Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17445907 | 0.98 | PDK2 (0.50) | PDK2KCNA3 | |
| SCHEMBL1305002 | 0.91 | PDK2 (0.60) | PDK2 | |
| SCHEMBL28262297 | 0.91 | PDK2 (0.60) | PDK2 | |
| SCHEMBL14970799 | 0.82 | PDK2 (0.49) | PDK2 | |
| SCHEMBL28931121 | 0.81 | PDK2 (0.53) | PDK2 | |
| SCHEMBL30673067 | 0.81 | PDK2 (0.53) | PDK2 | |
| SCHEMBL28625701 | 0.81 | PDK2 (0.56) | PDK2 | |
| SCHEMBL29767871 | 0.81 | PDK2 (0.56) | PDK2 | |
| SCHEMBL19039047 | 0.81 | PDK2 (0.50) | PDK2 | |
| SCHEMBL30281291 | 0.81 | PDK2 (0.50) | PDK2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4400914-A2 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, PATTERNING PROCESS, AND METHOD FOR FORMING RESIST UNDERLAYER FILM | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-07-17 | — | — | EP | disclosed |
| US-11680133-B2 | Material for forming organic film, patterning process, and polymer | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-06-20 | — | — | US | disclosed |
| US-11680133-B2 | Material for forming organic film, patterning process, and polymer | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-06-20 | — | — | US | disclosed |
| US-20210163675-A1 | MATERIAL FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND POLYMER | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-06-03 | — | — | US | disclosed |
| US-10007183-B2 | Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-06-26 | — | — | US | disclosed |
| US-10007183-B2 | Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-06-26 | — | — | US | disclosed |
| US-9977330-B2 | Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-05-22 | — | — | US | disclosed |
| US-9977330-B2 | Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-05-22 | — | — | US | disclosed |
| US-9261788-B2 | Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-02-16 | — | — | US | disclosed |
| US-9261788-B2 | Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-02-16 | — | — | US | disclosed |
| US-20160027653-A1 | COMPOUND FOR FORMING ORGANIC FILM, AND ORGANIC FILM COMPOSITION USING THE SAME, PROCESS FOR FORMING ORGANIC FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-01-28 | — | — | US | disclosed |
| US-20160027653-A1 | COMPOUND FOR FORMING ORGANIC FILM, AND ORGANIC FILM COMPOSITION USING THE SAME, PROCESS FOR FORMING ORGANIC FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-01-28 | — | — | US | disclosed |
| US-20160018735-A1 | COMPOUND FOR FORMING ORGANIC FILM, AND ORGANIC FILM COMPOSITION USING THE SAME, PROCESS FOR FORMING ORGANIC FILM, AND PATTERNING PROCESS | SHINETSU CHEMICAL CO (JP) | 2016-01-21 | — | — | US | disclosed |
| US-20160018735-A1 | COMPOUND FOR FORMING ORGANIC FILM, AND ORGANIC FILM COMPOSITION USING THE SAME, PROCESS FOR FORMING ORGANIC FILM, AND PATTERNING PROCESS | SHINETSU CHEMICAL CO (JP) | 2016-01-21 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-10007183-B2 | Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process | OR10J3, RER1, OLA1 | PDK2 4566/4885KCNA3 193/4885 |
| US-20160027653-A1 | COMPOUND FOR FORMING ORGANIC FILM, AND ORGANIC FILM COMPOSITION USING THE SAME, PROCESS FOR FORMING ORGANIC FILM, AND PATTERNING PROCESS | OR10J3, RER1, OLA1 | PDK2 4566/4885KCNA3 193/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.