⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11744277 | 0.75 | — | — | |
| SCHEMBL318116 | 0.75 | — | — | |
| SCHEMBL3129864 | 0.72 | — | — | |
| SCHEMBL9723979 | 0.72 | — | — | |
| Ethylene SCHEMBL707435 | 0.72 | CA5A (0.33) | — | |
| Hydrochloric Acid SCHEMBL27763857 | 0.72 | — | — | |
| SCHEMBL8609866 | 0.70 | — | — | |
| SCHEMBL27351453 | 0.70 | — | — | |
| SCHEMBL9127553 | 0.67 | — | — | |
| SCHEMBL727935 | 0.67 | CA5A (0.46) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250020997-A1 | PHOTORESIST COMPOSITIONS AND METHODS OF MANUFACTURING INTEGRATED CIRCUIT DEVICES USING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2025-01-16 | — | — | US | disclosed |
| US-20230176481-A1 | FILM-FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2023-06-08 | — | — | US | disclosed |
| US-8669375-B2 | Process for producing ester compound | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2014-03-11 | — | — | US | disclosed |
| US-20130066070-A1 | PROCESS FOR PRODUCING ESTER COMPOUND | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2013-03-14 | — | — | US | disclosed |
| US-8318964-B2 | Process for producing ester compound | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2012-11-27 | — | — | US | disclosed |
| US-7968555-B2 | Intermediates in the preparation of entecavir via carbon-silicon oxidation | BRISTOL-MYERS SQUIBB COMPANY (US) | 2011-06-28 | — | — | US | disclosed |
| US-20100324314-A1 | PROCESS FOR PRODUCING ESTER COMPOUND | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2010-12-23 | — | — | US | disclosed |
| US-7833691-B2 | Heterocycle-bearing onium salts | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2010-11-16 | — | — | US | disclosed |
| US-20100286089-A1 | Process for the Preparation of Entecavir and Novel Intermediates Thereof Via Carbon-Silicon Oxidation | BRISTOL-MYERS SQUIBB COMPANY | 2010-11-11 | — | — | US | disclosed |
| EP-1953149-B1 | A heterocycle-containing onium salt | WAKO PURE CHEM IND LTD (JP) | 2010-10-06 | — | — | EP | disclosed |
| EP-1690685-A2 | Planographic printing plate precursor | FUJI PHOTO FILM CO., LTD. (JP) | 2006-08-16 | — | — | EP | disclosed |
| EP-1676835-A1 | PROCESS FOR PRODUCING TRIARYLSULFONIUM SALT | Wako Pure Chemical Industries, Ltd. (JP) | 2006-07-05 | — | — | EP | disclosed |
| WO-2005118585-A1 | PROCESS FOR THE PREPARATION OF ENTECAVIR AND NOVEL INTERMEDIATES THEREOF VIA CARBON-SILICON OXIDATION | BRISTOL-MYERS SQUIBB COMPANY (US) | 2005-12-15 | — | — | WO | disclosed |
| US-20050272932-A1 | Process for the preparation of entecavir and novel intermediates thereof via carbon-silicon oxidation | BRISTOL-MYERS SQUIBB COMPANY | 2005-12-08 | — | — | US | disclosed |
| US-20050233253-A1 | Diphenylsulfonium compounds in which the S atom is additionally attached to a xanthene-9-onyl-2-yl- or coumarin-7-yl- ring; acid generator for a chemically amplified resist; photopolymerization initiator for polymerizing an epoxide or a vinyl ether | WAKO PURE CHEMICAL INDUSTRIES, LTD (JP) | 2005-10-20 | — | — | US | disclosed |
| US-20050020710-A1 | Hybrid onium salt | WAKO PURE CHEMICALS INDUSTRIES, LTD. (JP) | 2005-01-27 | — | — | US | disclosed |
| EP-1481973-A1 | HETEROCYCLE-BEARING ONIUM SALTS | Wako Pure Chemical Industries, Ltd. (JP) | 2004-12-01 | — | — | EP | disclosed |
| EP-1443042-A1 | HYBRID ONIUM SALT | Wako Pure Chemical Industries, Ltd. (JP) | 2004-08-04 | — | — | EP | disclosed |
| US-4287342-A | 2,4,6-Trihalo-5-alkyl-and 5-alkenylsulphonylpyrimidines | CIBA-GEIGY CORPORATION (US) | 1981-09-01 | — | — | US | disclosed |
| US-4188483-A | 5-Alkylsulphonyl- and 5-alkenylsulphonylbarbituric acids and derivatives thereof | CIBA-GEIGY CORPORATION (US) | 1980-02-12 | — | — | US | disclosed |