SCHEMBL17460657

SCHEMBL17460657

C=CC(=O)OC1CCCCC1C(C)(O)C(F)(F)F

nearest known ligand 0.33

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
PDK1 Q15118 1/20 0.33
PDK2 Q15119 1/20 0.33
PDK3 Q15120 1/20 0.33
PDK4 Q16654 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12021180 0.87 PDK1 (0.30) PDK1PDK2PDK3PDK4
SCHEMBL20152871 0.86
SCHEMBL75086 0.85
SCHEMBL12791834 0.84 THRA (0.30)
SCHEMBL17870603 0.83 THRA (0.31)
SCHEMBL775693 0.82
SCHEMBL14182213 0.80
SCHEMBL15470600 0.79 PDK1 (0.33) PDK1PDK2PDK3PDK4
Acetic Acid SCHEMBL27578001 0.79 SLC18A3 (0.30)
SCHEMBL10094772 0.75 PDK1 (0.32) PDK1PDK2PDK3PDK4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9244350-B2 Positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-01-26 US disclosed
US-9244350-B2 Positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-01-26 US disclosed