosed
US-9977330-B2 Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-05-22 US disclosed
US-9977330-B2 Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-05-22 US disclosed
US-20170336728-A1 ULTRAVIOLET CURABLE LIQUID COMPOSITION, ULTRAVIOLET CURING INKJET INK, ULTRAVIOLET CURING WET ELECTROPHOTOGRAPHIC LIQUID DEVELOPER, ULTRAVIOLET CURING ELECTROSTATIC INKJET INK, AND IMAGE FORMING METHOD USING THEREOF CANON KABUSHIKI KAISHA (JP) 2017-11-23 US disclosed
US-20160122269-A1 COMPOUND CONTAINING PHENOLIC HYDROXYL GROUP, PHENOLIC RESIN, CURABLE COMPOSITION, CURED PRODUCT THEREOF, SEMICONDUCTOR SEALING MATERIAL, AND PRINTED CIRCUIT BOARD DIC CORPORATION (JP) 2016-05-05 US disclosed
US-20160122269-A1 COMPOUND CONTAINING PHENOLIC HYDROXYL GROUP, PHENOLIC RESIN, CURABLE COMPOSITION, CURED PRODUCT THEREOF, SEMICONDUCTOR SEALING MATERIAL, AND PRINTED CIRCUIT BOARD DIC CORPORATION (JP) 2016-05-05 US disclosed
US-9261788-B2 Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-02-16 US disclosed
US-9261788-B2 Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-02-16 US disclosed
US-20160027653-A1 COMPOUND FOR FORMING ORGANIC FILM, AND ORGANIC FILM COMPOSITION USING THE SAME, PROCESS FOR FORMING ORGANIC FILM, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-01-28 US disclosed
US-20160027653-A1 COMPOUND FOR FORMING ORGANIC FILM, AND ORGANIC FILM COMPOSITION USING THE SAME, PROCESS FOR FORMING ORGANIC FILM, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-01-28 US disclosed
US-20160018735-A1 COMPOUND FOR FORMING ORGANIC FILM, AND ORGANIC FILM COMPOSITION USING THE SAME, PROCESS FOR FORMING ORGANIC FILM, AND PATTERNING PROCESS SHINETSU CHEMICAL CO (JP) 2016-01-21 US disclosed
US-20160018735-A1 COMPOUND FOR FORMING ORGANIC FILM, AND ORGANIC FILM COMPOSITION USING THE SAME, PROCESS FOR FORMING ORGANIC FILM, AND PATTERNING PROCESS SHINETSU CHEMICAL CO (JP) 2016-01-21 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-10007183-B2 Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process OR10J3, RER1, OLA1 ESR1 348/4885ESR2 548/4885TLR8 3166/4885
US-20160122269-A1 COMPOUND CONTAINING PHENOLIC HYDROXYL GROUP, PHENOLIC RESIN, CURABLE COMPOSITION, CURED PRODUCT THEREOF, SEMICONDUCTOR SEALING MATERIAL, AND PRINTED CIRCUIT BOARD ASH2L, SEM1, KDM1A ESR1 378/4885ESR2 788/4885TLR8 2261/4885
US-20160027653-A1 COMPOUND FOR FORMING ORGANIC FILM, AND ORGANIC FILM COMPOSITION USING THE SAME, PROCESS FOR FORMING ORGANIC FILM, AND PATTERNING PROCESS OR10J3, RER1, OLA1 ESR1 348/4885ESR2 548/4885TLR8 3166/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.