Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GRM1 | Q13255 | 2/20 | 0.34 |
| ▸ | ATM | Q13315 | 1/20 | 0.33 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.32 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | CTSV | O60911 | 1/20 | 0.31 |
| ▸ | CTSL | P07711 | 1/20 | 0.31 |
| ▸ | CTSS | P25774 | 1/20 | 0.31 |
| ▸ | CTSK | P43235 | 1/20 | 0.31 |
| ▸ | LNPEP | Q9UIQ6 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL47404 | 0.87 | GRM1 (0.36) | GRM1ATMEPHX2CYP19A1ALDH1A1 | |
| SCHEMBL16591044 | 0.86 | GRM1 (0.35) | GRM1ATMEPHX2CYP19A1 | |
| SCHEMBL15082432 | 0.84 | GRM1 (0.36) | GRM1ATMEPHX2CYP19A1ALDH1A1 | |
| SCHEMBL16866412 | 0.82 | GRM1 (0.36) | GRM1ATMEPHX2CYP19A1ALDH1A1 | |
| SCHEMBL16591114 | 0.81 | GRM1 (0.34) | GRM1ATMEPHX2CYP19A1 | |
| SCHEMBL9924473 | 0.80 | HSD11B1 (0.30) | — | |
| SCHEMBL23383118 | 0.79 | ATM (0.39) | GRM1ATMCYP19A1ALDH1A1 | |
| SCHEMBL132929 | 0.78 | ATM (0.46) | GRM1ATMEPHX2CYP19A1CTSV | |
| SCHEMBL14479488 | 0.78 | ATM (0.46) | GRM1ATMEPHX2CYP19A1CTSV | |
| SCHEMBL9924475 | 0.77 | MAPT (0.35) | ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10031419-B2 | Pattern forming method, composition kit and resist film, manufacturing method of electronic device using these, and electronic device | FUJIFILM CORPORATION (JP) | 2018-07-24 | — | — | US | disclosed |
| US-20180120701-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, MASK BLANK INCLUDING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2018-05-03 | — | — | US | disclosed |
| US-20160048075-A1 | PATTERN FORMING METHOD, COMPOSITION KIT AND RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE USING THESE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2016-02-18 | — | — | US | disclosed |